Invention Application
- Patent Title: SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
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Application No.: US17769690Application Date: 2020-09-30
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Publication No.: US20220375712A1Publication Date: 2022-11-24
- Inventor: Weiming REN , Xuedong LIU , Zhong-wei CHEN , Xiaoyu JI , Xiaoxue CHEN , Weimin ZHOU , Frank Nan ZHANG
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/077276 WO 20200930
- Main IPC: H01J37/02
- IPC: H01J37/02 ; H01J37/28 ; H01J37/244

Abstract:
Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
Public/Granted literature
- US12196692B2 Systems and methods for voltage contrast defect detection Public/Granted day:2025-01-14
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