公开(公告)号：US20190187568A1

公开(公告)日：2019-06-20

申请号：US16269745

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Casper Roderik DE GROOT ,  Rolf Hendrikus Jacobus CUSTERS ,  David Merritt PHILLIPS ,  Frederik Antonius VAN DER ZANDEN ,  Pieter Lein Joseph GUNTER ,  Erik Henricus Egidius Catharina EUMMELEN ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Marijn WOUTERS ,  Ronald Frank KOX ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US20210096471A1

公开(公告)日：2021-04-01

申请号：US16464361

申请日：2017-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Frank DEBOUGNOUX ,  Koen CUYPERS ,  Han Henricus Aldegonda LEMPENS ,  Theodoras Wilhelmus POLET ,  Jorge Alberto VIEYRA SALAS ,  John Maria BOMBEECK ,  Johannes Cornelis Paulus MELMAN ,  Giovanni Luca GATTOBIGIO

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US20190204758A1

公开(公告)日：2019-07-04

申请号：US16332820

申请日：2017-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jorge Alberto VIEYRA SALAS ,  Auke Juriaan BEEN ,  Victor Manuel BLANCO CARBALLO

IPC: G03F7/20

Abstract: An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.

公开(公告)号：US20170363969A1

公开(公告)日：2017-12-21

申请号：US15527645

申请日：2015-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Marc HAUPTMANN ,  Dylan John David DAVIES ,  Paul JANSSEN ,  Naoko TSUGAMA ,  Richard Joseph BRULS ,  Kornelis Tijmen HOEKERD ,  Edwin Johannes Maria JANSSEN ,  Petrus Johannes VAN DEN OEVER ,  Ronald VAN DER WILK ,  Antonius Hubertus VAN SCHIJNDEL ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G01N27/61

CPC classification number: G03F7/70616 ,  G01N21/9501 ,  G01N27/61 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/70508 ,  G03F7/70783 ,  H01L22/12 ,  H01L22/20

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

公开(公告)号：US20170219933A1

公开(公告)日：2017-08-03

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Casper Roderik DE GROOT ,  Rolf Hendrikus Jacobus CUSTERS ,  David Merritt PHILLIPS ,  Frederik Antonius VAN DER ZANDEN ,  Pieter Lein Joseph GUNTER ,  Erik Henricus Egidius Catharina EUMMELEN ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Marijn WOUTERS ,  Ronald Frank KOX ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US20220187717A1

公开(公告)日：2022-06-16

申请号：US17603367

申请日：2020-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanni Luca GATTOBIGIO ,  Pieter Jeroen Johan Emanuel HOEFNAGELS ,  Ronald Frank KOX ,  Marcus Johannes VAN DER ZANDEN ,  Maarten Marinus VAN OENE ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20

Abstract: A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.

公开(公告)号：US20190265597A1

公开(公告)日：2019-08-29

申请号：US16407878

申请日：2019-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alberto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.