Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND METHOD
-
Application No.: US15653380Application Date: 2017-07-18
-
Publication No.: US20170315450A1Publication Date: 2017-11-02
- Inventor: Heine Melle MULDER , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Markus Franciscus Antonius EURLINGS , Hendrikus Robertus Marie VAN GREEVENBROEK , Paul VAN DER VEEN , Patricius Aloysius Jacobus TINNEMANS , Wilfred Edward ENDENDIJK
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B. V.
- Current Assignee: ASML NETHERLANDS B. V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
Public/Granted literature
- US10222703B2 Lithographic apparatus and method Public/Granted day:2019-03-05
Information query
IPC分类: