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公开(公告)号:US20190361357A1
公开(公告)日:2019-11-28
申请号:US16477955
申请日:2017-12-04
Applicant: ASML NETHERLANDS B.V.
Inventor: Pieter Jeroen Johan Emanuel HOEFNAGELS , Ronald Frank KOX , John Maria BOMBEECK , Johannes Cornelis Paulus MELMAN , Ruud Hendrikus Martinus Johannes BLOKS , Patricius Jacobus NEEFS
IPC: G03F7/20
Abstract: A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.
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公开(公告)号:US20210096471A1
公开(公告)日:2021-04-01
申请号:US16464361
申请日:2017-11-01
Applicant: ASML NETHERLANDS B.V.
Inventor: Erik Henricus Egidius Catharina EUMMELEN , Frank DEBOUGNOUX , Koen CUYPERS , Han Henricus Aldegonda LEMPENS , Theodoras Wilhelmus POLET , Jorge Alberto VIEYRA SALAS , John Maria BOMBEECK , Johannes Cornelis Paulus MELMAN , Giovanni Luca GATTOBIGIO
IPC: G03F7/20
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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