公开(公告)号：US20220336182A1

公开(公告)日：2022-10-20

申请号：US17232078

申请日：2021-04-15

Applicant: Applied Materials, Inc.

Inventor： Abhishek CHOWDHURY ,  Nataraj BHASKAR RAO ,  Siqing LU ,  Ravikumar PATIL

IPC: H01J37/08 ,  H01J37/32 ,  H01J37/248

Abstract: Embodiments of a lift apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a lift apparatus includes: a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly; a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly; an actuator; and a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.

公开(公告)号：US20240240322A1

公开(公告)日：2024-07-18

申请号：US18096533

申请日：2023-01-12

Applicant: Applied Materials, Inc.

Inventor： Abhishek CHOWDHURY ,  Edwin C. SUAREZ ,  Xiaozhou CHE ,  Arun Chakravarthy CHAKRAVARTHY ,  Harisha SATHYANARAYANA ,  Nataraj BHASKAR RAO

IPC: C23C16/52 ,  C23C16/455 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/45565 ,  C23C16/4585

Abstract: Embodiments of process chambers are provided herein. In some embodiments, a process chamber includes: a chamber body having a bottom plate, a lid, and sidewalls extending from the bottom plate to the lid, wherein one of the sidewalls includes a shutter recess, wherein the chamber body and the shutter recess define an interior volume of the process chamber; a substrate support for supporting a substrate disposed in the interior volume; a showerhead disposed in the interior volume opposite the substrate support; and a shutter cover having a shutter disk coupled to a shutter arm, wherein the shutter cover is disposed in the interior volume and rotatably coupled to the chamber body between a home position and a cover position, wherein in the home position, the shutter cover is at least partially disposed in the shutter recess, and wherein in the cover position, the shutter cover extends over the substrate support.

公开(公告)号：US20240044002A1

公开(公告)日：2024-02-08

申请号：US17881428

申请日：2022-08-04

Applicant: Applied Materials, Inc.

Inventor： Abhishek CHOWDHURY ,  Nataraj BHASKAR RAO ,  Edwin C. SUAREZ ,  Harisha SATHYANARAYANA ,  Diego Ramiro PUENTE SOTOMAYOR ,  Qanit TAKMEEL ,  Mohammad Kamruzzaman CHOWDHURY ,  Arun Chakravarthy CHAKRAVARTHY

IPC: C23C16/458

CPC classification number: C23C16/4581 ,  C23C16/4585

Abstract: A substrate handling system includes a fixed deposition ring having a plurality of circumferentially spaced notches along an outer edge of the fixed deposition ring, the fixed deposition ring being electrically non-conductive; a moving deposition ring having a plurality of circumferentially spaced recesses formed on a lower surface of the moving deposition ring, the recesses configured to radially align with the notches of the fixed deposition ring, the moving deposition ring having an inner edge and an outer edge, the moving deposition ring being electrically non-conductive; and a plurality of electrically conductive grounding plates each having a base, an intermediate member, and a contact extending from the intermediate member and being spaced from the base, the intermediate members configured to be received in the recesses and extend between the inner edge and the outer edge of the moving deposition ring.

公开(公告)号：US20220157635A1

公开(公告)日：2022-05-19

申请号：US16951823

申请日：2020-11-18

Applicant: APPLIED MATERIALS, INC.

Inventor： Abhishek CHOWDHURY ,  Harisha SATHYANARAYANA ,  Edwin C. SUAREZ ,  Siqing LU ,  Nataraj BHASKAR RAO

IPC: H01L21/683 ,  H01L21/67 ,  C23C16/455 ,  C23C16/458 ,  H01L21/02

Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a cover ring for use in a process chamber includes: an annular body that includes an upper surface and a lower surface, an inner lip extending radially inward and downward from the annular body, and a plurality of protrusions extending downward from the inner lip and disposed at regular intervals along the inner lip, wherein lowermost surfaces of the plurality of protrusions together define a planar substrate contact surface.

公开(公告)号：US20220157572A1

公开(公告)日：2022-05-19

申请号：US16951805

申请日：2020-11-18

Applicant: Applied Materials, Inc.

Inventor： Abhishek CHOWDHURY ,  Edwin C. SUAREZ ,  Harisha SATHYANARAYANA ,  Nataraj BHASKAR RAO ,  Siqing LU

IPC: H01J37/32 ,  C23C14/34 ,  C23C14/35 ,  C23C14/50 ,  C23C16/458

Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a deposition ring including a first portion having an first inner ledge and a second portion having a second inner ledge, wherein in a first position, the first portion is spaced from the second portion, and wherein in a second position, the second portion is configured to engage the first portion so that the first inner ledge is aligned with the second inner ledge along a common plane to form a clamping surface.