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Invention Application
US20150371828A1 LOW COST WIDE PROCESS RANGE MICROWAVE REMOTE PLASMA SOURCE WITH MULTIPLE EMITTERS 审中-公开
低成本微波过程微波远程等离子体源与多个发光二极管

  • Patent Title: LOW COST WIDE PROCESS RANGE MICROWAVE REMOTE PLASMA SOURCE WITH MULTIPLE EMITTERS
  • Patent Title (中): 低成本微波过程微波远程等离子体源与多个发光二极管
  • Application No.: US14313173
    Application Date: 2014-06-24
  • Publication No.: US20150371828A1
    Publication Date: 2015-12-24
  • Inventor: Michael W. Stowell
  • Applicant: APPLIED MATERIALS, INC.
  • Main IPC: H01J37/32
  • IPC: H01J37/32 ;  C23C16/455 ;  C23C16/511
LOW COST WIDE PROCESS RANGE MICROWAVE REMOTE PLASMA SOURCE WITH MULTIPLE EMITTERS
Abstract:
A remote plasma source has an array of low cost microwave magnetron heads coupled to individual conical, horn or other microwave emitter antennas above a gas shower head of a workpiece processing chamber.
Abstract(Chinese):

远程等离子体源具有耦合到工件处理室的气体喷头之上的各个锥形，喇叭或其它微波发射器天线的低成本微波磁控管阵列。

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