-
公开(公告)号：US08409999B2
公开(公告)日：2013-04-02
申请号：US12947296
申请日：2010-11-16
申请人： Byeong-Jin Lee , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
发明人： Byeong-Jin Lee , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
IPC分类号： H01L21/461
CPC分类号： H01L29/401 , C09K13/06 , H01L27/124 , H01L31/022475 , H01L31/022483 , H01L31/1884 , Y02E10/50
摘要： An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
摘要翻译： 提供了用于蚀刻透明电极的蚀刻剂组合物，蚀刻剂组合物包括无机酸，含铵（NH 4 +）的化合物，环胺化合物和剩余量的水。
-
公开(公告)号：US20110183476A1
公开(公告)日：2011-07-28
申请号：US12947296
申请日：2010-11-16
申请人： Byeong-Jin LEE , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
发明人： Byeong-Jin LEE , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
IPC分类号： H01L21/336 , C09K13/06 , H01B13/00
CPC分类号： H01L29/401 , C09K13/06 , H01L27/124 , H01L31/022475 , H01L31/022483 , H01L31/1884 , Y02E10/50
摘要： An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
摘要翻译： 提供了用于蚀刻透明电极的蚀刻剂组合物，蚀刻剂组合物包括无机酸，含铵（NH 4 +）的化合物，环胺化合物和剩余量的水。
-
3.发明授权Etchant, display device and method for manufacturing display device using the same 有权蚀刻剂，显示装置及使用其的显示装置的制造方法公开(公告)号：US08785935B2
公开(公告)日：2014-07-22
申请号：US13168408
申请日：2011-06-24
申请人： Hong-Sick Park , Wang-Woo Lee , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Young-Jin Yoon , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Dong-Ki Kim
发明人： Hong-Sick Park , Wang-Woo Lee , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Young-Jin Yoon , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Dong-Ki Kim
CPC分类号： H01L27/127 , H01L21/32134 , H01L27/124 , H01L27/1259 , H01L29/41733
摘要： An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.
摘要翻译： 蚀刻剂包括：5〜20重量％的过硫酸盐，1〜10重量％的至少一种无机酸化合物，无机酸盐或其混合物，0.3〜5重量％的环状胺化合物，1〜 10重量％的至少一种有机酸化合物，有机酸盐或其混合物，0.1至5重量％的对甲苯磺酸和水，基于蚀刻剂的总重量。 另外，铜 - 钛蚀刻剂还含有0.01〜2重量％的含氟化合物。 还公开了使用蚀刻剂形成显示装置的方法和显示装置。
-
4.发明申请公开(公告)号：US20120252148A1
公开(公告)日：2012-10-04
申请号：US13223958
申请日：2011-09-01
申请人： Ji-Young PARK , Shin-Il CHOI , Jong-Hyun CHOUNG , Sang Gab KIM , Seon-Il KIM , Sang-Tae KIM , Joon-Woo LEE , Young-Chul PARK , Young-Jun JIN , Kyong-Min KANG , Suck-Jun LEE , O-Byoung KWON , In-Ho YU , Sang-Hoon JANG , Min-Ki LIM , Yu-Jin LEE
发明人： Ji-Young PARK , Shin-Il CHOI , Jong-Hyun CHOUNG , Sang Gab KIM , Seon-Il KIM , Sang-Tae KIM , Joon-Woo LEE , Young-Chul PARK , Young-Jun JIN , Kyong-Min KANG , Suck-Jun LEE , O-Byoung KWON , In-Ho YU , Sang-Hoon JANG , Min-Ki LIM , Yu-Jin LEE
CPC分类号： C09K13/08 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/32134 , H01L27/1259 , H01L29/41733
摘要： An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.
