公开(公告)号：US20180211820A1

公开(公告)日：2018-07-26

申请号：US15866506

申请日：2018-01-10

Applicant: Applied Materials, Inc.

Inventor： Gopu KRISHNA ,  Ravikumar PATIL ,  Hanish Kumar PANAVALAPPIL KUMARANKUTTY ,  Somil KAPADIA ,  Sonny KUNNAKKAT

IPC: H01J37/32 ,  C23C16/50 ,  C23C16/458 ,  C23C16/44

Abstract: Implementations of the present disclosure generally relate to apparatus and methods for uniform deposition of thin films on substrates. In one implementation, a plasma-processing chamber comprises a chamber body including chamber walls, a chamber floor, and a lid support. The plasma-processing chamber further comprises a substrate support assembly at least partially disposed within the chamber body and configured to support a substrate. The plasma-processing chamber further comprises a lid assembly disposed over the support assembly and positioned on the lid support wherein the lid assembly and the chamber body define a first processing volume. The plasma-processing chamber further comprises a bottom isolation assembly that circumscribes at least a portion of the substrate support assembly and is vertically movable from a loading position to a processing position. A seal is formed between the bottom isolation assembly and the lid assembly when the bottom isolation assembly is in the processing position.

公开(公告)号：US20220336182A1

公开(公告)日：2022-10-20

申请号：US17232078

申请日：2021-04-15

Applicant: Applied Materials, Inc.

Inventor： Abhishek CHOWDHURY ,  Nataraj BHASKAR RAO ,  Siqing LU ,  Ravikumar PATIL

IPC: H01J37/08 ,  H01J37/32 ,  H01J37/248

Abstract: Embodiments of a lift apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a lift apparatus includes: a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly; a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly; an actuator; and a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.