公开(公告)号：US20190311884A1

公开(公告)日：2019-10-10

申请号：US16374835

申请日：2019-04-04

Applicant: Applied Materials, Inc.

Inventor： Satoru KOBAYASHI ,  Wei TIAN ,  Shahid RAUF ,  Junghoon KIM ,  Soonam PARK ,  Dmitry LUBOMIRSKY

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/52

Abstract: A method, system, and apparatus for reducing particle generation on a showerhead during an ion bombarding process in a process chamber are provided. First and second RF signals are supplied from an RF generator to an electrode embedded in a substrate support in the process chamber. The second RF signal is adjusted relative to the first RF signal in response to a measurement of a first RF amplitude, a second RF amplitude, a first RF phase, and a second RF phase. Ion bombardment on a substrate is maximized and the quantity of particles generated on the showerhead is minimized. Methods and systems described herein provide for improved ion etching characteristics while reducing the amount of debris particles generated from the showerhead.

公开(公告)号：US20170236693A1

公开(公告)日：2017-08-17

申请号：US15582282

申请日：2017-04-28

Applicant: Applied Materials, Inc.

Inventor： Satoru KOBAYASHI ,  Kirby HANE FLOYD ,  Hiroji HANAWA ,  Soonam PARK ,  Dmitry LUBOMIRSKY

IPC: H01J37/32 ,  H02K7/14

Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.

公开(公告)号：US20200161093A1

公开(公告)日：2020-05-21

申请号：US16663215

申请日：2019-10-24

Applicant: Applied Materials, Inc.

Inventor： Xiaopu LI ,  Kallol BERA ,  Edward P. HAMMOND, IV ,  Jonghoon BAEK ,  Amit Kumar BANSAL ,  Jun MA ,  Satoru KOBAYASHI

IPC: H01J37/32 ,  C23C16/505

Abstract: Embodiments described herein relate to apparatus and techniques for radio frequency (RF) phase control in a process chamber. A process volume is defined in the process chamber by a faceplate electrode and a support pedestal. A grounding bowl is disposed within the process chamber about the support pedestal opposite the process volume. The grounding bowl substantially fills a volume other than the process volume below the support pedestal. A phase tuner circuit is coupled to an RF mesh disposed in the support pedestal and the faceplate electrode. The tuner circuit adjusts a phase difference between a phase of the faceplate electrode and a phase of the RF mesh.

公开(公告)号：US20150083042A1

公开(公告)日：2015-03-26

申请号：US14091057

申请日：2013-11-26

Applicant: Applied Materials, Inc.

Inventor： Satoru KOBAYASHI ,  Kirby Hane FLOYD ,  Hiroji HANAWA ,  Soonam PARK ,  Dmitry LUBOMIRSKY

IPC: H01L21/687

CPC classification number: H01J37/32697 ,  H01J37/32082 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32715 ,  H01J37/32724 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/68792 ,  H02K7/14

Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.

Abstract translation: 基板支撑组件包括轴组件，联接到轴组件的一部分的基座和联接到轴组件的第一旋转连接器，其中第一旋转连接器包括围绕可旋转轴构件的第一线圈构件，该第一线圈构件电耦合 所述第一线圈构件能够与所述可旋转轴一起旋转，所述第一线圈构件围绕所述第一线圈构件，所述第二线圈构件相对于所述第一线圈构件是固定的，其中所述第一线圈构件与所述第二线圈构件电耦合， 线圈构件，并且通过轴组件向基座提供射频信号/功率。