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公开(公告)号：US20240282632A1
公开(公告)日：2024-08-22
申请号：US18109365
申请日：2023-02-14
发明人： Zachary J. Devereaux , Bhaskar Jyoti Bhuyan , Thomas Joseph Knisley , Zeqing Shen , Susmit Singha Roy , Mark J. Saly , Abhijit Basu Mallick
IPC分类号： H01L21/768 , C23C16/04 , C23C16/32 , C23C16/40 , C23C16/455 , H01L21/02
CPC分类号： H01L21/76897 , C23C16/042 , C23C16/32 , C23C16/402 , C23C16/45527 , H01L21/02126 , H01L21/02164 , H01L21/0228 , H01L21/02304 , H01L21/76802
摘要： A method includes selectively forming at least one passivation layer on at least one first conductive layer disposed in a first interlevel dielectric (ILD) layer, selectively forming at least one catalyst layer on the at least one passivation layer, wherein the at least one passivation layer prevents formation of the at least one catalyst layer on the first conductive layer, and selectively forming at least one supplemental dielectric layer using the at least one catalyst layer. The at least one catalyst layer induces formation of the at least one supplemental dielectric layer, and the at least one supplemental dielectric layer includes a dielectric material having a dielectric constant of less than or equal to about 4.
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公开(公告)号：US20240301549A1
公开(公告)日：2024-09-12
申请号：US18195052
申请日：2023-05-09
发明人： Thomas Joseph Knisley , Bhaskar Jyoti Bhuyan , Mark Saly , Shalini Tripathi , Charles H. Winter , Zachary J. Devereaux
CPC分类号： C23C16/18 , C07F11/005
摘要： Metal complexes with nitrile ligands of the type MO2X2L2, where M is molybdenum or tungsten, X is a halogen, each L is independently an organonitrile ligand with the general formula NCR, where each R is independently a C2-C18 group. Metal complexes with dinitrile bidentate ligands of the type MO2X2L′, where L′ is a dintrile ligand, and dinitrile bridging ligands of the type (MO2X2)2L′, where L′ is a dinitrile bridging ligand connecting the two metal atoms. Methods of making and using the metal complexes are described.
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