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    Metrology method and associated metrology and lithographic apparatuses
    3.
    发明授权
    Metrology method and associated metrology and lithographic apparatuses 有权

    公开(公告)号：US11906906B2

    公开(公告)日：2024-02-20

    申请号：US17565422

    申请日：2021-12-29

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Arjan Johannes Anton Beukman

    IPC: G03F7/00

    CPC classification number: G03F7/70625 ,  G03F7/70633 ,  G03F7/70641

    Abstract: Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.

    Monolithic particle inspection device
    4.
    发明授权
    Monolithic particle inspection device 有权

    公开(公告)号：US12298257B2

    公开(公告)日：2025-05-13

    申请号：US18012801

    申请日：2021-06-09

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Ilse Van Weperen ,  Arjan Johannes Anton Beukman ,  Mohamed Swillam ,  Justin Lloyd Kreuzer ,  Stephen Roux

    IPC: G01N21/956

    Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.

    Position Metrology Apparatus and Associated Optical Elements
    6.
    发明申请
    Position Metrology Apparatus and Associated Optical Elements 审中-公开

    公开(公告)号：US20200209608A1

    公开(公告)日：2020-07-02

    申请号：US16731249

    申请日：2019-12-31

    Applicant: ASML Netherlands B.V.

    Inventor： Arjan Johannes Anton Beukman ,  Alessandro Polo ,  Henricus Petrus Maria Pellemans ,  Nitish Kumar

    IPC: G02B26/00

    Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.

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