-
公开(公告)号：US08518865B2
公开(公告)日：2013-08-27
申请号：US12859624
申请日：2010-08-19
申请人： Madhukar Bhaskara Rao , Gautam Banerjee , Thomas Michael Wieder , Yi-Chia Lee , Wen Dar Liu , Aiping Wu
发明人： Madhukar Bhaskara Rao , Gautam Banerjee , Thomas Michael Wieder , Yi-Chia Lee , Wen Dar Liu , Aiping Wu
CPC分类号： G03F7/426 , C11D3/0073 , C11D7/06 , C11D7/261 , C11D7/3218 , C11D7/3281 , C11D7/5004 , C11D11/0047 , C23G1/22 , G03F7/425
摘要： The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.
-
公开(公告)号：US20110311921A1
公开(公告)日：2011-12-22
申请号：US13217994
申请日：2011-08-25
CPC分类号： H01L21/02071 , C11D7/10 , C11D7/263 , C11D7/3209 , C11D11/0047 , C23G1/061 , C23G1/18 , G03F7/425 , H01L21/02063 , H01L21/31133
摘要： A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.
摘要翻译： 包含一种或多种包含二醇醚的水溶性有机溶剂的组合物; 水; 含氟化合物，条件是如果含氟化合物是氟化铵，则不向组合物中加入另外的含氟化合物; 任选的季铵化合物; 并且任选地，本文公开了一种能够从制品诸如光致抗蚀剂和/或蚀刻残留物中去除残余物的腐蚀抑制剂。 本文还公开了使用本文公开的组合物从制品中除去残余物的方法。
-
公开(公告)号：US08030263B2
公开(公告)日：2011-10-04
申请号：US11155654
申请日：2005-06-20
IPC分类号： C11D7/50
CPC分类号： H01L21/02071 , C11D7/10 , C11D7/263 , C11D7/3209 , C11D11/0047 , C23G1/061 , C23G1/18 , G03F7/425 , H01L21/02063 , H01L21/31133
摘要： A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.
摘要翻译： 包含一种或多种包含二醇醚的水溶性有机溶剂的组合物; 水; 含氟化合物，条件是如果含氟化合物是氟化铵，则不向组合物中加入另外的含氟化合物; 任选的季铵化合物; 并且任选地，本文公开了一种能够从制品诸如光致抗蚀剂和/或蚀刻残留物中去除残余物的腐蚀抑制剂。 本文还公开了使用本文公开的组合物从制品中除去残余物的方法。
-
公开(公告)号：US20110212866A1
公开(公告)日：2011-09-01
申请号：US12859624
申请日：2010-08-19
申请人： Madhukar Bhaskara Rao , Gautam Banerjee , Thomas Michael Wieder , Yi-Chia Lee , Wen Dar Liu , Aiping Wu
发明人： Madhukar Bhaskara Rao , Gautam Banerjee , Thomas Michael Wieder , Yi-Chia Lee , Wen Dar Liu , Aiping Wu
CPC分类号： G03F7/426 , C11D3/0073 , C11D7/06 , C11D7/261 , C11D7/3218 , C11D7/3281 , C11D7/5004 , C11D11/0047 , C23G1/22 , G03F7/425
摘要： The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.
摘要翻译： 本发明涉及富含水的配方及其使用方法，以去除体积光致抗蚀剂，后蚀刻和后残留物，来自Al后端的互连结构的残留物以及污染物。 制剂包含：羟胺; 含有烷基二羟基苯和羟基喹啉的混合物的腐蚀抑制剂; 链烷醇胺，水溶性溶剂或两者的组合; 和至少50重量％的水。
-
-
-
搜索结果
4 条记录 (耗时 0.01 秒)
