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公开(公告)号：US09961755B2
公开(公告)日：2018-05-01
申请号：US15498902
申请日：2017-04-27
申请人： Gigaphoton Inc.
发明人： Hiroshi Umeda , Kazukiyo Kamikanna
IPC分类号： H05G2/00
摘要： An extreme ultraviolet light generation device may include: a chamber earthed to a ground, in which extreme ultraviolet light is generated by irradiating a metal target supplied inside with laser light; a target supply unit earthed to the ground and configured to output the target supplied into the chamber from a nozzle; an extraction electrode configured to exert electrostatic force on the target by applying a negative first potential to the extraction electrode; a first power supply configured to apply the first potential to the extraction electrode; an acceleration electrode unit configured to accelerate the target by applying a negative second potential lower than the first potential to the acceleration electrode unit; a second power supply configured to apply the second potential to the acceleration electrode unit; and a charge neutralizer disposed inside the acceleration electrode unit and configured to emit electrons onto the target.
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公开(公告)号：US09742141B2
公开(公告)日：2017-08-22
申请号：US15245245
申请日：2016-08-24
申请人： Gigaphoton Inc.
发明人： Hiroaki Tsushima , Kouji Kakizaki , Takashi Matsunaga , Takeshi Asayama , Hisakazu Katsuumi , Hiroshi Umeda , Hiroyuki Ikeda
IPC分类号： H01S3/22 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/04 , H01S3/225 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/134
CPC分类号： H01S3/036 , H01S3/038 , H01S3/0384 , H01S3/0407 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/09702 , H01S3/09713 , H01S3/134 , H01S3/225
摘要： A laser chamber including a first space and a second space in communication with the first space may include: a first discharge electrode disposed in the first space; a second discharge electrode disposed in the first space to face the first discharge electrode; a fan disposed in the first space and configured to flow laser gas between the first discharge electrode and the second discharge electrode; a peaking condenser disposed in the second space; and an electrical insulating member configured to partition the first space and the second space from one another, and disposed to allow the laser gas to pass through between the first space and the second space.
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公开(公告)号：US08927951B2
公开(公告)日：2015-01-06
申请号：US14084558
申请日：2013-11-19
申请人： Gigaphoton Inc.
发明人： Hiroshi Umeda , Takashi Ohara , Osamu Wakabayashi
IPC分类号： H05G2/00
摘要： A target supply device may include a tank having a nozzle, a first electrode provided with a first through-hole, a second electrode provided with a second through-hole, a third electrode disposed within the tank, an anchoring portion configured to anchor the first electrode and the second electrode to the tank so that insulation among the nozzle, the first electrode, and the second electrode is maintained, and so that a center axis of the nozzle is positioned within the first through-hole and the second through-hole, a first projecting portion that is an integrated part of at least one of the first electrode and the second electrode and that is configured to project toward the nozzle, and a second projecting portion that is an integrated part of at least the second electrode and that is configured to project so as to be positioned between the first electrode and the second electrode.
摘要翻译： 目标供给装置可以包括具有喷嘴的罐，设置有第一通孔的第一电极，设置有第二通孔的第二电极，设置在罐内的第三电极，锚定部分， 电极和第二电极连接到罐，使得保持喷嘴，第一电极和第二电极之间的绝缘，并且使得喷嘴的中心轴线位于第一通孔和第二通孔内， 第一突出部，其是第一电极和第二电极中的至少一个的一体部分，并且被构造成朝向喷嘴突出;第二突出部，其是至少第二电极的一体部分， 被配置成突出以便定位在第一电极和第二电极之间。
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4.发明授权Target supply apparatus, chamber, and extreme ultraviolet light generation apparatus 有权目标供应装置，室和极紫外光发生装置公开(公告)号：US08785895B2
公开(公告)日：2014-07-22
申请号：US13929668
申请日：2013-06-27
申请人： Gigaphoton Inc.
CPC分类号： H05G2/008 , G03F7/20 , G03F7/70033 , H05G2/001 , H05G2/006
摘要： A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.
摘要翻译： 安装在通过将目标材料和激光束引入室中而产生极紫外光的室中的目标供给装置可以包括具有喷嘴的目标发生器，被配置为覆盖喷嘴的第一管， 允许目标材料通过第一管的第一管和构造成打开和关闭盖开口的第一阀。
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公开(公告)号：US10290992B2
公开(公告)日：2019-05-14
申请号：US15895634
申请日：2018-02-13
申请人： Gigaphoton Inc.
