Method of forming three-dimensional lithographic pattern
    1.
    发明申请
    Method of forming three-dimensional lithographic pattern 审中-公开
    形成三维光刻图案的方法

    公开(公告)号:US20070178410A1

    公开(公告)日:2007-08-02

    申请号:US11453764

    申请日:2006-06-14

    CPC classification number: G03F7/2002 G03F1/50 H01L21/0274 H01L21/76807

    Abstract: A method of forming a three-dimensional lithographic pattern is provided. The method includes providing a substrate. A first photoresist layer is formed on the substrate. The first photoresist layer corresponds to a first exposure removal dose. A second photoresist layer is formed on the first photoresist layer. The second photoresist layer corresponds to a second exposure removal dose, which is different from the first exposure removal dose. A reticle with multiple regions of different light transmittances is provided. Through the reticle, the first and second photoresist layers are exposed to form a first removable region in the first photoresist layer and a second removable region in the second photoresist layer. The second removable region is different from the first removable region. The first and second photoresist layers are then developed to remove the first and second removable regions.

    Abstract translation: 提供了形成三维光刻图案的方法。 该方法包括提供基板。 在基板上形成第一光致抗蚀剂层。 第一光致抗蚀剂层对应于第一曝光去除剂量。 在第一光致抗蚀剂层上形成第二光致抗蚀剂层。 第二光致抗蚀剂层对应于与第一曝光去除剂量不同的第二曝光去除剂量。 提供具有不同透光率的多个区域的掩模版。 通过掩模版,第一和第二光致抗蚀剂层被暴露以在第一光致抗蚀剂层中形成第一可移除区域,并在第二光致抗蚀剂层中形成第二可除去区域。 第二可移除区域与第一可移除区域不同。 然后显影第一和第二光致抗蚀剂层以除去第一和第二可除去区域。

    UV light generator
    2.
    发明授权
    UV light generator 有权
    紫外光发生器

    公开(公告)号:US08270069B2

    公开(公告)日:2012-09-18

    申请号:US12841941

    申请日:2010-07-22

    CPC classification number: G02F1/37 G02F2201/16 G02F2201/17

    Abstract: A UV light generator for receiving a baseband light beam from a baseband light source is provided. The UV light generator includes a first lens unit, a second lens unit, a first frequency doubling crystal and a second frequency doubling crystal. The baseband light beam from the baseband light source passes through the first lens unit. The first lens unit and the second lens unit control a minimum of baseband light spot position and a minimum of second harmonic light spot position. The first frequency doubling crystal is disposed between the first lens unit and the second lens unit, and located on the minimum of baseband light spot position. The second frequency doubling crystal is disposed between the first lens unit and the second lens unit, and located on the minimum of second harmonic light spot position.

    Abstract translation: 提供了用于从基带光源接收基带光束的UV光发生器。 UV光发生器包括第一透镜单元,第二透镜单元,第一倍频晶体和第二倍频晶体。 来自基带光源的基带光束通过第一透镜单元。 第一透镜单元和第二透镜单元控制最小的基带光点位置和最小二次谐波光点位置。 第一倍频晶体设置在第一透镜单元和第二透镜单元之间,并且位于基带光点位置的最小值上。 第二倍频晶体设置在第一透镜单元和第二透镜单元之间,并且位于第二谐波光点位置的最小值上。

    PHASE SHIFT MASK FOR AVOIDING PHASE CONFLICT
    3.
    发明申请
    PHASE SHIFT MASK FOR AVOIDING PHASE CONFLICT 审中-公开
    用于避免相冲突的相移片

    公开(公告)号:US20080213676A1

    公开(公告)日:2008-09-04

    申请号:US11854510

    申请日:2007-09-12

    CPC classification number: G03F1/30

    Abstract: A phase shift mask comprises a glass substrate with a surface and a metal layer. The glass substrate comprises a first phase section, a second phase section and a border section. The metal layer is covered on the glass substrate and defining a pattern comprising a plurality of parallel lines, the first phase section and the second phase section. The terminal of at least one of the lines is not rectangular and a distance between the tips of the lines in the first phase section are defined to be not less than the width of the first phase section.

    Abstract translation: 相移掩模包括具有表面和金属层的玻璃基板。 玻璃基板包括第一相部分,第二相部分和边界部分。 金属层被覆盖在玻璃基板上并且限定包括多条平行线,第一相段和第二相段的图案。 至少一条线的端子不是矩形的,并且第一相部分中的线的尖端之间的距离被限定为不小于第一相部分的宽度。

    Optical transmitter module
    5.
    发明申请
    Optical transmitter module 有权
    光发射模块

    公开(公告)号:US20050141825A1

    公开(公告)日:2005-06-30

    申请号:US10838258

    申请日:2004-05-05

    CPC classification number: H01L31/02005 H01L31/0203 H01L31/022408

    Abstract: An optical transmitter module includes light-emitting devices with coaxial type packaging. Coplanar anode and cathode electrodes of one light-emitting device are mounted on a substrate so that heat generated from the light-emitting device can be effectively dissipated through the substrate. Furthermore, the direct electric connection between the light-emitting device and the substrate eliminates the requirement of wire boding for electric connection, increasing the performance of the optical transmitter module in high speed signal operation.

