公开(公告)号：US20220351999A1

公开(公告)日：2022-11-03

申请号：US17866152

申请日：2022-07-15

Applicant: Applied Materials, Inc.

Inventor： Masato ISHII ,  Richard O. COLLINS ,  Richard GILJUM ,  Alexander BERGER

IPC: H01L21/677 ,  H01L21/687 ,  H01L21/673 ,  H01L21/67 ,  H01L21/68

Abstract: A substrate processing system is disclosed which includes a processing chamber comprising a susceptor having a first surface and a second surface opposite to the first surface, a groove formed in the first surface adjacent to a perimeter thereof, and a substrate support structure including a plurality of carrier lift pins, each of the plurality of carrier lift pins movably disposed in an opening formed from the second surface to the first surface, wherein the opening is recessed from the groove.

公开(公告)号：US20190252229A1

公开(公告)日：2019-08-15

申请号：US15894735

申请日：2018-02-12

Applicant: Applied Materials, Inc.

Inventor： Masato ISHII ,  Richard O. COLLINS ,  Richard GILJUM ,  Alexander BERGER

IPC: H01L21/677 ,  H01L21/687 ,  H01L21/67 ,  H01L21/673

Abstract: A substrate processing system is disclosed which includes a substrate input/output chamber coupled to a transfer chamber, and one or more processing chambers coupled to the transfer chamber, wherein the substrate input/output chamber includes a plurality of stacked carrier holders, and one of the carrier holders includes a substrate carrier to support a substrate thereon.

公开(公告)号：US20220130700A1

公开(公告)日：2022-04-28

申请号：US17647120

申请日：2022-01-05

Applicant: Applied Materials, Inc.

Inventor： Jacob NEWMAN ,  Ulrich OLDENDORF ,  Martin AENIS ,  Andrew J. CONSTANT ,  Shay ASSAF ,  Jeffrey C. HUDGENS ,  Alexander BERGER ,  William Tyler WEAVER

IPC: H01L21/677 ,  B65G47/92 ,  H01L21/67 ,  H01L21/687

Abstract: Embodiments herein relate to a transport system and a substrate processing and transfer (SPT) system. The SPT system includes a transport system that connects two processing tools. The transport system includes a vacuum tunnel that is configured to transport substrates between the processing tools. The vacuum tunnel includes a substrate transport carriage to move the substrate through the vacuum tunnel. The SPT system has a variety of configurations that allow the user to add or remove processing chambers, depending on the process chambers required for a desired substrate processing procedure.

公开(公告)号：US20200310001A1

公开(公告)日：2020-10-01

申请号：US16820338

申请日：2020-03-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Alexander BERGER ,  Cheng-Hsuan CHOU ,  David KNAPP

IPC: G02B1/16 ,  G02B1/14

Abstract: Described herein is a method of depositing a conformal, optically transparent coating onto a surface of one or more internal components that are enclosed within an assembled device using a non-line-of-sight deposition process without altering a structure of the assembled device or impacting functionality of the assembled device. Also described is an assembled device including one or more internal components enclosed within the assembled device and a coating deposited onto a surface of the internal components enclosed within the assembled device, where the coating is a conformal, optically transparent coating that is resistant to corrosion by at least one of fluorine-, chlorine-, sulfur-, hydrogen-, bromine-, or nitrogen-based acids and that does not negatively impact functionality of the internal components.

公开(公告)号：US20230420279A1

公开(公告)日：2023-12-28

申请号：US18244557

申请日：2023-09-11

Applicant: Applied Materials, Inc.

Inventor： Masato ISHII ,  Richard O. COLLINS ,  Richard GILJUM ,  Alexander BERGER

IPC: H01L21/677 ,  H01L21/687 ,  H01L21/673 ,  H01L21/67 ,  H01L21/68

CPC classification number: H01L21/67778 ,  H01L21/67751 ,  H01L21/68707 ,  H01L21/68742 ,  H01L21/67346 ,  H01L21/67748 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/68757 ,  H01L21/68735 ,  H01L21/67126 ,  H01L21/67115 ,  H01L21/67109 ,  H01L21/67017 ,  H01L21/67248 ,  H01L21/68 ,  H01L21/67207 ,  H01L21/67739

Abstract: A substrate processing system is disclosed which includes a processing chamber comprising a susceptor having a first surface and a second surface opposite to the first surface, a groove formed in the first surface adjacent to a perimeter thereof, and a substrate support structure including a plurality of carrier lift pins, each of the plurality of carrier lift pins movably disposed in an opening formed from the second surface to the first surface, wherein the opening is recessed from the groove.

公开(公告)号：US20230298862A1

公开(公告)日：2023-09-21

申请号：US17696594

申请日：2022-03-16

Applicant: Applied Materials, Inc.

Inventor： Alexander BERGER ,  Ming XU

IPC: H01J37/32 ,  B81B7/04 ,  H05K1/02 ,  C23C16/50 ,  C23C16/455

CPC classification number: H01J37/32449 ,  B81B7/04 ,  H05K1/0272 ,  C23C16/50 ,  C23C16/45565 ,  B81B2201/054 ,  B81B2207/053 ,  B81B2207/99 ,  B81B2207/012 ,  H05K2201/10083 ,  H05K2201/10522 ,  H05K2201/10545 ,  H05K2201/09063 ,  H05K1/181

Abstract: A showerhead for a processing chamber includes a faceplate with a plurality of openings. A plurality of compartments are recessed into a top surface of the faceplate. The showerhead includes a plurality of MEMS devices. Each MEMS device is disposed in a corresponding compartment of the plurality of compartments. A printed circuit board including a plurality of ports therethrough is coupled to each MEMS device. Each MEMS device is configured to regulate a gas flow into each corresponding compartment through a corresponding port of the plurality of ports in the printed circuit board.