公开(公告)号：US20230187204A1

公开(公告)日：2023-06-15

申请号：US17844189

申请日：2022-06-20

Applicant: Applied Materials, Inc.

Inventor： Xiaodong Wang ,  Kevin Kashefi ,  Rongjun Wang ,  Shi You ,  Keith T. Wong ,  Yuchen Liu ,  Ya-Hsi Hwang ,  Jean Lu

IPC: H01L21/02 ,  H01L21/285

CPC classification number: H01L21/0234 ,  H01L21/28568

Abstract: Provided are methods for pre-cleaning a substrate. A substrate having tungsten oxide (WOx) thereon is soaked in tungsten fluoride (WF6), which reduces the tungsten oxide (WOx) to tungsten (W). Subsequently, the substrate is treated with hydrogen, e.g., plasma treatment or thermal treatment, to reduce the amount of fluorine present so that fluorine does not invade the underlying insulating layer.

公开(公告)号：US11802349B2

公开(公告)日：2023-10-31

申请号：US17016614

申请日：2020-09-10

Applicant: Applied Materials, Inc.

Inventor： Zihao Yang ,  Mingwei Zhu ,  Nag B. Patibandla ,  Yong Cao ,  Shumao Zhang ,  Zhebo Chen ,  Jean Lu ,  Daniel Lee Diehl ,  Xianmin Tang

IPC: C23C14/58 ,  C23C14/34 ,  C23C14/54 ,  C23C14/06 ,  C30B23/00 ,  C30B29/40 ,  C30B33/04

CPC classification number: C30B23/002 ,  C23C14/0641 ,  C23C14/34 ,  C23C14/54 ,  C23C14/5833 ,  C30B29/403 ,  C30B33/04

Abstract: Embodiments described herein include a method for depositing a material layer on a substrate while controlling a bow of the substrate and a surface roughness of the material layer. A bias applied to the substrate while the material layer is deposited is adjusted to control the bow of the substrate. A bombardment process is performed on the material layer to improve the surface roughness of the material layer. The bias and bombardment process improve a uniformity of the material layer and reduce an occurrence of the material layer cracking due to the bow of the substrate.