公开(公告)号：US20150241797A1

公开(公告)日：2015-08-27

申请号：US14423089

申请日：2013-07-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Peter A. Delmastro ,  Sanjeev Kumar Singh ,  Ronald Peter Albright

IPC: G03F7/20 ,  B08B7/00

CPC classification number: G03F7/70925 ,  A47L25/005 ,  B08B7/0028 ,  G03F1/82 ,  G03F7/70916 ,  H01L21/02041

Abstract: Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a cleaning system (500) for cleaning particles off of a surface of either the support or the patterning device. The cleaning system includes a cleaning surface (502) designed to contact the surface of either the support or the patterning device.

Abstract translation: 描述了用于清洁光刻设备内物体表面的污染物的方法和系统。 提供了一种光刻设备，其包括被配置为调节辐射束的照明系统，构造成保持图案形成装置（302）的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括用于从支撑体或图案形成装置的表面清除颗粒的清洁系统（500）。 清洁系统包括设计成接触支撑件或图案形成装置的表面的清洁表面（502）。