SECURITY DEVICES
    1.
    发明申请
    SECURITY DEVICES 有权
    安全设备

    公开(公告)号:US20140312606A1

    公开(公告)日:2014-10-23

    申请号:US14351298

    申请日:2012-10-11

    发明人: Adam Lister

    IPC分类号: B42D15/00 G03F7/20

    摘要: A method and security device, including: a semi-transparent layer exhibiting a first pattern of regions having high optical density and/or raised surface profile relative to layer intervening regions; and a colour layer exhibiting a second pattern of elements of at least one colour. First and second patterns partially overlap and are configured so the device, appearance varies at different viewing angles. First pattern has colour layer following the contours of raised regions. Security device includes: a photosensitive film exhibiting pattern of regions of relatively high and low optical density, the pattern arising from photosensitive film exposure to radiation of a responsive predetermined wavelength from the photosensitive film; and a colour layer overlapping the pattern exhibited by photosensitive film, which exhibits increase in optical density upon radiation exposure of a predetermined wavelength and concurrent or subsequent heating. Increases in optical density being due to the bubbles formation within the photosensitive film.

    摘要翻译: 一种方法和安全装置,包括:相对于层中间区域呈现具有高光密度和/或凸起表面轮廓的区域的第一图案的半透明层; 以及显示至少一种颜色的元件的第二图案的彩色层。 第一和第二图案部分重叠并且被配置为使得设备,外观在不同的视角下变化。 第一种图案具有跟着凸起区域轮廓的颜色层。 安全装置包括:具有相对较高和低光密度的区域的图案的感光膜,由感光膜暴露于来自感光膜的响应的预定波长的辐射而产生的图案; 以及与感光膜显示的图案重叠的彩色层,其在预定波长和同时或随后的加热的放射线曝光时表现出增加的光密度。 光密度增加是由于感光膜内的气泡形成引起的。

    Security devices and methods of manufacture thereof

    公开(公告)号:US10981411B2

    公开(公告)日:2021-04-20

    申请号:US15578317

    申请日:2016-06-09

    摘要: A method of manufacturing an image element array for a security device is disclosed. The method comprises: (a) providing a metallised substrate web comprising a substrate having a first metal layer thereon on a first surface of the substrate, the first metal layer being soluble in a first etchant substance; (b) applying a first photosensitive resist layer to the first metal layer; (c) exposing the first photosensitive resist layer to radiation of a wavelength to which the resist layer is responsive through a patterned mask, by conveying the substrate web along a transport path and, during the exposure, moving the patterned mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web, wherein the patterned mask comprises first pattern elements in which the mask is substantially opaque to the radiation and second pattern elements in which the mask is substantially transparent to the radiation, whereupon the exposed second pattern elements of the first photosensitive resist layer react resulting in increased solubility by a second etchant substance, the non-exposed first pattern elements remaining relatively insoluble by the second etchant substance; and (d) applying the first and second etchant substances to the substrate web whereupon the second pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image element array.

    Methods of manufacturing a security device

    公开(公告)号:US10766293B2

    公开(公告)日:2020-09-08

    申请号:US16316435

    申请日:2017-07-04

    发明人: Adam Lister

    摘要: A method of manufacturing a security device includes: a) providing a depth map of a macroimage depicting a three-dimensional object, the depth map representing the depth of each part of the three-dimensional object relative to a reference plane by different colours and/or different tones of one colour; b) segmenting the depth map into a plurality of regions based on the colours and/or tones of the depth map; c) for each region, creating a respective microimage element array; and d) providing a sampling element array of a predetermined pitch and orientation. The pitch and/or orientation of each respective microimage element array is different, and is configured such that the magnified versions of the microimage elements generated in any one of the regions have a different apparent depth relative to those generated in the other region(s), so as to form a three-dimensional representation of the macroimage.

