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公开(公告)号：US11967484B2
公开(公告)日：2024-04-23
申请号：US17493835
申请日：2021-10-04
CPC分类号： H01J37/32146 , H01J37/32174
摘要： A pulse generator is disclosed. The pulse generator includes a DC source; a plurality of switches, a transformer; and a pulsing output. The pulse generator can be coupled with a plasma chamber. The pulsing output outputs high voltage pulses having a peak-to-peak voltage greater than 1 kV and a voltage portion between consecutive high voltage bipolar pulses that has a negative slope that substantially offsets the voltage reduction on a wafer within a plasma chamber due to an ion current. The resulting voltage at the wafer may be substantially flat between consecutive pulses.
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公开(公告)号：US20220013329A1
公开(公告)日：2022-01-13
申请号：US17372398
申请日：2021-07-09
IPC分类号： H01J37/32
摘要： In some embodiments, a high voltage power supply is disclosed that provides a plurality of high voltage pulses without any voltage droop between two subsequent pulses. In some embodiments, a high voltage power supply is disclosed that provides a waveform of voltage versus time having a plurality of high voltage pulses having a voltage greater than 1 kV and with a substantially flat portion between pulse. In some embodiments, a high voltage power supply is disclosed that includes a snubber with a snubber resistor having a resistance of about 7.5 mΩ-1.25Ω; and a snubber capacitor having a capacitance of about 2 μF-35 μF.
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公开(公告)号：US20210249227A1
公开(公告)日：2021-08-12
申请号：US17234773
申请日：2021-04-19
发明人： Christopher Bowman , Timothy Ziemba , Kenneth Miller , Kevin Muggli , Eric Hanson , James Prager
摘要： Some embodiments include a pulsing power supply comprising a power supply and a transformer comprising: a transformer core; a primary winding wrapped around a portion of the transformer core, the primary winding having a first lead and a second lead; and a secondary winding wrapped around a portion of the transformer core. The pulsing power supply may also include a first switch electrically connected with the first lead of the primary winding and the power supply; and a second switch electrically connected with the second lead of the primary winding and the power supply, wherein the first switch and the second switch are opened and closed at different time intervals. The pulsing power supply may also include a pulsing output electrically coupled with the secondary winding of the transformer that outputs pulses having a voltage greater than about 2 kV and with pulse frequencies greater than 1 kHz.
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公开(公告)号：US20220037122A1
公开(公告)日：2022-02-03
申请号：US17493835
申请日：2021-10-04
IPC分类号： H01J37/32
摘要： A pulse generator is disclosed. The pulse generator includes a DC source; a plurality of switches, a transformer; and a pulsing output. The pulse generator can be coupled with a plasma chamber. The pulsing output outputs high voltage pulses having a peak-to-peak voltage greater than 1 kV and a voltage portion between consecutive high voltage bipolar pulses that has a negative slope that substantially offsets the voltage reduction on a wafer within a plasma chamber due to an ion current. The resulting voltage at the wafer may be substantially flat between consecutive pulses.
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公开(公告)号：US10282567B2
公开(公告)日：2019-05-07
申请号：US15973519
申请日：2018-05-07
发明人： Kenneth E. Miller , James R. Prager , Timothy M. Ziemba , John G. Carscadden , Christopher Bowman , Ilia Slobodov
IPC分类号： G01R21/00 , G06F9/00 , H04L29/08 , H04W52/02 , G06G7/14 , G06G7/02 , H01F27/28 , H01F30/06 , H03K3/53
摘要： A high voltage inductive adder is disclosed. In some embodiments, the high voltage inductive adder comprising a first adder circuit and a second adder circuit. The first adder circuit including a first source; a first switch electrically coupled with the first source; a first transformer core; and a first plurality of primary windings wound about the first transformer core and electrically coupled with the first switch. The second adder circuit including a second source; a second switch electrically coupled with the second source; a second transformer core; and a second plurality of primary windings wound about the second transformer core and electrically coupled with the second switch. The high voltage inductive adder comprising one or more secondary windings wound around both the first transformer core and the second transformer core and an output coupled with the plurality of secondary windings.
