公开(公告)号：US20210116398A1

公开(公告)日：2021-04-22

申请号：US17073271

申请日：2020-10-16

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN ,  Xiaoyu JI ,  Xiaoxue CHEN ,  Weimin ZHOU ,  Frank Nan ZHANG

IPC: G01N23/2202 ,  G01N23/2251 ,  G01N1/44

Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

公开(公告)号：US20220122803A1

公开(公告)日：2022-04-21

申请号：US17516654

申请日：2021-11-01

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Frank Nan ZHANG

IPC: H01J37/28 ,  G01N23/203 ,  G01N23/2251 ,  H01J37/26

Abstract: Disclosed herein is a method comprising depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; while scanning a probe spot generated on the sample by a beam of charged particles, recording from the probe spot signals representing interactions of the beam of charged particles and the sample; wherein an average rale of deposition during the first time period, and an average rate of deposition during the second time period are different.

公开(公告)号：US20220375712A1

公开(公告)日：2022-11-24

申请号：US17769690

申请日：2020-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN ,  Xiaoyu JI ,  Xiaoxue CHEN ,  Weimin ZHOU ,  Frank Nan ZHANG

IPC: H01J37/02 ,  H01J37/28 ,  H01J37/244

Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

公开(公告)号：US20210142979A1

公开(公告)日：2021-05-13

申请号：US17026044

申请日：2020-09-18

Applicant: ASML Netherlands B.V.

Inventor： Frank Nan ZHANG ,  Zhongwei CHEN ,  Yixiang WANG ,  Ying Crystal SHEN

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

公开(公告)号：US20240379325A1

公开(公告)日：2024-11-14

申请号：US18431759

申请日：2024-02-02

Applicant: ASML Netherlands B.V.

Inventor： Frank Nan ZHANG ,  Zhongwei CHEN ,  Yixiang WANG ,  Ying Crystal SHEN

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

公开(公告)号：US20200234915A1

公开(公告)日：2020-07-23

申请号：US16651337

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Frank Nan ZHANG

IPC: H01J37/28 ,  H01J37/26 ,  G01N23/2251 ,  G01N23/203

Abstract: Disclosed herein is a method comprising: depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; while scanning a probe spot generated on the sample by a beam of charged particles, recording from the probe spot signals representing interactions of the beam of charged particles and the sample; wherein an average rate of deposition during the first time period and an average rate of deposition during the second time period are different.