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1.发明申请INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE 有权检查由PELLICLE保护的LITHOGRAPHIC MASK公开(公告)号：US20150028203A1
公开(公告)日：2015-01-29
申请号：US13948975
申请日：2013-07-23
CPC分类号： G03F1/86 , G03F1/62 , G21K1/062 , H01J37/28 , H01J2237/164 , H01J2237/2002 , H01J2237/244 , H01J2237/2449 , H01J2237/2809 , H01J2237/2817
摘要： A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask
摘要翻译： 一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子表现出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器
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公开(公告)号：US20190090335A1
公开(公告)日：2019-03-21
申请号：US15708974
申请日：2017-09-19
发明人： Guy Eytan , Emil Weisz , Samuel Ives Nackash , Albert Karabekov
摘要： A computer program product and a method for dissipation of an electrical charge stored in a region of an object. The method may include (a) sensing, by at least one sensor, an electrical charging status of the region of the object, while the object is located within a vacuum chamber and while a gaseous pressure within the vacuum chamber is below a certain vacuum pressure threshold; and (b) performing, based on the charging status of the given region, an electrical charge dissipation process that comprises increasing the gaseous pressure within the vacuum chamber to be within a given gaseous pressure range that facilitates a dissipation, by breakdown, of the electrical charge stored in the region of the object to the vacuum chamber.
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公开(公告)号：US10716197B2
公开(公告)日：2020-07-14
申请号：US15708974
申请日：2017-09-19
发明人： Guy Eytan , Emil Weisz , Samuel Ives Nackash , Albert Karabekov
摘要： A computer program product and a method for dissipation of an electrical charge stored in a region of an object. The method may include (a) sensing, by at least one sensor, an electrical charging status of the region of the object, while the object is located within a vacuum chamber and while a gaseous pressure within the vacuum chamber is below a certain vacuum pressure threshold; and (b) performing, based on the charging status of the given region, an electrical charge dissipation process that comprises increasing the gaseous pressure within the vacuum chamber to be within a given gaseous pressure range that facilitates a dissipation, by breakdown, of the electrical charge stored in the region of the object to the vacuum chamber.
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公开(公告)号：US09366954B2
公开(公告)日：2016-06-14
申请号：US13948975
申请日：2013-07-23
CPC分类号： G03F1/86 , G03F1/62 , G21K1/062 , H01J37/28 , H01J2237/164 , H01J2237/2002 , H01J2237/244 , H01J2237/2449 , H01J2237/2809 , H01J2237/2817
摘要： A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.
摘要翻译： 一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子显示出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器。
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公开(公告)号：US11264202B2
公开(公告)日：2022-03-01
申请号：US16876637
申请日：2020-05-18
发明人： Konstantin Chirko , Itamar Shani , Albert Karabekov , Guy Eytan , Lior Yaron , Alon Litman
IPC分类号： H01J37/244 , H01J37/22 , H01J37/05 , H01J37/20
摘要： A method, a non-transitory computer readable medium and a three-dimensional evaluation system for providing three dimensional information regarding structural elements of a specimen. The method can include illuminating the structural elements with electron beams of different incidence angles, where the electron beams pass through the structural elements and the structural elements are of nanometric dimensions; detecting forward scattered electrons that are scattered from the structural elements to provide detected forward scattered electrons; and generating the three dimensional information regarding structural elements based at least on the detected forward scattered electrons.
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公开(公告)号：US20210358712A1
公开(公告)日：2021-11-18
申请号：US16876637
申请日：2020-05-18
发明人： Konstantin Chirko , Itamar Shani , Albert Karabekov , Guy Eytan , Lior Yaron , Alon Litman
IPC分类号： H01J37/244 , H01J37/22 , H01J37/05 , H01J37/20
摘要： A method, a non-transitory computer readable medium and a three-dimensional evaluation system for providing three dimensional information regarding structural elements of a specimen. The method can include illuminating the structural elements with electron beams of different incidence angles, where the electron beams pass through the structural elements and the structural elements are of nanometric dimensions; detecting forward scattered electrons that are scattered from the structural elements to provide detected forward scattered electrons; and generating the three dimensional information regarding structural elements based at least on the detected forward scattered electrons.
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公开(公告)号：US10156785B2
公开(公告)日：2018-12-18
申请号：US15177226
申请日：2016-06-08
摘要： A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.
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公开(公告)号：US20160282714A1
公开(公告)日：2016-09-29
申请号：US15177226
申请日：2016-06-08
CPC分类号： G03F1/86 , G03F1/62 , G21K1/062 , H01J37/28 , H01J2237/164 , H01J2237/2002 , H01J2237/244 , H01J2237/2449 , H01J2237/2809 , H01J2237/2817
摘要： A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask
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