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公开(公告)号：US20230073797A1
公开(公告)日：2023-03-09
申请号：US18055411
申请日：2022-11-14
IPC分类号： H01J37/32
摘要： A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a high voltage power supply; a nanosecond pulser electrically coupled with the high voltage power supply and switches voltage from the high voltage power supply at high frequencies; a transformer having a primary side and a secondary side, the nanosecond pulser electrically coupled with the primary side of the transformer; and an output electrically coupled with the transformer producing a waveform. In some embodiments, the waveform includes a plurality of high voltage pulses having a pulse amplitude greater than about 2 kV, a pulse width, and a pulse repetition frequency; and a sinusoidal waveform having a waveform frequency and a waveform amplitude greater than 100 V.
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公开(公告)号：US20220328287A1
公开(公告)日：2022-10-13
申请号：US17851022
申请日：2022-06-27
IPC分类号： H01J37/32
摘要： In some embodiments, a high voltage power supply is disclosed that provides a plurality of high voltage pulses without any voltage droop between two subsequent pulses. In some embodiments, a high voltage power supply is disclosed that provides a waveform of voltage versus time having a plurality of high voltage pulses having a voltage greater than 1 kV and with a substantially flat portion between pulse. In some embodiments, a high voltage power supply is disclosed that includes a snubber with a snubber resistor having a resistance of about 7.5 mΩ1.25Ω; and a snubber capacitor having a capacitance of about 2 μF-35 μF.
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公开(公告)号：US11728138B2
公开(公告)日：2023-08-15
申请号：US17851022
申请日：2022-06-27
CPC分类号： H01J37/32174 , H01J37/32128 , H01J37/32146
摘要： In some embodiments, a high voltage power supply is disclosed that provides a plurality of high voltage pulses without any voltage droop between two subsequent pulses. In some embodiments, a high voltage power supply is disclosed that provides a waveform of voltage versus time having a plurality of high voltage pulses having a voltage greater than 1 kV and with a substantially flat portion between pulse. In some embodiments, a high voltage power supply is disclosed that includes a snubber with a snubber resistor having a resistance of about 7.5 mΩ1.25Ω; and a snubber capacitor having a capacitance of about 2 μF-35 μF.
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公开(公告)号：US20210029815A1
公开(公告)日：2021-01-28
申请号：US16919085
申请日：2020-07-01
发明人： Christopher Bowman , Connor Liston , Nicolas A. Yang , Kenneth Miller , Ilia Slobodov , Timothy Ziemba
摘要： Some embodiments include a plasma system that includes a plasma chamber; an RF driver driving RF bursts into the plasma chamber with an RF frequency greater than 2 MHz; a nanosecond pulser driving pulses into the plasma chamber with a pulse repetition frequency a peak voltage, the pulse repetition frequency being less than the RF frequency and the peak voltage being greater than 2 kV; a first filter disposed between the RF driver and the plasma chamber; and a second filter disposed between the nanosecond pulser and the plasma chamber.
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公开(公告)号：US20240347318A1
公开(公告)日：2024-10-17
申请号：US18642777
申请日：2024-04-22
IPC分类号： H01J37/32
CPC分类号： H01J37/32146 , H01J37/32174
摘要： A pulse generator is disclosed. The pulse generator includes a DC source; a plurality of switches, a transformer; and a pulsing output. The pulse generator can be coupled with a plasma chamber. The pulsing output outputs high voltage pulses having a peak-to-peak voltage greater than 1 kV and a voltage portion between consecutive high voltage bipolar pulses that has a negative slope that substantially offsets the voltage reduction on a wafer within a plasma chamber due to an ion current. The resulting voltage at the wafer may be substantially flat between consecutive pulses.
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