Invention Application
- Patent Title: SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL
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Application No.: US17026044Application Date: 2020-09-18
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Publication No.: US20210142979A1Publication Date: 2021-05-13
- Inventor: Frank Nan ZHANG , Zhongwei CHEN , Yixiang WANG , Ying Crystal SHEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/04 ; H01J37/28

Abstract:
Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
Public/Granted literature
- US11929232B2 Systems and methods for charged particle flooding to enhance voltage contrast defect signal Public/Granted day:2024-03-12
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