    Abstract translation: 光发射机模块包括具有同轴型包装的发光装置。 将一个发光装置的共面阳极和阴极电极安装在基板上,使得可以通过基板有效地散发由发光装置产生的热量。 此外,发光装置与基板之间的直接电连接消除了用于电连接的导线的要求,从而在高速信号操作中增加了光发射模块的性能。

    Optical transmitter module
    7.
    发明授权
    Optical transmitter module 有权
    光发射模块

    公开(公告)号:US07139449B2

    公开(公告)日:2006-11-21

    申请号:US10838258

    申请日:2004-05-05

    CPC classification number: H01L31/02005 H01L31/0203 H01L31/022408

    Abstract: An optical transmitter module includes light-emitting devices with coaxial type packaging. Coplanar anode and cathode electrodes of one light-emitting device are mounted on a substrate so that heat generated from the light-emitting device can be effectively dissipated through the substrate. Furthermore, the direct electric connection between the light-emitting device and the substrate eliminates the requirement of wire boding for electric connection, increasing the performance of the optical transmitter module in high speed signal operation.

    Abstract translation: 光发射机模块包括具有同轴型包装的发光装置。 将一个发光装置的共面阳极和阴极电极安装在基板上,使得可以通过基板有效地散发由发光装置产生的热量。 此外,发光装置与基板之间的直接电连接消除了用于电连接的导线的要求,从而在高速信号操作中增加了光发射模块的性能。

    HIGH-TRANSMISSION ATTENUATING PSM
    9.
    发明申请
    HIGH-TRANSMISSION ATTENUATING PSM 有权
    高传动衰减PSM

    公开(公告)号:US20080274414A1

    公开(公告)日:2008-11-06

    申请号:US11777280

    申请日:2007-07-12

    Applicant: Chih-Li Chen

    Inventor: Chih-Li Chen

    CPC classification number: G03F1/32 G03F1/36 G03F7/70433

    Abstract: An attenuating PSM includes a quartz substrate, a first dummy pad pattern disposed on the quartz substrate, wherein the first dummy pad pattern is composed of a first phase shifter material layer with a transmission rate of greater than or equal to 15%, and a first opaque pattern disposed at a center area of the first dummy pad pattern. The first opaque pattern has a shape that is analogous to the first dummy pad pattern and surface area of the first opaque pattern is smaller than that of the first dummy pad pattern.

    Abstract translation: 衰减PSM包括石英衬底,设置在石英衬底上的第一虚拟衬垫图案,其中第一虚拟衬垫图案由透射率大于或等于15%的第一移相器材料层组成, 不透明图案设置在第一虚拟焊盘图案的中心区域。 第一不透明图案具有类似于第一虚拟衬垫图案的形状,并且第一不透明图案的表面积小于第一虚拟衬垫图案的表面积。

    UV Light Generator
    10.
    发明申请
    UV Light Generator 有权
    紫外光发生器

    公开(公告)号:US20110157684A1

    公开(公告)日:2011-06-30

    申请号:US12841941

    申请日:2010-07-22

    CPC classification number: G02F1/37 G02F2201/16 G02F2201/17

    Abstract: A UV light generator for receiving a baseband light beam from a baseband light source is provided. The UV light generator includes a first lens unit, a second lens unit, a first frequency doubling crystal and a second frequency doubling crystal. The baseband light beam from the baseband light source passes through the first lens unit. The first lens unit and the second lens unit control a minimum of baseband light spot position and a minimum of second harmonic light spot position. The first frequency doubling crystal is disposed between the first lens unit and the second lens unit, and located on the minimum of baseband light spot position. The second frequency doubling crystal is disposed between the first lens unit and the second lens unit, and located on the minimum of second harmonic light spot position.

    Abstract translation: 提供了用于从基带光源接收基带光束的UV光发生器。 UV光发生器包括第一透镜单元,第二透镜单元,第一倍频晶体和第二倍频晶体。 来自基带光源的基带光束通过第一透镜单元。 第一透镜单元和第二透镜单元控制最小的基带光点位置和最小二次谐波光点位置。 第一倍频晶体设置在第一透镜单元和第二透镜单元之间,并且位于基带光点位置的最小值上。 第二倍频晶体设置在第一透镜单元和第二透镜单元之间,并且位于第二谐波光点位置的最小值上。

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