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    ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS
    1.
    发明申请
    ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS 有权

    公开(公告)号：US20230027406A1

    公开(公告)日：2023-01-26

    申请号：US17788024

    申请日：2021-05-12

    Applicant: BOE TECHNOLOGY GROUP CO., LTD.

    Inventor： Yan WANG ,  Yanqing CHEN ,  Wei LI ,  Ning WANG ,  Weida QIN ,  Zhao ZHANG ,  Jing LI ,  Feng YANG

    IPC: H01L27/12 ,  G02F1/1362 ,  G02F1/1368

    Abstract: A method of manufacturing an array substrate, includes: providing a substrate; forming a gate conductive layer including at least one first alignment mark; forming a source-drain conductive thin film; aligning a first mask and the substrate on which the gate conductive layer and the source-drain conductive thin film have been formed according to the at least one first alignment mark; patterning the source-drain conductive thin film by using the first mask to form at least one second alignment mark to obtain a source-drain conductive layer; forming a black matrix thin film; aligning a second mask and the substrate on which the gate conductive layer, the source-drain conductive layer and the black matrix thin film have been formed according to the at least one second alignment mark; patterning the black matrix thin film by using the second mask to form a black matrix; and forming a color filter layer.

    PHASE SHIFTER AND ANTENNA
    7.
    发明公开
    PHASE SHIFTER AND ANTENNA 审中-公开

    公开(公告)号：US20240283149A1

    公开(公告)日：2024-08-22

    申请号：US18023984

    申请日：2022-02-28

    Applicant: Beijing BOE Sensor Technology Co., Ltd. ,  BOE TECHNOLOGY GROUP CO., LTD.

    Inventor： Di CAO ,  Yan WANG ,  Haocheng JIA ,  Yan LU ,  Guodong FENG ,  Zhifeng ZHANG

    IPC: H01Q3/36 ,  H01P1/18 ,  H01Q1/38

    CPC classification number: H01Q3/36 ,  H01P1/18 ,  H01Q1/38

    Abstract: A phase shifter includes a signal line and a reference electrode respectively disposed on sides of different ones or both disposed on a same side of a same one of a first base plate and a second base plate proximal to a dielectric layer, and includes a straight unit and a bent unit along an extending direction of the signal line. The signal line includes a first signal sub-line corresponding to the straight unit and a second signal sub-line corresponding to the bent unit, and the reference electrode includes a first reference sub-electrode corresponding to the straight unit and a second reference sub-electrode corresponding to the bent unit. The second signal sub-line and the second reference sub-electrode which correspond to the bent unit are configured to make an impedance of the bent unit match to an impedance of the straight unit and/or an impedance of another adjacent bent unit.

    DISPLAY PANEL AND DISPLAY DEVICE
    8.
    发明公开
    DISPLAY PANEL AND DISPLAY DEVICE 审中-公开

    公开(公告)号：US20240219780A1

    公开(公告)日：2024-07-04

    申请号：US18610520

    申请日：2024-03-20

    Applicant: BOE TECHNOLOGY GROUP CO., LTD.

    Inventor： Kai CHEN ,  Yanqing CHEN ,  Ruichao LIU ,  Jie TONG ,  Xiaofeng ZHANG ,  Weida QIN ,  Ning WANG ,  Yan WANG ,  Wei LI ,  Haoyi XIN

    IPC: G02F1/1339 ,  G02F1/1333 ,  G02F1/1335

    CPC classification number: G02F1/13394 ,  G02F1/13338 ,  G02F1/133512 ,  G02F1/133514 ,  G02F1/13396

    Abstract: A display panel includes a display region and a photoelectric sensing region, a plurality of spacer, a plurality of first support pillars, a plurality of second support pillars, and a plurality of third support pillars. The display region is located outside the photoelectric sensing region; and the photoelectric sensing region includes a light transmitting region and a frame area surrounding the light transmitting region, and the frame region includes: a first region, a second region, and a third region. The plurality of the spacers are arranged in an array, and located within the display region, but not located within the light transmitting region. The plurality of the first support pillars are located within the first region. The plurality of the second support pillars are located within the second region. The plurality of the third support pillars are located within the third region.

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