Invention Application
- Patent Title: EUV SOURCE CHAMBER AND GAS FLOW REGIME FOR LITHOGRAPHIC APPARATUS, MULTI-LAYER MIRROR AND LITHOGRAPHIC APPARATUS
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Application No.: US15961399Application Date: 2018-04-24
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Publication No.: US20180246422A1Publication Date: 2018-08-30
- Inventor: Heine Melle MULDER , Andrey Sergeevich TYCHKOV , Willem VAN SCHAIK
- Applicant: ASML NETHERLANDS B.V.
- Priority: EP15195362.7 20151119; EP15199803.6 20151214
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G21K1/06
Abstract:
Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.
Public/Granted literature
Information query
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