公开(公告)号：US20240100714A1

公开(公告)日：2024-03-28

申请号：US18514818

申请日：2023-11-20

Applicant: Applied Materials, Inc.

Inventor： Jagan RANGARAJAN ,  Edward GOLUBOVSKY ,  Edwin VALAZQUEZ ,  Adrian S. BLANK ,  Steven M. ZUNIGA ,  Balasubramaniam C. JAGANNATHAN

IPC: B25J11/00 ,  B25J9/04 ,  B25J15/02

CPC classification number: B25J11/0095 ,  B25J9/042 ,  B25J11/0085 ,  B25J15/0206

Abstract: Embodiments described herein generally relate to equipment used in the manufacturing of electronic devices, and more particularly, to a cleaning system, cleaning system hardware and related methods which may be used to transport and clean the surface of a substrate. According to one embodiment, a substrate cleaning unit may include a pre-clean chamber that performs a pre-clean process on a substrate with the substrate in a horizontal orientation. The unit may also include a first cleaning chamber that performs a first cleaning process on the substrate with the substrate in a vertical orientation. The unit may also include a second cleaning chamber. The unit may also include an integrated cleaning and drying chamber that performs a cleaning and drying process on the substrate in the horizontal orientation. A substrate handler may transfer the substrate between the chambers. The first and second cleaning chambers may be positioned below the pre-clean chamber.