Method and apparatus for blind detecting a transmission mode for interference cancellation

    公开(公告)号:US10027392B2

    公开(公告)日:2018-07-17

    申请号:US15005657

    申请日:2016-01-25

    IPC分类号: H04B7/0456 H04J11/00

    摘要: Methods and apparatuses are provided for determining an interference transmission mode (TM) at a communication device in a cellular communication system using a resource element (RE) defined by frequency and time. A first signal is received in one RE. The first signal comprises a serving signal and an interference signal. A first vector of the received first signal is projected onto each of N projection vectors. A traffic-to-pilot ratio (TPR) decision metric of the interference signal is determined by using N pairs of an actual squared value and an expected squared value which are corresponding to the projected first vector. A TM of the interference signal is detected by determining a TF of the interference signal which minimizes the TPR decision metric from among predetermined transmit format (TF) candidates.

    METHOD AND DEVICE FOR PRECODING IN WIRELESS COMMUNICATION SYSTEM
    4.
    发明申请
    METHOD AND DEVICE FOR PRECODING IN WIRELESS COMMUNICATION SYSTEM 有权
    用于在无线通信系统中预测的方法和设备

    公开(公告)号:US20130208825A1

    公开(公告)日:2013-08-15

    申请号:US13880540

    申请日:2011-09-07

    IPC分类号: H04B7/04

    摘要: Provided is a method and a device for precoding in a wireless communication system. The method for precoding comprises the following steps: generating a first precoding matrix, W1, for deciding the transmission power of one transmission antenna from a plurality of transmission antennas as the maximum power per antenna; generating a zero forcing (ZF) precoding matrix, Ti, which does not influence the transmission antenna having the power which is decided as the maximum power per antenna, based on the (i−1)th precoding matrix Wi−1 (i=2,3, . . . ); determining a constant which has the transmission power of one transmission antenna from the rest of the transmission antennas, which do not have the transmission power as the maximum power per antenna, based on the Ti; and generating the

    摘要翻译: 提供了一种用于无线通信系统中的预编码的方法和装置。 用于预编码的方法包括以下步骤:生成用于从多个发送天线中确定一个发送天线的发送功率作为每个天线的最大功率的第一预编码矩阵W1; 基于第(i-1)预编码矩阵Wi-1(i = 2)生成不影响具有被确定为每天线的最大功率的功率的发送天线的零强制(ZF)预编码矩阵Ti ,3,...); 基于Ti,确定具有不具有作为每个天线的最大功率的发送功率的其余发送天线的一个发送天线的发送功率的常数; 并产生

    POWER CONTROL METHOD FOR INTERFERENCE ALIGNMENT IN WIRELESS NETWORK
    5.
    发明申请
    POWER CONTROL METHOD FOR INTERFERENCE ALIGNMENT IN WIRELESS NETWORK 有权
    无线网络干扰对齐功率控制方法

    公开(公告)号:US20120302280A1

    公开(公告)日:2012-11-29

    申请号:US13576385

    申请日:2011-02-01

    IPC分类号: H04W52/04

    摘要: A power control method for interference alignment in wireless network having K transmitters and K receivers is provided. The method comprising: receiving, performed by receiver n (n is an integer, 1≦n≦K−1), a power indication signal of transmitter n+1 from the transmitter n+1; determining, performed by the receiver n, power of transmitter n; and transmitting, performed by the receiver n, a power indication signal of transmitter n to the transmitter n, wherein the power of transmitter n is determined based on a residual interference of the receiver n, and the power indication signal of transmitter n indicates a minimum transmission power or a maximum transmission power of transmitter n.

    摘要翻译: 提供了一种用于具有K个发射机和K个接收机的无线网络中的干扰对准的功率控制方法。 该方法包括:由发射机n + 1发射机n + 1的功率指示信号由接收机n(n为整数,1≦̸ n≦̸ K-1) 确定由接收机n执行的发射机n的功率; 并且由接收机n执行发射机n的功率指示信号到发射机n,其中,基于接收机n的残余干扰来确定发射机n的功率,并且发射机n的功率指示信号表示最小 发射功率或发射机n的最大发射功率。

    Method for forming fine patterns using etching slope of hard mask layer in semiconductor device
    6.
    发明申请
    Method for forming fine patterns using etching slope of hard mask layer in semiconductor device 失效
    使用半导体器件中的硬掩模层的蚀刻斜面形成精细图案的方法

    公开(公告)号:US20080230516A1

    公开(公告)日:2008-09-25

    申请号:US12001127

    申请日:2007-12-10

    IPC分类号: C23F1/04

    摘要: A method for forming fine patterns in a semiconductor device includes forming a first hard mask layer and a second hard mask layer over an etch target layer, forming second hard mask patterns by etching the second hard mask layer, wherein an etching profile of the second hard mask layer has a positive slope, and etching the first hard mask layer and the etch target layer using the second hard mask patterns as an etch mask.

