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公开(公告)号：US20150241792A1
公开(公告)日：2015-08-27
申请号：US14709135
申请日：2015-05-11
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GmbH
Inventor： Heine Melle MULDER , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
IPC: G03F7/20
CPC classification number: G03F7/70566 , G03F7/70091 , G03F7/70116
Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
Abstract translation: 公开了一种照明系统，其具有偏振构件，该偏振构件包括可移动成与辐射束至少部分交叉的第一和第二偏振修正器，使得各个偏振修正器对至少部分光束施加修改的偏振。 所述照明系统还包括可独立控制的反射元件的阵列，其定位成在辐射束已经通过所述偏振构件之后接收所述辐射束;以及控制器，被配置为控制所述第一和第二偏振调节剂的运动，使得所述第一和第二偏振调节剂与 辐射束的不同部分。
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公开(公告)号：US20180267415A1
公开(公告)日：2018-09-20
申请号：US15764617
申请日：2016-09-06
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Heine Melle MULDER , Willem Richard PONGERS , Paulus Antonius Andreas TEUNISSEN
IPC: G03F9/00
CPC classification number: G03F9/7084 , G03F7/70258 , G03F9/7049 , G03F9/7076 , G03F9/7092
Abstract: A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation re-fleeted from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.
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Patent Agency Ranking
3.发明申请公开(公告)号：US20180246422A1
公开(公告)日：2018-08-30
申请号：US15961399
申请日：2018-04-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle MULDER , Andrey Sergeevich TYCHKOV , Willem VAN SCHAIK
CPC classification number: G03F7/70916 , G03F7/70033 , G03F7/70933 , G03F7/70983 , G21K1/062 , H05G2/008
Abstract: Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.
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4.发明申请ROTATABLE FRAME, LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM, METHOD FOR FOCUSING RADIATION AND DEVICE MANUFACTURING METHOD 审中-公开可旋转框架，光刻设备，投影系统，聚焦辐射和装置制造方法公开(公告)号：US20160349628A1
公开(公告)日：2016-12-01
申请号：US15235542
申请日：2016-08-12
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan BLEEKER , Thomas Josephus Maria CASTENMILLER , Pieter Willem Herman DEJAGER , Heine Melle MULDER , Koen Jacobus Johannes ZAAL , Theodorus Petrus Maria CADEE , Danny Maria Hubertus PHILIPS , Ruud Antonius Catharina Maria BEERENS , Roger Anton Marie TIMMERMANS
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/20 , G03F7/7005 , G03F7/70075 , G03F7/70275 , G03F7/70291 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70475
Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.
Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转框架，其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在仅切向 或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。
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公开(公告)号：US20160116848A1
公开(公告)日：2016-04-28
申请号：US14988944
申请日：2016-01-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle MULDER , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Markus Franciscus Antonius EURLINGS , Hendrikus Robertus Marie VAN GREEVENBROEK , Paul VAN DER VEEN , Patricius Aloysius Jacobus TINNEMANS , Wilfred Edward ENDENDIJK
IPC: G03F7/20
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
Abstract translation: 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。
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公开(公告)号：US20240275114A1
公开(公告)日：2024-08-15
申请号：US18568515
申请日：2022-05-16
Applicant: ASML Netherlands B.V.
CPC classification number: H01S3/0064 , G02F1/11 , G03F7/70033 , G03F7/70891 , H01S3/0405 , G02F2203/21 , H01S3/2232 , H05G2/005 , H05G2/008
Abstract: The present invention relates to an optical isolator for a seed laser, comprising: an acousto-optic modulator crystal configured to manipulate laser light incident thereto, and at least one cooling system configured to regulate a temperature of the crystal, said cooling system comprising: a cooling element including one or more channels for a fluidic cooling medium, a heat transfer assembly arranged between the crystal and the cooling element to transfer heat from the crystal to the cooling element, wherein the heat transfer assembly includes an active heat transfer element.
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公开(公告)号：US20170315450A1
公开(公告)日：2017-11-02
申请号：US15653380
申请日：2017-07-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle MULDER , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Markus Franciscus Antonius EURLINGS , Hendrikus Robertus Marie VAN GREEVENBROEK , Paul VAN DER VEEN , Patricius Aloysius Jacobus TINNEMANS , Wilfred Edward ENDENDIJK
IPC: G03F7/20
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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