公开(公告)号：US20240134151A1

公开(公告)日：2024-04-25

申请号：US17971494

申请日：2022-10-20

Applicant: Applied Materials, Inc.

Inventor： Ala MORADIAN ,  Amir H. TAVAKOLI ,  Peter REIMER ,  Shu-Kwan LAU

IPC: G02B7/182 ,  C30B35/00 ,  G02B1/14 ,  G02B7/18 ,  G02B17/00

CPC classification number: G02B7/182 ,  C30B35/00 ,  G02B1/14 ,  G02B7/1815 ,  G02B17/002

Abstract: A reflector and processing chamber having the same are described herein. In one example, a reflector is provided that includes cylindrical body, a cooling channel, and a reflective coating. The cylindrical body has an upper surface and a lower surface. The lower surface has a plurality of concave reflector structures disposed around a centerline of the cylindrical body. The cooling channel disposed in or on the cylindrical body. The reflective coating is disposed on the plurality of concave reflector structures.

公开(公告)号：US20240117490A1

公开(公告)日：2024-04-11

申请号：US17962310

申请日：2022-10-07

Applicant: Applied Materials, Inc.

Inventor： Amir H. TAVAKOLI ,  Ala MORADIAN ,  Tetsuya ISHIKAWA

IPC: C23C16/44 ,  C23C14/02 ,  C23C14/46 ,  C23C16/02 ,  C23C16/455

CPC classification number: C23C16/4404 ,  C23C14/024 ,  C23C14/46 ,  C23C16/0272 ,  C23C16/45544

Abstract: A coating on a processing chamber component includes a metallic bond layer deposited on a surface of the component. A thermal barrier layer is deposited on the bond layer. A substantially non-porous ceramic sealing layer is deposited on the thermal barrier layer. The sealing layer substantially conforms to irregularities of the surface of the thermal barrier layer. A chemistry of the sealing layer is selected for resistance to attack from halogen-containing chemicals.

公开(公告)号：US20240231042A9

公开(公告)日：2024-07-11

申请号：US17971494

申请日：2022-10-21

Applicant: Applied Materials, Inc.

Inventor： Ala MORADIAN ,  Amir H. TAVAKOLI ,  Peter REIMER ,  Shu-Kwan LAU

IPC: G02B7/182 ,  C30B35/00 ,  G02B1/14 ,  G02B7/18 ,  G02B17/00

CPC classification number: G02B7/182 ,  C30B35/00 ,  G02B1/14 ,  G02B7/1815 ,  G02B17/002

Abstract: A reflector and processing chamber having the same are described herein. In one example, a reflector is provided that includes cylindrical body, a cooling channel, and a reflective coating. The cylindrical body has an upper surface and a lower surface. The lower surface has a plurality of concave reflector structures disposed around a centerline of the cylindrical body. The cooling channel disposed in or on the cylindrical body. The reflective coating is disposed on the plurality of concave reflector structures.

公开(公告)号：US20240254653A1

公开(公告)日：2024-08-01

申请号：US18417016

申请日：2024-01-19

Applicant: Applied Materials, Inc.

Inventor： Amir H. TAVAKOLI ,  Ala MORADIAN ,  Shawn Thanhson LE

IPC: C30B25/10 ,  C30B25/08

CPC classification number: C30B25/10 ,  C30B25/08

Abstract: An epitaxial growth processing chamber has a component that has a macrocell support structure. The macrocell support structure has interconnecting physical supports that define fluidly-connected pores. A component configured for use in an epitaxial growth processing chamber has a macrocell support structure with interconnecting physical supports defining fluidly-connected pores. The component may be one or more of a lower liner, an upper liner, a baseplate, an exhaust cap, an injection ring, and an injection cap. The interconnecting physical supports may comprise a material such as a metal, a ceramic or glass material, a polymeric material, and combinations thereof. The component may have a free-standing configuration, a plate-supported configuration, a sandwich configuration, a surface sealed configuration, and a solid polymer-filled configuration.

公开(公告)号：US20240360588A1

公开(公告)日：2024-10-31

申请号：US18419835

申请日：2024-01-23

Applicant: Applied Materials, Inc.

Inventor： Amir H. TAVAKOLI ,  Ala MORADIAN ,  Shawn Thanhson LE

IPC: C30B25/10 ,  C30B25/14

CPC classification number: C30B25/10 ,  C30B25/14

Abstract: An epitaxial growth processing chamber with a component having a macrocell support structure configured with interconnecting physical supports that define fluidly-connected pores is described. A component configured for use in an epitaxial growth processing chamber having a macrocell support structure configured with interconnecting physical supports that define fluidly-connected pores is also described. The component is a baseplate, an exhaust cap, an injection ring, an injection cap, a lower reflector, an upper reflector, a lower heat shield, an upper heat shield, a cone reflector, or combinations thereof. In some instances, the component may further include an inlet flow port. In some other instances, the component may further include an inlet flow port, outlet flow port and a fluid flow wall, and optionally a fluid flow baffle, and optionally a reflective surface.

公开(公告)号：US20240117489A1

公开(公告)日：2024-04-11

申请号：US17961553

申请日：2022-10-06

Applicant: Applied Materials, Inc.

Inventor： Amir H. TAVAKOLI ,  Ala MORADIAN ,  Tetsuya ISHIKAWA

IPC: C23C16/44

CPC classification number: C23C16/4404

Abstract: A coating on a processing chamber component includes a metallic bond layer deposited on a surface of the component. A thermal barrier layer is deposited on the bond layer. A substantially non-porous ceramic sealing layer is deposited on the thermal barrier layer. The sealing layer substantially conforms to irregularities of the surface of the thermal barrier layer. A chemistry of the sealing layer is selected for resistance to attack from halogen-containing chemicals.