公开(公告)号：US11169359B2

公开(公告)日：2021-11-09

申请号：US16447553

申请日：2019-06-20

申请人： Carl Zeiss SMT GmbH

发明人： Pascal Marsollek ,  Stefan Hembacher

IPC分类号： G02B26/08 ,  G02B7/182 ,  G03F7/20

摘要： For the purposes of positioning a component part, provision is made in an optical system for a stray magnetic field to be detected via a sensor device and for a correction signal for compensating the effect of the stray magnetic field on the positioning of the component part to be ascertained.

公开(公告)号：US20200333557A1

公开(公告)日：2020-10-22

申请号：US16923057

申请日：2020-07-07

申请人： Carl Zeiss SMT GmbH

发明人： Stefan Hembacher ,  Marwene Nefzi

IPC分类号： G02B7/182 ,  G02B5/08 ,  G02B26/08 ,  G03F7/20

摘要： An optical element serves for the beam guidance of imaging light in projection lithography. The optical element has a main body and at least one optical surface carried by the main body. At least one coupling unit is arranged on the main body. The coupling unit serves to attach a compensation weight element for compensating a figure deformation of the optical surface. The result is an optical element which can be provided at the use location with a relatively small figure deformation.

公开(公告)号：US10684551B2

公开(公告)日：2020-06-16

申请号：US16392220

申请日：2019-04-23

申请人： Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

发明人： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC分类号： G03F7/20 ,  G02B5/08 ,  G02B7/18 ,  G02B27/00 ,  G03B27/54 ,  G02B5/00 ,  B82Y10/00 ,  G02B17/06 ,  G21K1/06 ,  G02B3/00

摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US20190310555A1

公开(公告)日：2019-10-10

申请号：US16392220

申请日：2019-04-23

申请人： Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

发明人： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC分类号： G03F7/20 ,  G03B27/54 ,  G02B5/08 ,  G02B5/00 ,  G02B17/06 ,  B82Y10/00 ,  G02B3/00 ,  G21K1/06 ,  G02B27/00 ,  G02B7/18

摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US20190302402A1

公开(公告)日：2019-10-03

申请号：US16447553

申请日：2019-06-20

申请人： Carl Zeiss SMT GmbH

发明人： Pascal Marsollek ,  Stefan Hembacher

IPC分类号： G02B7/182 ,  G03F7/20

摘要： For the purposes of positioning a component part, provision is made in an optical system for a stray magnetic field to be detected via a sensor device and for a correction signal for compensating the effect of the stray magnetic field on the positioning of the component part to be ascertained.

公开(公告)号：US20130114057A1

公开(公告)日：2013-05-09

申请号：US13712576

申请日：2012-12-12

申请人： CARL ZEISS SMT GMBH

发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

公开(公告)号：US20200206855A1

公开(公告)日：2020-07-02

申请号：US16811378

申请日：2020-03-06

申请人： Carl Zeiss SMT GmbH

发明人： Stefan Hembacher

IPC分类号： B23Q5/04 ,  G03F7/20

摘要： When producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography, first, an average value of a global gravitational acceleration is determined. Next, a gravitational acceleration difference between the gravitational acceleration at the production location and the gravitational acceleration average value is determined. After a determination of a target surface shape of a reflection surface of the mirror, a mirror substrate is machined at the production location taking into consideration the gravitational acceleration difference in a manner such that, under the influence of the gravitational acceleration average value, a current surface shape of the reflection surface of the mirror substrate does not deviate from the target surface shape by more than a prescribed figure tolerance value (Pmax). The result is an optical element with a relatively small figure at a use location of the mirror.

公开(公告)号：US09316929B2

公开(公告)日：2016-04-19

申请号：US13754720

申请日：2013-01-30

申请人： Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

发明人： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G02B5/08 ,  G02B7/18 ,  G02B17/06 ,  G02B27/00 ,  G21K1/06 ,  G02B3/00 ,  G02B5/00 ,  G03B27/54

CPC分类号： G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

摘要翻译： 具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多 超过6K。

公开(公告)号：US08659745B2

公开(公告)日：2014-02-25

申请号：US13921312

申请日：2013-06-19

申请人： Carl Zeiss SMT GmbH

发明人： Guido Limbach ,  Franz Sorg ,  Armin Schoeppach ,  Ulrich Weber ,  Ulrich Loering ,  Dirk Hellweg ,  Peter Meyer ,  Stefan Xalter ,  Jens Kugler ,  Bernhard Gellrich ,  Stefan Hembacher ,  Bernhard Geuppert ,  Aksel Goehnermeier

IPC分类号： G03B27/52

CPC分类号： G02B7/004 ,  G02B27/0068 ,  G03F7/70191 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70825

摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.

摘要翻译： 本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。 在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。 操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。 操纵器可以与致动器一起以可变的方式形成。

公开(公告)号：US20210405543A1

公开(公告)日：2021-12-30

申请号：US17354204

申请日：2021-06-22

申请人： Carl Zeiss SMT GmbH

发明人： Marwène Nefzi ,  Stefan Hembacher ,  Stefan Troeger ,  Ralf Zweering ,  Konrad Carl Steimer

IPC分类号： G03F7/20

摘要： An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.