公开(公告)号：US20180144966A1

公开(公告)日：2018-05-24

申请号：US15812922

申请日：2017-11-14

Applicant: Applied Materials, Inc.

Inventor： Kyung-Tae KIM ,  Su Ho CHO ,  Tsunehiko KITAMURA ,  Shinobu ABE ,  Shuran SHENG

IPC: H01L21/677

Abstract: In one embodiment, a chamber is provided that includes a chamber body and a lid defining an interior volume, a frame within the interior volume, the frame sized to receive a plurality of substrates in a first orientation, and a rotational drive assembly coupled to the frame for rotating the frame and flipping each of the plurality of substrates to a second orientation that is different than the first orientation.

公开(公告)号：US20170069493A1

公开(公告)日：2017-03-09

申请号：US15256054

申请日：2016-09-02

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Su Ho CHO

IPC: H01L21/02 ,  C23C16/52 ,  C23C16/455 ,  C23C16/515 ,  C23C16/24 ,  C23C16/505

CPC classification number: C23C16/52 ,  C23C16/24 ,  C23C16/45523 ,  C23C16/45565 ,  C23C16/5096 ,  C23C16/515 ,  H01J37/32 ,  H01J37/32146 ,  H01J37/32357 ,  H01J37/32449 ,  H01L21/02532 ,  H01L21/0259 ,  H01L21/0262

Abstract: The present disclosure generally relates to an improved method for forming low resistivity crystalline silicon films for display devices. The processing chamber in which the low resistivity crystalline silicon film is formed is pressurized to a predetermined pressure and a radio frequency power at a predetermined power level is delivered to the processing chamber. In addition, feeding locations of one or more VHF power generator and controlling of each VHF power generator via phase modulation and sweeping allows for plasma uniformity improvements by compensating for the non-uniformity of the thin film patterns produced by the chamber, due to the standing wave effect. Diffuser plate having two curved surfaces helps improve crystallinity uniformity.

Abstract translation: 本公开总体上涉及用于形成用于显示装置的低电阻率晶体硅膜的改进方法。 其中形成低电阻率晶体硅膜的处理室被加压到预定压力，并且将预定功率电平的射频功率传送到处理室。 另外，通过相位调制和扫描，一个或多个VHF功率发生器的馈电位置和每个VHF发电机的控制允许通过补偿腔室产生的薄膜图案的不均匀性而改善等离子体均匀性 波浪效应。 具有两个曲面的扩散板有助于提高结晶度的均匀性。

公开(公告)号：US20150333213A1

公开(公告)日：2015-11-19

申请号：US14698395

申请日：2015-04-28

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Lin ZHANG ,  Su Ho CHO

IPC: H01L31/18 ,  C23C16/505 ,  C23C16/26

CPC classification number: C23C16/26 ,  C23C16/4581 ,  C23C16/505 ,  H01L21/68757 ,  H01L21/68771 ,  H01L31/1876

Abstract: A substrate carrier having a diamond-like carbon coating disposed thereon is provided. The diamond-like carbon coating may have the property of being substantially resistant to commonly used cleaning processes performed during the fabrication of photovoltaic cells, such as cleaning processes using an NF3 plasma. Additionally, a method of forming a diamond-like carbon coating on a substrate carrier is provided. The method includes positioning a substrate carrier in a processing chamber and forming a diamond-like carbon coating thereon. Forming the diamond-like carbon coating includes flowing a carbon-containing gas into a processing chamber and dissociating the carbon-containing gas. Furthermore, a method of quick removal of diamond-like carbon coatings from processing chamber walls, processing chamber components, substrate carriers, and other objects is provided.

Abstract translation: 提供了其上设置有类金刚石碳涂层的基板载体。 类金刚石碳涂层可具有基本上抵抗在光伏电池制造期间所执行的常用清洁工艺的性质，例如使用NF 3等离子体的清洁工艺。 另外，提供了在基板载体上形成类金刚石碳涂层的方法。 该方法包括将衬底载体定位在处理室中并在其上形成类金刚石碳涂层。 形成类金刚石碳涂层包括使含碳气体流入处理室并解离含碳气体。 此外，提供了从处理室壁，处理室部件，基板载体和其它物体中快速去除类金刚石碳涂层的方法。

公开(公告)号：US20210280389A1

公开(公告)日：2021-09-09

申请号：US16321660

申请日：2017-07-31

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Shinobu ABE ,  Keita KUWAHARA ,  Su Ho CHO

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/505

Abstract: Embodiments disclosed herein generally relate to a plasma processing system for modifying the uniformity pattern of a thin film deposited in a plasma processing chamber which includes at least one VHF power generator coupled to a diffuser within the plasma processing chamber. The feeding location offset of each VHF power generator and the controlling of each VHF power generator via phase modulation and sweeping allows for plasma uniformity improvements by compensating for the non-uniformity of the thin film patterns produced by the chamber, due to the standing wave effect. The power distribution between the multiple VHF power generators coupled to and/or disposed at different locations on the backing plate may be produced by dynamic phase modulation between the VHF power applied at the different coupling points.

公开(公告)号：US20190252161A1

公开(公告)日：2019-08-15

申请号：US15898133

申请日：2018-02-15

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Shinobu ABE ,  Keita KUWAHARA ,  Chang Hee SHIN ,  Su Ho CHO

IPC: H01J37/32 ,  C23C16/509

CPC classification number: H01J37/32669 ,  C23C16/509 ,  H01J37/32183 ,  H01J37/3244 ,  H01J2237/3321 ,  H01J2237/3323

Abstract: An apparatus for plasma processing of substrates is disclosed. A plasma processing chamber is provided which includes a chamber body and a lid. The lid includes a faceplate coupled to a backing plate. The faceplate and the backing plate are disposed within a processing volume defined by the chamber body and the lid. One or more ferrite blocks are coupled to the backing plate to modulate an electromagnetic field created by an RF current from an RF generator. A gas feed assembly including a gas source, a remote plasma source, and a zero field feed through are coupled to, and in fluid communication with, the processing volume through the backing plate and faceplate.