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公开(公告)号:US11961627B2
公开(公告)日:2024-04-16
申请号:US18326935
申请日:2023-05-31
Applicant: ASML Netherlands B.V.
CPC classification number: G21K5/04 , G21K1/02 , H01J37/12 , H01J37/16 , H01J37/3007 , H01J37/3177 , H01J2237/002 , H01J2237/0213 , H01J2237/0216 , H01J2237/024 , H01J2237/0262 , H01J2237/032 , H01J2237/1207 , H01J2237/1215 , H01J2237/16 , H01J2237/1825 , H01J2237/30472
Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
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公开(公告)号:US11705252B2
公开(公告)日:2023-07-18
申请号:US17403849
申请日:2021-08-16
Applicant: ASML Netherlands B.V.
CPC classification number: G21K5/04 , G21K1/02 , H01J37/12 , H01J37/16 , H01J37/3007 , H01J37/3177 , H01J2237/002 , H01J2237/024 , H01J2237/0213 , H01J2237/0216 , H01J2237/0262 , H01J2237/032 , H01J2237/1207 , H01J2237/1215 , H01J2237/16 , H01J2237/1825 , H01J2237/30472
Abstract: The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.
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公开(公告)号:US11094426B2
公开(公告)日:2021-08-17
申请号:US16796849
申请日:2020-02-20
Applicant: ASML Netherlands B.V.
Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
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公开(公告)号:US11348756B2
公开(公告)日:2022-05-31
申请号:US15985763
申请日:2018-05-22
Applicant: ASML Netherlands B.V.
IPC: H01J37/153 , H01J37/12 , H01J37/09 , H01J37/065 , H01J37/317 , H01J37/02
Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.
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公开(公告)号:US10586625B2
公开(公告)日:2020-03-10
申请号:US15493159
申请日:2017-04-21
Applicant: ASML Netherlands B.V.
IPC: H01J37/153 , G21K5/04 , H01J37/30 , G21K1/02 , H01J37/317 , H01J37/16 , H01J37/12
Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
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