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公开(公告)号：US20190391498A1
公开(公告)日：2019-12-26
申请号：US16561096
申请日：2019-09-05
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Markus Gerardus Martinus Maria VAN KRAAIJ , Adrianus Cornelis Matheus KOOPMAN , Stefan HUNSCHE , Willem Marie Julia Marcel COENE
Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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2.发明申请公开(公告)号：US20220326623A1
公开(公告)日：2022-10-13
申请号：US17836099
申请日：2022-06-09
Applicant: ASML Netherlands B.V.
Inventor： Alexander YPMA , Jasper MENGER , David DECKERS , David HAN , Adrianus Cornelis Matheus KOOPMAN , Irina LYULINA , Scott Anderson MIDDLEBROOKS , Richard Johannes Franciscus VAN HAREN , Jochem Sebastiaan WILDENBERG
IPC: G03F7/20
Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
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公开(公告)号：US20220187713A1
公开(公告)日：2022-06-16
申请号：US17441729
申请日：2020-03-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Adrianus Cornelis Matheus KOOPMAN , Markus Gerardus Martinus Maria VAN KRAAIJ , Maxim PISARENCO , Stefan HUNSCHE
Abstract: A method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set including (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function includes a relationship between the predicted substrate image and the metrology data.
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公开(公告)号：US20210232052A1
公开(公告)日：2021-07-29
申请号：US17051287
申请日：2019-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Richard QUINTANILHA , Scott Anderson MIDDLEBROOKS , Adrianus Cornelis Matheus KOOPMAN , Albertus Victor Gerardus MANGNUS
Abstract: A method of determining a measurement sequence for an inspection tool inspecting a structure generated by a lithographic process performed by a lithographic system is presented, the method including deriving a model for the lithographic process as performed by the lithographic system, the model including a relationship between a set of system variables describing the lithographic system and an output variable representing the structure resulting of the lithographic process, determining an observability of one or more system variables in the output variable, and determining the measurement sequence for the inspection tool, based on the observability.
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5.发明申请公开(公告)号：US20190278188A1
公开(公告)日：2019-09-12
申请号：US16351873
申请日：2019-03-13
Applicant: ASML Netherlands B.V.
Inventor： Alexander YPMA , Jasper MENGER , David DECKERS , David HAN , Adrianus Cornelis Matheus KOOPMAN , Irina LYULINA , Scott Anderson MIDDLEBROOKS , Richard Johannes Franciscus VAN HAREN , Jochem Sebastiaan WILDENBERG
Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190187569A1
公开(公告)日：2019-06-20
申请号：US16322148
申请日：2017-07-14
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70525 , G03F7/70508 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G05B19/41875 , G06K9/6296 , G06T7/001 , G06T2207/30148 , H01L22/20 , Y02P90/86
Abstract: A diagnostic system implements a network including two or more sub-domains. Each sub-domain has diagnostic information extracted by analysis of object data, the object data representing one or more parameters measured in relation to a set of product units that have been subjected nominally to the same industrial process as one another. The network further has at least one probabilistic connection from a first variable in a first diagnostic sub-domain to a second variable in a second diagnostic sub-domain. Part of the second diagnostic information is thereby influenced probabilistically by knowledge within the first diagnostic information. Diagnostic information may include, for example, a spatial fingerprint observed in the object data, or inferred. The network may include connections within sub-domains. The network may form a directed acyclic graph, and used for Bayesian inference operations.
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公开(公告)号：US20170345138A1
公开(公告)日：2017-11-30
申请号：US15533614
申请日：2015-11-13
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Markus Gerardus Martinus Maria VAN KRAAIJ , Maxim PISARENCO , Adrianus Cornelis Matheus KOOPMAN , Stefan HUNSCHE , Willem Marie Julia Marcel COENE
IPC: G06T7/00
CPC classification number: G06T7/001 , G03F7/705 , G03F7/70625 , G03F7/70633 , G06T2207/10061 , G06T2207/20068 , G06T2207/30148
Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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公开(公告)号：US20220327686A1
公开(公告)日：2022-10-13
申请号：US17837096
申请日：2022-06-10
Applicant: ASML NETHERLANDS B.V..
Inventor： Adrianus Cornelis Matheus KOOPMAN , Scott Anderson Middlebrooks , Antoine Gaston Marie Kiers , Mark John Maslow
Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data comprising an input image of at least a part of a substrate having a plurality of features and a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation of the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.
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9.发明申请公开(公告)号：US20200264520A1
公开(公告)日：2020-08-20
申请号：US16864456
申请日：2020-05-01
Applicant: ASML Netherlands B.V.
Inventor： Alexander YPMA , Jasper MENGER , David DECKERS , David HAN , Adrianus Cornelis Matheus KOOPMAN , Irina LYULINA , Scott Anderson MIDDLEBROOKS , Richard Johannes Franciscu VAN HAREN , Jochem Sebastiaan WILDENBERG
Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
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公开(公告)号：US20190310554A1
公开(公告)日：2019-10-10
申请号：US16464705
申请日：2017-11-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Adrianus Cornelis Matheus KOOPMAN , Markus Gerardus Martinus Maria VAN KRAAIJ , Maxim PISARENCO
IPC: G03F7/20
Abstract: A method including: obtaining a logistic mathematical model predicting the formation of a physical structure created using a patterning process; evaluating the logistic mathematical model to predict formation of a part of the physical structure and generate an output; and adapting, based on the output, an aspect of the patterning process.
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