摘要:
A photocurable ink contains a polymerizable compound and a photopolymerization initiator, and this ink contains a low boiling point solvent having a boiling point of 40° C. to 120° C. at one atmospheric pressure and at least one particle having a surface on which an unsaturated hydrocarbon group is provided.
摘要:
A photo-curable ink contains an oil-based liquid containing a polymerizable compound and a photopolymerization initiator, and an aqueous liquid containing water. When the photo-curable ink is stirred at a rotational speed of 15000 rpm or more for 3 minutes and then allowed to stand at 25° C. for one hour or more, droplets formed with the aqueous liquid are dispersed in the oil-based liquid without layer separation between the oil-based liquid and the aqueous liquid.
摘要:
A photocurable ink containing a first liquid containing a polymerizable compound and a photopolymerization initiator, and a second liquid that is incompatible with the first liquid, in which droplets formed by the second liquid are dispersed in the first liquid, wherein the photocurable ink contains first particles and second particles having higher hydrophilicity than that of the first particles, wherein the first particles are adsorbed on an interface between the first liquid and the second liquid, and the second particles are present in the second liquid.
摘要:
A photocurable composition for imprint at least has a polymerizable compound (A) and a photopolymerization initiator (B), in which the polymerizable compound (A) contains 20% by weight or more of a multifunctional (meth)acrylic monomer and the glass transition temperature of a photocured substance of the photocurable composition is 90° C. or more.
摘要:
To provide a patterning method for forming a desired pattern in a reverse process.A patterning method includes a reverse process.A photocurable composition contains at least a polymerizable compound (A) component and a photopolymerization initiator (B) component.The (A) component has a mole fraction weighted average molecular weight of 200 or more and 1000 or less.The (A) component has an Ohnishi parameter (OP) of 3.80 or more.The Ohnishi parameter (OP) of the (A) component is a mole fraction weighted average of N/(NC−NO), wherein N denotes a total number of atoms in a molecule, NC denotes a number of carbon atoms in the molecule, and NO denotes a number of oxygen atoms in the molecule.
摘要:
Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (α1′) that is the components of the curable composition (α1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (α2) discretely onto the layer formed of the curable composition (α1), the curable composition (α1) having a number concentration of particles each having a particle diameter of 0.07 μm or more of less than 2,021 particles/mL, and the curable composition (α1′) having a surface tension larger than that of the curable composition (α2).
摘要:
A photocurable composition contains a polymerizable compound; and a photopolymerization initiator, in which the photocurable composition contains a compound represented by General Formula (1) shown below as the polymerizable compound, and in which, in General Formula (1), Ar represents a monovalent aromatic group which may have a substituent, R1 represents an alkyl group which may have a substituent or a hydrogen atom, R2 represents an alkyl group having (m+n) valences which may have a substituent, m is an integer of 2 or more, and n is an integer of 1 or more.
摘要:
In nanoimprinting processes, photo-cured products often separate from the substrate and stick to the mold due to insufficient adhesion between the photo-cured product and the substrate. This causes a defect of pattern separation.An adhesion layer composition used for forming an adhesion layer between a substrate and a photocurable composition includes a compound (A) having at least two functional groups, and a solvent (B). The functional groups include at least one functional group capable of being bound to the substrate, selected from the group consisting of hydroxy, carboxy, thiol, amino, epoxy, and (blocked) isocyanate, and at least one hydrogen donating group as a functional group capable of being bound to the photocurable composition.
摘要:
In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
摘要:
A photocurable composition contains a polymerizable compound; and a photopolymerization initiator, in which the photocurable composition contains a compound represented by General Formula (1) shown below as the polymerizable compound, and in which, in General Formula (1), Ar represents a monovalent aromatic group which may have a substituent, R1 represents an alkyl group which may have a substituent or a hydrogen atom, R2 represents an alkyl group having (m+n) valences which may have a substituent, m is an integer of 2 or more, and n is an integer of 1 or more.