摘要翻译： 根据本发明的示例性实施方案的蚀刻剂包括约0.5重量％至约20重量％的过硫酸盐，约0.01重量％至约2重量％的氟化合物，约1重量％至约10重量％的无机酸， 约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约5重量％的氯化合物，约0.05重量％至约3重量％的铜盐，约0.1重量％至约10重量％ ％的有机酸或有机酸盐，和水。
-
5.发明申请NON-HALOGENATED ETCHANT AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE NON-HALOGENATED ETCHANT 有权非对位蚀刻剂和使用非底物蚀刻剂制造显示基板的方法公开(公告)号：US20120208310A1
公开(公告)日：2012-08-16
申请号：US13330657
申请日：2011-12-19
申请人： Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
发明人： Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
IPC分类号： H01L33/08
CPC分类号： H01L51/0023 , H01L2251/308
摘要： Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
摘要翻译： 本发明的示例性实施方案公开了用于蚀刻氧化铟层的非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法，非卤化蚀刻剂包括硝酸，硫酸，包括铵的腐蚀抑制剂 ，环胺类化合物和水。
-
6.发明授权Non-halogenated etchant and method of manufacturing a display substrate using the non-halogenated etchant 有权非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法公开(公告)号：US09048430B2
公开(公告)日：2015-06-02
申请号：US13330657
申请日：2011-12-19
申请人： Seon-Il Kim , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun Jin
发明人： Seon-Il Kim , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun Jin
CPC分类号： H01L51/0023 , H01L2251/308
摘要： Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
摘要翻译： 本发明的示例性实施方案公开了用于蚀刻氧化铟层的非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法，非卤化蚀刻剂包括硝酸，硫酸，包括铵的腐蚀抑制剂 ，环胺类化合物和水。
-
公开(公告)号：US08383437B2
公开(公告)日：2013-02-26
申请号：US13223958
申请日：2011-09-01
申请人： Ji-Young Park , Shin-Il Choi , Jong-Hyun Choung , Sang Gab Kim , Seon-Il Kim , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Yu-Jin Lee
发明人： Ji-Young Park , Shin-Il Choi , Jong-Hyun Choung , Sang Gab Kim , Seon-Il Kim , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Yu-Jin Lee
IPC分类号： H01L21/00
CPC分类号： C09K13/08 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/32134 , H01L27/1259 , H01L29/41733
摘要： An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.
摘要翻译： 根据本发明的示例性实施方案的蚀刻剂包括约0.5重量％至约20重量％的过硫酸盐，约0.01重量％至约2重量％的氟化合物，约1重量％至约10重量％的无机酸， 约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约5重量％的氯化合物，约0.05重量％至约3重量％的铜盐，约0.1重量％至约10重量％ ％的有机酸或有机酸盐，和水。
-
8.发明申请ETCHANT, DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME 有权蚀刻剂，显示装置和使用其制造显示装置的方法公开(公告)号：US20120153287A1
公开(公告)日：2012-06-21
申请号：US13168408
申请日：2011-06-24
申请人： Hong-Sick PARK , Wang-Woo LEE , Sang-Tae KIM , Joon-Woo LEE , Young-Chul PARK , Young-Jun JIN , Kyong-Min KANG , Young-Jin YOON , Suck-Jun LEE , O-Byoung KWON , In-Ho YU , Sang-Hoon JANG , Min-Ki LIM , Dong-Ki KIM
发明人： Hong-Sick PARK , Wang-Woo LEE , Sang-Tae KIM , Joon-Woo LEE , Young-Chul PARK , Young-Jun JIN , Kyong-Min KANG , Young-Jin YOON , Suck-Jun LEE , O-Byoung KWON , In-Ho YU , Sang-Hoon JANG , Min-Ki LIM , Dong-Ki KIM
CPC分类号： H01L27/127 , H01L21/32134 , H01L27/124 , H01L27/1259 , H01L29/41733
摘要： An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.
摘要翻译： 蚀刻剂包括：5〜20重量％的过硫酸盐，1〜10重量％的至少一种无机酸化合物，无机酸盐或其混合物，0.3〜5重量％的环状胺化合物，1〜 10重量％的至少一种有机酸，有机酸盐或其混合物的化合物，0.1至5重量％的对甲苯磺酸和水，基于蚀刻剂的总重量。 另外，铜 - 钛蚀刻剂还含有0.01〜2重量％的含氟化合物。 还公开了使用蚀刻剂形成显示装置的方法和显示装置。
-
-
-
-
-
-
-
搜索结果
8 条记录 (耗时 0.016 秒)
