公开(公告)号：US20180182599A1

公开(公告)日：2018-06-28

申请号：US15904231

申请日：2018-02-23

Applicant: Applied Materials, Inc.

Inventor： Michael W. Stowell ,  Qiwei Liang

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32009 ,  H01J37/32082 ,  H01J37/32119 ,  H01J37/32192 ,  H01J37/32238

Abstract: A gas distribution plate for a plasma reactor has a dielectric front plate and a dielectric back plate bonded together, with gas injection orifices extending through the front plate and gas supply channels in the surface of front plate facing the back plate. The back plate is joined to a heat reflective plate, or the back plate itself is formed of a heat reflective material, such as Beryllium Oxide.

公开(公告)号：US20160196955A1

公开(公告)日：2016-07-07

申请号：US14609883

申请日：2015-01-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael W. Stowell

IPC: H01J37/32 ,  H01Q13/00

CPC classification number: H01J37/3222 ,  H01J37/32192 ,  H01J37/32229 ,  H01Q13/22

Abstract: A microwave antenna includes a first spiral conduit having a first conduit end, first plural ports in a floor of the first spiral conduit spaced apart along the length of the first spiral conduit; an axial conduit coupled to a rotatable stage; and a distributor waveguide comprising an input coupled to the axial conduit and a first output coupled to the first conduit end.

Abstract translation: 微波天线包括具有第一导管端的第一螺旋导管，第一螺旋导管的底板中的第一多个端口沿着第一螺旋导管的长度间隔开; 耦合到可旋转台的轴向导管; 以及分配器波导，其包括耦合到所述轴向导管的输入端和耦合到所述第一导管端的第一输出端。

公开(公告)号：US10858727B2

公开(公告)日：2020-12-08

申请号：US15600247

申请日：2017-05-19

Applicant: Applied Materials, Inc.

Inventor： Jingjing Liu ,  Zhong Qiang Hua ,  Adolph Miller Allen ,  Michael W. Stowell ,  Srinivas D. Nemani ,  Chentsau Ying ,  Bhargav Citla ,  Viachslav Babayan ,  Andrej Halabica

IPC: H01J37/34 ,  C23C14/06 ,  C23C14/35 ,  H01J37/32 ,  C23C14/54 ,  H01L21/311 ,  H01L21/02 ,  H01L21/033 ,  C23C14/34

Abstract: A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.

公开(公告)号：US10438849B2

公开(公告)日：2019-10-08

申请号：US15137245

申请日：2016-04-25

Applicant: APPLIED MATERIALS, INC.

Inventor： He Ren ,  Jie Zhou ,  Guannan Chen ,  Michael W. Stowell ,  Bencherki Mebarki ,  Mehul Naik ,  Srinivas D. Nemani ,  Nikolaos Bekiaris ,  Zhiyuan Wu

IPC: H01L21/768 ,  H01L21/285 ,  H01L23/532

Abstract: An integrated circuit is fabricated by chemical vapor deposition or atomic layer deposition of a metal film to metal film.

公开(公告)号：US09905400B2

公开(公告)日：2018-02-27

申请号：US14516998

申请日：2014-10-17

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael W. Stowell ,  Qiwei Liang

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32009 ,  H01J37/32082 ,  H01J37/32119 ,  H01J37/32192 ,  H01J37/32238

Abstract: A gas distribution plate for a plasma reactor has a dielectric front plate and a dielectric back plate bonded together, with gas injection orifices extending through the front plate and gas supply channels in the surface of front plate facing the back plate. The back plate is joined to a heat reflective plate, or the back plate itself is formed of a heat reflective material, such as Beryllium Oxide.

公开(公告)号：US10685812B2

公开(公告)日：2020-06-16

申请号：US15907102

申请日：2018-02-27

Applicant: Applied Materials, Inc.

Inventor： Michael W. Stowell

IPC: H01J37/32 ,  H01Q13/22

Abstract: A microwave antenna includes a first spiral conduit having a first conduit end, first plural ports in a floor of the first spiral conduit spaced apart along the length of the first spiral conduit; an axial conduit coupled to a rotatable stage; and a distributor waveguide comprising an input coupled to the axial conduit and a first output coupled to the first conduit end.

公开(公告)号：US20180352617A1

公开(公告)日：2018-12-06

申请号：US16045599

申请日：2018-07-25

Applicant: Applied Materials, Inc.

Inventor： Michael W. Stowell ,  Qiwei Liang

IPC: H05B6/80 ,  H05B6/72 ,  H05B6/70 ,  H05B6/64

CPC classification number: H05B6/80 ,  H05B6/6402 ,  H05B6/642 ,  H05B6/707 ,  H05B6/725 ,  H05B6/806

Abstract: In a processing reactor having a microwave plasma source, the microwave radiator is mounted on a rotary microwave coupling for continuous rotation.

公开(公告)号：US10039157B2

公开(公告)日：2018-07-31

申请号：US14293123

申请日：2014-06-02

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael W. Stowell ,  Qiwei Liang

IPC: H05B6/74 ,  H05B6/72 ,  H05B6/80 ,  H05B6/64 ,  H05B6/70

CPC classification number: H05B6/80 ,  H05B6/6402 ,  H05B6/642 ,  H05B6/707 ,  H05B6/725 ,  H05B6/806

Abstract: In a processing reactor having a microwave plasma source, the microwave radiator is mounted on a rotary microwave waveguide coupling for continuous rotation, to form the reactor for processing a workpiece.

公开(公告)号：US20180190472A1

公开(公告)日：2018-07-05

申请号：US15907102

申请日：2018-02-27

Applicant: Applied Materials, Inc.

Inventor： Michael W. Stowell

IPC: H01J37/32 ,  H01Q13/22

Abstract: A microwave antenna includes a first spiral conduit having a first conduit end, first plural ports in a floor of the first spiral conduit spaced apart along the length of the first spiral conduit; an axial conduit coupled to a rotatable stage; and a distributor waveguide comprising an input coupled to the axial conduit and a first output coupled to the first conduit end.

公开(公告)号：US20150371828A1

公开(公告)日：2015-12-24

申请号：US14313173

申请日：2014-06-24

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael W. Stowell

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/511

CPC classification number: H01J37/32192 ,  C23C16/4405 ,  H01J37/3222 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32449 ,  H01J37/32633 ,  H01J37/32862

Abstract: A remote plasma source has an array of low cost microwave magnetron heads coupled to individual conical, horn or other microwave emitter antennas above a gas shower head of a workpiece processing chamber.

Abstract translation: 远程等离子体源具有耦合到工件处理室的气体喷头之上的各个锥形，喇叭或其它微波发射器天线的低成本微波磁控管阵列。