公开(公告)号：US12174552B2

公开(公告)日：2024-12-24

申请号：US17773004

申请日：2020-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Victor Antonio Perez-Falcon ,  Marcus Adrianus Van De Kerkhof ,  Daniel Leslie Hall ,  Christopher John Mason ,  Arthur Winfried Eduardus Minnaert ,  Johannes Hubertus Josephina Moors ,  Samir A. Nayfeh

IPC: G03F7/00 ,  H01L21/683 ,  H01L21/687

Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.

公开(公告)号：US11550231B2

公开(公告)日：2023-01-10

申请号：US17418478

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Jeffrey John Lombardo ,  Ronald Peter Albright ,  Daniel Leslie Hall ,  Victor Antonio Perez-Falcon ,  Andrew Judge

IPC: G03F7/20

Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.