公开(公告)号：US20230038565A1

公开(公告)日：2023-02-09

申请号：US17881833

申请日：2022-08-05

Applicant: Axcelis Technologies, Inc.

Inventor： Causon Jen ,  James S. DeLuca ,  William Bintz

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/20

Abstract: An ion implantation system and method that selectively varies an ion beam energy to a workpiece in sequential passes thereof in front of the beam. The implantation system has an ion source for generating the ion beam and an acceleration/deceleration stage for varying the energy of the ion beam based on an electrical bias supplied to the acceleration deceleration stage. A workpiece support is provided immediately downstream of the acceleration/deceleration stage to support a workpiece through the selectively varied energy ion beam, and can be thermally controlled to control a temperature of the workpiece during the variation of energy of the beam. The energy can be varied while the workpiece is positioned in front of the beam, and a controller can control the electrical bias to control the variation in energy of the ion beam, where a plurality of process recipes can be attained during a single positioning of the workpiece on the workpiece support.

公开(公告)号：US20230038392A1

公开(公告)日：2023-02-09

申请号：US17881020

申请日：2022-08-04

Applicant: Axcelis Technologies, Inc.

Inventor： James S. DeLuca ,  Dwight Roh ,  Patrick Heres ,  Atul Gupta

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/20 ,  H01J37/304 ,  C23C14/48 ,  C23C14/54

Abstract: Ion implantation systems and methods implant varying energies of an ion beam across a workpiece in a serial single-workpiece end station, where electrodes of an acceleration/deceleration stage, bend electrode and/or energy filter control a final energy or path of the ion beam to the workpiece. The bend electrode or an energy filter can form part of the acceleration/deceleration stage or can be positioned downstream. A scanning apparatus scans the ion beam and/or the workpiece, and a power source provides varied electrical bias signals to the electrodes. A controller selectively varies the electrical bias signals concurrent with the scanning of the ion beam and/or workpiece through the ion beam based on a desired ion beam energy at the workpiece. A waveform generator can provide the variation and synchronize the electrical bias signals supplied to the acceleration/deceleration stage, bend electrode and/or energy filter.