公开(公告)号：US20160020454A1

公开(公告)日：2016-01-21

申请号：US14773146

申请日：2014-03-06

Applicant: APPLIED MATERIALS, INC.

Inventor： Fei C. WANG ,  Hooman BOLANDI ,  Connie P. WANG ,  Victor PEBENITO ,  Siqing LU ,  Michael C. KUTNEY ,  Joseph G. GORDON ,  Robert Z. BACHRACH

IPC: H01M4/04 ,  H01M4/1397 ,  B05B5/025 ,  H01M4/1393 ,  H01M4/36 ,  H01M4/1391 ,  H01M4/1395

CPC classification number: H01M4/0419 ,  B05B5/025 ,  B05B13/0221 ,  H01M4/0404 ,  H01M4/139 ,  H01M4/1391 ,  H01M4/1393 ,  H01M4/1395 ,  H01M4/1397 ,  H01M4/366

Abstract: A method and apparatus for forming battery active material on a substrate are disclosed. In one embodiment, an apparatus for depositing a battery active material on a surface of a substrate includes a substrate conveyor system for transporting the substrate within the apparatus, a material spray assembly disposed above the substrate conveyor system, and a first heating element disposed adjacent to the material spray assembly above the substrate conveyor system configured to heat the substrate. The material spray assembly has a 2-D array of nozzles configured to electrospray an electrode forming solution on the surface of the substrate.

Abstract translation: 公开了一种在衬底上形成电池活性材料的方法和装置。 在一个实施例中，用于在基板的表面上沉积电池活性材料的装置包括用于在设备内输送基板的基板输送机系统，设置在基板输送系统上方的材料喷涂组件和与基板输送系统相邻设置的第一加热元件 该基材输送系统上方的材料喷涂组件构造成加热该基材。 材料喷射组件具有被配置成在衬底的表面上电喷雾电极形成溶液的喷嘴的2-D阵列。

公开(公告)号：US20220336182A1

公开(公告)日：2022-10-20

申请号：US17232078

申请日：2021-04-15

Applicant: Applied Materials, Inc.

Inventor： Abhishek CHOWDHURY ,  Nataraj BHASKAR RAO ,  Siqing LU ,  Ravikumar PATIL

IPC: H01J37/08 ,  H01J37/32 ,  H01J37/248

Abstract: Embodiments of a lift apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a lift apparatus includes: a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly; a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly; an actuator; and a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.

公开(公告)号：US20250118580A1

公开(公告)日：2025-04-10

申请号：US18377028

申请日：2023-10-05

Applicant: Applied Materials, Inc.

Inventor： Mingle TONG ,  Siqing LU

IPC: H01L21/67 ,  H01L21/677

Abstract: Methods, systems, and apparatus are provided for detecting a substrate in a chamber of a substrate processing system. In some embodiments, the system may include a sensor system comprising: a light source configured to generate light; a first light guide fixed relative to the light source and having a light input and a light output offset from the light input, the light input configured to receive light generated by the light source, wherein the first light guide guides the light between the light input and the light output so that the light output emits a light beam into a volume of the chamber; and a sensor configured to sense the light beam emitted from the light output.

公开(公告)号：US20220157635A1

公开(公告)日：2022-05-19

申请号：US16951823

申请日：2020-11-18

Applicant: APPLIED MATERIALS, INC.

Inventor： Abhishek CHOWDHURY ,  Harisha SATHYANARAYANA ,  Edwin C. SUAREZ ,  Siqing LU ,  Nataraj BHASKAR RAO

IPC: H01L21/683 ,  H01L21/67 ,  C23C16/455 ,  C23C16/458 ,  H01L21/02

Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a cover ring for use in a process chamber includes: an annular body that includes an upper surface and a lower surface, an inner lip extending radially inward and downward from the annular body, and a plurality of protrusions extending downward from the inner lip and disposed at regular intervals along the inner lip, wherein lowermost surfaces of the plurality of protrusions together define a planar substrate contact surface.

公开(公告)号：US20220157572A1

公开(公告)日：2022-05-19

申请号：US16951805

申请日：2020-11-18

Applicant: Applied Materials, Inc.

Inventor： Abhishek CHOWDHURY ,  Edwin C. SUAREZ ,  Harisha SATHYANARAYANA ,  Nataraj BHASKAR RAO ,  Siqing LU

IPC: H01J37/32 ,  C23C14/34 ,  C23C14/35 ,  C23C14/50 ,  C23C16/458

Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a deposition ring including a first portion having an first inner ledge and a second portion having a second inner ledge, wherein in a first position, the first portion is spaced from the second portion, and wherein in a second position, the second portion is configured to engage the first portion so that the first inner ledge is aligned with the second inner ledge along a common plane to form a clamping surface.