-
公开(公告)号：US11754918B2
公开(公告)日：2023-09-12
申请号：US17548944
申请日：2021-12-13
发明人： David Ferdinand Vles , Chaitanya Krishna Ande , Antonius Franciscus Johannes De Groot , Adrianus Johannes Maria Giesbers , Johannes Joseph Janssen , Paul Janssen , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Marcel Peter Meijer , Wouter Rogier Meijerink , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Raymond Olsman , Hrishikesh Patel , Mária Péter , Gerrit Van Den Bosch , Wilhelmus Theodorus Anthonius Johannes Van Den Einden , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
IPC分类号： G03F1/64
CPC分类号： G03F1/64
摘要： The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
-
公开(公告)号：US11231646B2
公开(公告)日：2022-01-25
申请号：US16614815
申请日：2018-06-08
发明人： David Ferdinand Vles , Chaitanya Krishna Ande , Antonius Franciscus Johannes De Groot , Adrianus Johannes Maria Giesbers , Johannes Joseph Janssen , Paul Janssen , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Marcel Peter Meijer , Wouter Rogier Meijerink , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Raymond Olsman , Hrishikesh Patel , Mária Péter , Gerrit Van Den Bosch , Wilhelmus Theodorus Anthonius Johannes Van Den Einden , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
IPC分类号： G03F1/64
摘要： A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.
-
公开(公告)号：US10969701B2
公开(公告)日：2021-04-06
申请号：US16572156
申请日：2019-09-16
发明人： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kester , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：US10558129B2
公开(公告)日：2020-02-11
申请号：US15526654
申请日：2015-11-16
发明人： Matthias Kruizinga , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Erik Willem Bogaart , Derk Servatius Gertruda Brouns , Marc Bruijn , Richard Joseph Bruls , Jeroen Dekkers , Paul Janssen , Mohammad Reza Kamali , Ronald Harm Gunther Kramer , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Matthew Lipson , Erik Roelof Loopstra , Joseph H. Lyons , Stephen Roux , Gerrit Van Den Bosch , Sander Van Den Heijkant , Sandra Van Der Graaf , Frits Van Der Meulen , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：US10539886B2
公开(公告)日：2020-01-21
申请号：US15526639
申请日：2015-11-16
发明人： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kesters , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
摘要： A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.
-
公开(公告)号：US11009803B2
公开(公告)日：2021-05-18
申请号：US16587483
申请日：2019-09-30
发明人： Matthias Kruizinga , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Erik Willem Bogaart , Derk Servatius Gertruda Brouns , Marc Bruijn , Richard Joseph Bruls , Jeroen Dekkers , Paul Janssen , Mohammad Reza Kamali , Ronald Harm Gunther Kramer , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Matthew Lipson , Erik Roelof Loopstra , Joseph H. Lyons , Stephen Roux , Gerrit Van Den Bosch , Sander Van Den Heijkant , Sandra Van Der Graaf , Frits Van Der Meulen , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：US11003098B2
公开(公告)日：2021-05-11
申请号：US16687535
申请日：2019-11-18
发明人： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kester , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：US20200012204A1
公开(公告)日：2020-01-09
申请号：US16572156
申请日：2019-09-16
发明人： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm, Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kesters , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
-
-
-
-
-
-
搜索结果
8 条记录 (耗时 0.016 秒)
