公开(公告)号：US11333984B2

公开(公告)日：2022-05-17

申请号：US16967794

申请日：2019-02-04

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Richard Joseph Bruls ,  Ronald Peter Albright ,  Peter Conrad Kochersperger ,  Victor Antonio Perez-Falcon

IPC: G03F7/20 ,  B08B6/00

Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.

公开(公告)号：US11550231B2

公开(公告)日：2023-01-10

申请号：US17418478

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Jeffrey John Lombardo ,  Ronald Peter Albright ,  Daniel Leslie Hall ,  Victor Antonio Perez-Falcon ,  Andrew Judge

IPC: G03F7/20

Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.

公开(公告)号：US11175596B2

公开(公告)日：2021-11-16

申请号：US16633419

申请日：2018-07-18

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Han-Kwang Nienhuys ,  Ronald Peter Albright ,  Jacob Brinkert ,  Yang-Shan Huang ,  Hendrikus Gijsbertus Schimmel ,  Antonie Hendrik Verweij

IPC: G03F7/20 ,  B01D45/08 ,  B01D45/10

Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

公开(公告)号：US10585359B2

公开(公告)日：2020-03-10

申请号：US16321059

申请日：2017-07-17

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Ronald Peter Albright ,  Lowell Lane Baker ,  Daniel Nathan Burbank

IPC: G03F7/20 ,  G03F1/24 ,  G03F1/64

Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.

公开(公告)号：US20150241797A1

公开(公告)日：2015-08-27

申请号：US14423089

申请日：2013-07-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Peter A. Delmastro ,  Sanjeev Kumar Singh ,  Ronald Peter Albright

IPC: G03F7/20 ,  B08B7/00

CPC classification number: G03F7/70925 ,  A47L25/005 ,  B08B7/0028 ,  G03F1/82 ,  G03F7/70916 ,  H01L21/02041

Abstract: Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a cleaning system (500) for cleaning particles off of a surface of either the support or the patterning device. The cleaning system includes a cleaning surface (502) designed to contact the surface of either the support or the patterning device.

Abstract translation: 描述了用于清洁光刻设备内物体表面的污染物的方法和系统。 提供了一种光刻设备，其包括被配置为调节辐射束的照明系统，构造成保持图案形成装置（302）的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括用于从支撑体或图案形成装置的表面清除颗粒的清洁系统（500）。 清洁系统包括设计成接触支撑件或图案形成装置的表面的清洁表面（502）。