Ion current droop compensation
    1.
    发明授权

    公开(公告)号:US11728138B2

    公开(公告)日:2023-08-15

    申请号:US17851022

    申请日:2022-06-27

    CPC classification number: H01J37/32174 H01J37/32128 H01J37/32146

    Abstract: In some embodiments, a high voltage power supply is disclosed that provides a plurality of high voltage pulses without any voltage droop between two subsequent pulses. In some embodiments, a high voltage power supply is disclosed that provides a waveform of voltage versus time having a plurality of high voltage pulses having a voltage greater than 1 kV and with a substantially flat portion between pulse. In some embodiments, a high voltage power supply is disclosed that includes a snubber with a snubber resistor having a resistance of about 7.5 mΩ1.25Ω; and a snubber capacitor having a capacitance of about 2 μF-35 μF.

    ION CURRENT DROOP COMPENSATION
    5.
    发明申请

    公开(公告)号:US20220037122A1

    公开(公告)日:2022-02-03

    申请号:US17493835

    申请日:2021-10-04

    Abstract: A pulse generator is disclosed. The pulse generator includes a DC source; a plurality of switches, a transformer; and a pulsing output. The pulse generator can be coupled with a plasma chamber. The pulsing output outputs high voltage pulses having a peak-to-peak voltage greater than 1 kV and a voltage portion between consecutive high voltage bipolar pulses that has a negative slope that substantially offsets the voltage reduction on a wafer within a plasma chamber due to an ion current. The resulting voltage at the wafer may be substantially flat between consecutive pulses.

    ION CURRENT DROOP COMPENSATION
    6.
    发明公开

    公开(公告)号:US20240347318A1

    公开(公告)日:2024-10-17

    申请号:US18642777

    申请日:2024-04-22

    CPC classification number: H01J37/32146 H01J37/32174

    Abstract: A pulse generator is disclosed. The pulse generator includes a DC source; a plurality of switches, a transformer; and a pulsing output. The pulse generator can be coupled with a plasma chamber. The pulsing output outputs high voltage pulses having a peak-to-peak voltage greater than 1 kV and a voltage portion between consecutive high voltage bipolar pulses that has a negative slope that substantially offsets the voltage reduction on a wafer within a plasma chamber due to an ion current. The resulting voltage at the wafer may be substantially flat between consecutive pulses.

    HIGH FREQUENCY RF GENERATOR AND DC PULSING

    公开(公告)号:US20230073797A1

    公开(公告)日:2023-03-09

    申请号:US18055411

    申请日:2022-11-14

    Abstract: A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a high voltage power supply; a nanosecond pulser electrically coupled with the high voltage power supply and switches voltage from the high voltage power supply at high frequencies; a transformer having a primary side and a secondary side, the nanosecond pulser electrically coupled with the primary side of the transformer; and an output electrically coupled with the transformer producing a waveform. In some embodiments, the waveform includes a plurality of high voltage pulses having a pulse amplitude greater than about 2 kV, a pulse width, and a pulse repetition frequency; and a sinusoidal waveform having a waveform frequency and a waveform amplitude greater than 100 V.

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