    摘要翻译: 在半导体器件中形成精细图案的方法包括在蚀刻目标层上形成第一硬掩模层和第二硬掩模层,通过蚀刻第二硬掩模层形成第二硬掩模图案,其中第二硬掩模层 掩模层具有正斜率,并且使用第二硬掩模图案作为蚀刻掩模蚀刻第一硬掩模层和蚀刻目标层。

    METHOD AND APPARATUS FOR BLIND DETECTING A TRANSMISSION MODE FOR INTERFERENCE CANCELLATION
    7.
    发明申请
    METHOD AND APPARATUS FOR BLIND DETECTING A TRANSMISSION MODE FOR INTERFERENCE CANCELLATION 有权
    用于盲检测干扰消除的传输模式的方法和装置

    公开(公告)号:US20160219599A1

    公开(公告)日:2016-07-28

    申请号:US15005657

    申请日:2016-01-25

    IPC分类号: H04W72/08 H04B7/04 H04W72/04

    摘要: Methods and apparatuses are provided for determining an interference transmission mode (TM) at a communication device in a cellular communication system using a resource element (RE) defined by frequency and time. A first signal is received in one RE. The first signal comprises a serving signal and an interference signal. A first vector of the received first signal is projected onto each of N projection vectors. A traffic-to-pilot ratio (TPR) decision metric of the interference signal is determined by using N pairs of an actual squared value and an expected squared value which are corresponding to the projected first vector. A TM of the interference signal is detected by determining a TF of the interference signal which minimizes the TPR decision metric from among predetermined transmit format (TF) candidates.

    摘要翻译: 提供了使用由频率和时间定义的资源元素(RE)来确定蜂窝通信系统中的通信设备处的干扰传输模式(TM)的方法和装置。 在一个RE中接收到第一个信号。 第一信号包括服务信号和干扰信号。 接收的第一信号的第一矢量被投影到N个投影矢量中的每一个上。 通过使用对应于投影的第一矢量的实际平方值和预期平方值的N对来确定干扰信号的业务导频比(TPR)决定度量。 通过确定从预定的发送格式(TF)候选中最小化TPR判定度量的干扰信号的TF来检测干扰信号的TM。

    Power control method for interference alignment in wireless network
    9.
    发明授权
    Power control method for interference alignment in wireless network 有权
    无线网络中干扰对准的功率控制方法

    公开(公告)号:US08818445B2

    公开(公告)日:2014-08-26

    申请号:US13576385

    申请日:2011-02-01

    IPC分类号: H04B7/00

    摘要: A power control method for interference alignment in wireless network having K transmitters and K receivers is provided. The method includes: receiving, performed by receiver n (n is an integer, 1≦n≦K−1), a power indication signal of transmitter n+1 from the transmitter n+1; determining, performed by the receiver n, power of transmitter n; and transmitting, performed by the receiver n, a power indication signal of transmitter n to the transmitter n, wherein the power of transmitter n is determined based on a residual interference of the receiver n, and the power indication signal of transmitter n indicates a minimum transmission power or a maximum transmission power of transmitter n.

    摘要翻译: 提供了一种用于具有K个发射机和K个接收机的无线网络中的干扰对准的功率控制方法。 该方法包括:由发射机n + 1发射机n + 1的功率指示信号,由接收机n(n为整数,1≦̸ n≦̸ K-1) 确定由接收机n执行的发射机n的功率; 并且由接收机n执行发射机n的功率指示信号到发射机n,其中,基于接收机n的残余干扰来确定发射机n的功率,并且发射机n的功率指示信号表示最小 发射功率或发射机n的最大发射功率。

    Method for forming fine patterns in semiconductor device
    10.
    发明授权
    Method for forming fine patterns in semiconductor device 失效
    在半导体器件中形成精细图案的方法

    公开(公告)号:US08138090B2

    公开(公告)日:2012-03-20

    申请号:US12005463

    申请日:2007-12-26

    IPC分类号: H01L21/302

    摘要: A method for forming fine patterns in a semiconductor device includes forming a first hard mask layer over an etch target layer, forming first etch mask patterns having negative slopes over the first hard mask layer, thereby forming a resultant structure, forming a first material layer for a second etch mask over the resultant structure, performing a planarization process until the first etch mask patterns are exposed to form second etch mask patterns filled in spaces between the spacers, removing the spacers, and etching the first hard mask layer and the etch target layer using the first etch mask patterns and the second etch mask patterns.

    摘要翻译: 在半导体器件中形成精细图案的方法包括在蚀刻目标层上形成第一硬掩模层,在第一硬掩模层上形成具有负斜率的第一蚀刻掩模图案,由此形成所得结构,形成第一材料层, 在所得结构上的第二蚀刻掩模,执行平坦化处理,直到暴露第一​​蚀刻掩模图案以形成填充在间隔物之间​​的间隔中的第二蚀刻掩模图案,去除间隔物,以及蚀刻第一硬掩模层和蚀刻目标层 使用第一蚀刻掩模图案和第二蚀刻掩模图案。