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公开(公告)号：US10928736B2
公开(公告)日：2021-02-23
申请号：US16064274
申请日：2016-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager , Coen Adrianus Verschuren , Erwin Paul Smakman , Erwin John Van Zwet , Wouter Frans Willem Mulckhuyse , Pieter Verhoeff , Robert Albertus Johannes Van Der Werf
Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.
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2.发明申请公开(公告)号：US20140285786A1
公开(公告)日：2014-09-25
申请号：US14356357
申请日：2012-11-15
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70508 , G03F7/70291 , G03F7/70391 , G03F7/70558
Abstract: An exposure apparatus configured to project each of a plurality of radiation beams onto a respective location on a target, the plurality of radiation beams forming a desired dose pattern via a plurality of spot exposures, the nominal position of a characteristic point in the dose distribution of each of the spot exposures lying at points defining a first grid. The apparatus has, or is provided data from, a controller configured to: calculate a target intensity value for each of the plurality of radiation beams to expose the target to the desired dose pattern, the calculation using as input a rasterized representation of the desired dose pattern, the rasterized representation including a dose value defined at each of a plurality of points on a second grid, the first and second grids having the same geometry, and control the exposure apparatus to emit beams with the target intensity values.
Abstract translation: 一种曝光装置，被配置为将多个辐射束中的每一个投射到目标上的相应位置上，所述多个辐射束经由多个斑点曝光形成期望的剂量图案，剂量分布中特征点的标称位置 每个点曝光位于定义第一格栅的点上。 该装置具有或提供来自控制器的数据，该控制器被配置为：计算多个辐射束中的每一个的目标强度值以将目标暴露于期望的剂量模式，该计算使用所需剂量的光栅化表示 图案，光栅化表示包括在第二格栅上的多个点中的每一个处限定的剂量值，第一和第二栅格具有相同的几何形状，并且控制曝光装置发射具有目标强度值的光束。
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3.发明授权Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program 有权平版印刷装置，用于提供设定点数据的装置，装置制造方法，计算设定点数据的方法和计算机程序公开(公告)号：US09488921B2
公开(公告)日：2016-11-08
申请号：US14356357
申请日：2012-11-15
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70508 , G03F7/70291 , G03F7/70391 , G03F7/70558
Abstract: An exposure apparatus configured to project each of a plurality of radiation beams onto a respective location on a target, the plurality of radiation beams forming a desired dose pattern via a plurality of spot exposures, the nominal position of a characteristic point in the dose distribution of each of the spot exposures lying at points defining a first grid. The apparatus has, or is provided data from, a controller configured to: calculate a target intensity value for each of the plurality of radiation beams to expose the target to the desired dose pattern, the calculation using as input a rasterized representation of the desired dose pattern, the rasterized representation including a dose value defined at each of a plurality of points on a second grid, the first and second grids having the same geometry, and control the exposure apparatus to emit beams with the target intensity values.
Abstract translation: 一种曝光装置，被配置为将多个辐射束中的每一个投射到目标上的相应位置上，所述多个辐射束经由多个斑点曝光形成期望的剂量图案，剂量分布中特征点的标称位置 每个点曝光位于定义第一格栅的点上。 该装置具有或提供来自控制器的数据，该控制器被配置为：计算多个辐射束中的每一个的目标强度值以将目标暴露于期望的剂量模式，该计算使用所需剂量的光栅化表示 图案，光栅化表示包括在第二格栅上的多个点中的每一个处限定的剂量值，第一和第二栅格具有相同的几何形状，并且控制曝光装置发射具有目标强度值的光束。
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