发明人： Hiroshi Umeda , Osamu Wakabayashi
摘要： The laser system includes a first laser apparatus, a second laser apparatus, a charging voltage measuring unit configured to measure the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, at least one bleeding circuit configured to reduce the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, and a bleeding circuit controller configured to control the at least one bleeding circuit based on the voltage measured by the charging voltage measuring unit.
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公开(公告)号：US08993987B2
公开(公告)日：2015-03-31
申请号：US14012642
申请日：2013-08-28
申请人： Gigaphoton Inc.
发明人： Hiroshi Umeda
摘要： A target supply device may include a receptacle for holding a liquid target material, a first electrode disposed within the receptacle, a nozzle portion provided in the receptacle, a second electrode provided with a first path and disposed facing the nozzle portion, a third electrode provided with a second path that, along with the first path, defines a trajectory of the liquid target material released from the nozzle portion, a first power source that applies a first potential that is higher than a common potential to the first electrode, a second power source that applies a second potential that is lower than the common potential to the third electrode, and a third power source that applies a third potential that is no greater than the first potential and is no less than the second potential to the second electrode.
摘要翻译： 目标供给装置可以包括用于保持液体目标材料的容器，设置在容器内的第一电极，设置在容器中的喷嘴部分，设置有面向喷嘴部分设置的第一路径的第二电极，设置在第三电极 具有与第一路径一起限定从喷嘴部分释放的液体目标材料的轨迹的第二路径，向第一电极施加高于公共电位的第一电位的第一电源，第二电力 源极，其向第三电极施加低于公共电位的第二电位;以及第三电源，其向第二电极施加不大于第一电位且不小于第二电位的第三电位。
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公开(公告)号：US08921815B2
公开(公告)日：2014-12-30
申请号：US14083020
申请日：2013-11-18
申请人： Gigaphoton Inc.
发明人： Hiroshi Umeda , Osamu Wakabayashi
IPC分类号： H05G2/00
摘要： A target supply device may include a tank including a nozzle, a first electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second electrode that includes a main body portion provided with a second through-hole and a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle and that is disposed so that the center axis of the nozzle is positioned within the second through-hole, a third electrode disposed within the tank, and a heating unit configured to heat the second electrode.
摘要翻译： 目标供给装置可以包括：包括喷嘴的第一电极，设置有第一通孔的第一电极，并且设置成使得喷嘴的中心轴线位于第一通孔内;第二电极，包括主体部分 设置有第二通孔和收集部，所述第二通孔和收集部形成为从所述第二通孔的周缘方向朝向所述喷嘴的方向延伸的圆筒形状，并且所述收集部被配置为使得所述喷嘴的中心轴线位于所述第二通孔 通孔，设置在所述槽内的第三电极，以及构造成加热所述第二电极的加热单元。
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公开(公告)号：US09806490B2
公开(公告)日：2017-10-31
申请号：US15354670
申请日：2016-11-17
申请人： Gigaphoton Inc.
IPC分类号： H01S3/097 , H01S3/23 , H01L21/02 , H01L21/67 , H01S3/139 , B23K26/00 , H01S3/13 , H01S3/104 , H01S3/225 , H01S3/00
CPC分类号： H01S3/09702 , B23K26/00 , B23K26/0608 , H01L21/02686 , H01L21/67115 , H01S3/0057 , H01S3/104 , H01S3/1305 , H01S3/1394 , H01S3/225 , H01S3/2308 , H01S3/2383
摘要： The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.
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公开(公告)号：US09125285B2
公开(公告)日：2015-09-01
申请号：US14159909
申请日：2014-01-21
申请人： GIGAPHOTON INC.
发明人： Hiroshi Umeda
IPC分类号： H05G2/00
摘要： A target supply device may include a tank including a nozzle, a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential, and a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.
摘要翻译： 目标供给装置可以包括：罐，包括喷嘴，设置在罐内的第一电极;第一电位设定单元，被配置为将第一电极处的电位设定为第一电位;第二电极，设置有第一通孔; 被配置为使得喷嘴的中心轴线位于第一通孔内;第二电位设定单元，被配置为将第二电极处的电位设定为与第一电位不同的第二电位;以及电荷中和单元， 以中和通过位于第二电极和等离子体产生区域之间的第一区域的目标材料的电荷。
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公开(公告)号：US10103509B2
公开(公告)日：2018-10-16
申请号：US15836878
申请日：2017-12-10
申请人： Gigaphoton, Inc.
发明人： Kouji Kakizaki , Akira Suwa , Osamu Wakabayashi , Hiroshi Umeda
摘要： The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.
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