    Security device and method of manufacture

    公开(公告)号:US10569592B2

    公开(公告)日:2020-02-25

    申请号:US16098820

    申请日:2017-05-02

    发明人: Adam Lister

    摘要: A security device is provided. The security device comprises an array of elongate focusing structures, the elongate axes of which are aligned along a first direction, the elongate focusing structures being arranged parallel to one another periodically along a second direction which is orthogonal to the first direction, each elongate focusing structure having an optical footprint of which different elongate strips will be directed to the viewer in dependence on the viewing angle, the centre line of each optical footprint being parallel with the first direction. An array of image elements overlap the array of elongate focusing structures, the array of image elements representing elongate image slices of at least two respective images, each image slice comprising one or more image elements, and at least one image slice of each respective image being located at least partially in the optical footprint of each elongate focusing structure. The array of image elements is configured such that the pitch between the elongate image slices of each respective image in the second direction varies across the array in the first and/or second direction(s). At any one viewing angle, in a first region of the device the elongate focussing structures direct portions of first image slices corresponding to a first image to the viewer such that the first image is displayed across the first region of the device, and simultaneously, in a second region of the device which is laterally offset from the first region in the first and/or second direction(s), the elongate focussing structures direct portions of second image slices corresponding to a second image to the viewer such that the second image is displayed across the second region of the device, the positions of the first and second regions relative to the security device depending on the viewing angle.

    SECURITY DEVICES
    8.
    发明申请
    SECURITY DEVICES 有权
    安全设备

    公开(公告)号:US20150151562A1

    公开(公告)日:2015-06-04

    申请号:US14412058

    申请日:2013-07-05

    IPC分类号: B42D25/351

    摘要: A security device is provided including a first pattern of elements and a second, overlapping, pattern of elements spaced by a transparent layer, the first and second patterns in combination obstructing the passage of light transmitted to a viewer through the device to a varying degree depending on the viewing position. The first and second patterns of elements are configured such that a first region of the device exhibits a maximum change in the degree of obstruction when the device is tilted relative to the viewer about a first tilt axis, and a second region of the device exhibits a maximum change in the degree of obstruction when the device is tilted relative to the viewer about a second tilt axis which is not parallel to the first tilt axis.

    摘要翻译: 提供了一种安全装置,包括元件的第一图案和由透明层间隔开的第二重叠图案元件,第一和第二图案组合阻碍透过装置的观察者通过不同程度的依赖于 在观看位置。 元件的第一和第二图案被构造成使得当装置相对于观看者围绕第一倾斜轴线倾斜时,装置的第一区域呈现阻塞程度的最大变化,并且装​​置的第二区域呈现出 当装置相对于观察者围绕不平行于第一倾斜轴线的第二倾斜轴线倾斜时,阻塞程度的最大变化。

    SECURITY DEVICES AND METHODS OF MANUFACTURE THEREOF
    9.
    发明申请
    SECURITY DEVICES AND METHODS OF MANUFACTURE THEREOF 有权
    安全装置及其制造方法

    公开(公告)号:US20140306441A1

    公开(公告)日:2014-10-16

    申请号:US14351448

    申请日:2012-10-11

    发明人: Adam Lister

    IPC分类号: B42D15/00 G03F7/38 G03F7/20

    摘要: A method of manufacturing a security device including: conveying a substrate web including a photosensitive film along a transport path; exposing the photosensitive film to radiation of a predetermined wavelength through a mask, wherein the mask includes a predetermined pattern of regions which are substantially opaque to radiation of the predetermined wavelength and at least semi-transparent to radiation of the predetermined wavelength, respectively; during the exposure, moving the mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web; and heating the substrate web including the exposed photosensitive film. In this way, regions of the photosensitive film exposed to the radiation of the predetermined wavelength undergo an increase in optical density such that the photosensitive film displays a reproduction of the predetermined pattern.

    摘要翻译: 一种制造安全装置的方法,包括:沿传送路径传送包括感光膜的基片; 将所述感光膜暴露于通过掩模的预定波长的辐射,其中所述掩模包括分别对于预定波长的辐射基本上不透明且对于预定波长的辐射至少半透明的预定图案区域; 在曝光期间,沿着衬底腹板沿传送路径的至少一部分以与衬底腹板基本相同的速度移动面罩,使得在掩模和衬底腹板之间基本上没有相对移动; 以及加热包括曝光的感光膜的基片网。 以这种方式,暴露于预定波长的辐射的感光膜的区域经历光密度的增加,使得感光膜显示预定图案的再现。

    Security devices and methods of manufacturing image patterns for security devices

    公开(公告)号:US11059319B2

    公开(公告)日:2021-07-13

    申请号:US16093132

    申请日:2017-04-19

    发明人: Adam Lister

    摘要: A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.