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    ELECTROSTATIC FILTER WITH SHAPED ELECTRODES
    1.
    发明申请
    ELECTROSTATIC FILTER WITH SHAPED ELECTRODES 有权

    公开(公告)号：US20210090845A1

    公开(公告)日：2021-03-25

    申请号：US16575969

    申请日：2019-09-19

    Applicant: APPLIED Materials, Inc.

    Inventor： Robert C. Lindberg ,  Alexandre Likhanskii ,  Wayne LeBlanc ,  Frank Sinclair ,  Svetlana Radovanov

    IPC: H01J37/12 ,  H01J37/147 ,  H01J37/24 ,  H01J37/317

    Abstract: Provided herein are approaches for controlling an ion beam using an electrostatic filter with curved electrodes. In some embodiments, a system may include an electrostatic filter receiving an ion beam, the filter including first and second electrodes disposed opposite sides of an ion beam line, each of the first and second electrodes having a central region between first and second ends, wherein a distance between a first outer surface of the first electrode and a second outer surface of the second electrode varies along an electrode length axis extending between the first and second ends. The system may further include a power supply in communication with the electrostatic filter, the power supply operable to supply a voltage and a current to the first and second electrodes, wherein the variable distance between the first and second outer surfaces causes the ion beam to converge or diverge.

    Crucible design for liquid metal in an ion source
    4.
    发明授权
    Crucible design for liquid metal in an ion source 有权

    公开(公告)号：US11854760B2

    公开(公告)日：2023-12-26

    申请号：US17353171

    申请日：2021-06-21

    Applicant: Applied Materials, Inc.

    Inventor： Graham Wright ,  Eric Donald Wilson ,  Daniel Alvarado ,  Robert C. Lindberg ,  Jacob Mullin

    IPC: H01J27/02 ,  H01J27/14

    CPC classification number: H01J27/022 ,  H01J27/14

    Abstract: A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.

    Crucible Design For Liquid Metal In An Ion Source
    6.
    发明申请
    Crucible Design For Liquid Metal In An Ion Source 有权

    公开(公告)号：US20220406554A1

    公开(公告)日：2022-12-22

    申请号：US17353171

    申请日：2021-06-21

    Applicant: Applied Materials, Inc.

    Inventor： Graham Wright ,  Eric Donald Wilson ,  Daniel Alvarado ,  Robert C. Lindberg ,  Jacob Mullin

    IPC: H01J27/02 ,  H01J27/14

    Abstract: A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.

    ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION
    7.
    发明申请
    ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION 有权

    公开(公告)号：US20210183609A1

    公开(公告)日：2021-06-17

    申请号：US16714097

    申请日：2019-12-13

    Applicant: APPLIED Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Antonella Cucchetti ,  Eric D. Hermanson ,  Frank Sinclair ,  Jay T. Scheuer ,  Robert C. Lindberg

    IPC: H01J37/12 ,  H01J37/24 ,  H01J37/32 ,  H01J37/30 ,  H01L21/425

    Abstract: Provided herein are approaches for decreasing particle generation in an electrostatic lens. In some embodiments, an ion implantation system may include an electrostatic lens including an entrance for receiving an ion beam and an exit for delivering the ion beam towards a target, the electrostatic lens including a first terminal electrode, a first suppression electrode, and a first ground electrode disposed along a first side of an ion beamline, wherein the first ground electrode is grounded and positioned adjacent the exit. The electrostatic lens may further include a second terminal electrode, a second suppression electrode, and a second ground electrode disposed along a second side of the ion beamline, wherein the second ground electrode is grounded and positioned adjacent the exit. The implantation system may further include a power supply operable to supply a voltage and a current to the electrostatic lens for controlling the ion beam.

    Variable Thickness Ion Source Extraction Plate
    9.
    发明申请
    Variable Thickness Ion Source Extraction Plate 有权

    公开(公告)号：US20230080083A1

    公开(公告)日：2023-03-16

    申请号：US17473096

    申请日：2021-09-13

    Applicant: Applied Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Alexander S. Perel ,  Jay T. Scheuer ,  Bon-Woong Koo ,  Robert C. Lindberg ,  Peter F. Kurunczi ,  Graham Wright

    IPC: H01J27/02 ,  H01J37/08

    Abstract: An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the extraction aperture in certain regions. This increases the loss area in those regions, which serves as a sink for ions and electrons. In this way, the plasma density is decreased more significantly in the regions where the extraction aperture has a greater thickness. The shape of the protrusion may be modified to achieve the desired plasma uniformity. Thus, it may be possible to create an extracted ion beam having a more uniform ion density. In some tests, the uniformity of the beam current along the width direction was improved by between 20% and 50%.

    Electrostatic filter providing reduced particle generation
    10.
    发明授权
    Electrostatic filter providing reduced particle generation 有权

    公开(公告)号：US11437215B2

    公开(公告)日：2022-09-06

    申请号：US16714097

    申请日：2019-12-13

    Applicant: APPLIED Materials, Inc.

    Inventor： Alexandre Likhanskii ,  Antonella Cucchetti ,  Eric D. Hermanson ,  Frank Sinclair ,  Jay T. Scheuer ,  Robert C. Lindberg

    IPC: H01J37/12 ,  H01J37/24 ,  H01J37/30 ,  H01L21/425 ,  H01J37/32 ,  H01J37/08

    Abstract: Provided herein are approaches for decreasing particle generation in an electrostatic lens. In some embodiments, an ion implantation system may include an electrostatic lens including an entrance for receiving an ion beam and an exit for delivering the ion beam towards a target, the electrostatic lens including a first terminal electrode, a first suppression electrode, and a first ground electrode disposed along a first side of an ion beamline, wherein the first ground electrode is grounded and positioned adjacent the exit. The electrostatic lens may further include a second terminal electrode, a second suppression electrode, and a second ground electrode disposed along a second side of the ion beamline, wherein the second ground electrode is grounded and positioned adjacent the exit. The implantation system may further include a power supply operable to supply a voltage and a current to the electrostatic lens for controlling the ion beam.

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