摘要:
Embodiments described herein provide a chip, comprising a first device on a substrate and a second device on the substrate. The chip further comprises a heat distribution structure in thermal proximity to the first device and the second device, wherein the heat distribution structure is thermally isolated and reduces a thermal gradient between the first device and the second device.
摘要:
A “tabbed” MOS device provides radiation hardness while supporting reduced gate width requirements. The “tabbed” MOS device also utilizes a body tie ring, which reduces field threshold leakage. In one implementation the “tabbed” MOS device is designed such that a width of the tab is based on at least a channel length of the MOS device such that a radiation-induced parasitic conduction path between the source and drain region of the device has a resistance that is higher than the device channel resistance.
摘要:
An integrated circuit structure containing dielectrically isolated islands having heat dissipation paths of enhanced thermal conductivity. A semiconductor structure comprises a first layer of crystalline material with a layer comprising polycrystalline diamond formed over the first layer. A layer of polycrystalline silicon is formed over the diamond containing layer and a layer of monocrystalline material is formed over the polycrystalline silicon.
摘要:
An SOI wafer is formed having a silicon-germanium layer between the epitaxial layer of the device and the insulative layer. The process includes bonding a second substrate to a silicon-germanium layer on a first substrate by an intermediate insulative layer. The first substrate is removed down to the silicon-germanium layer and the silicon layer is epitaxially formed on the silicon-germanium layer.
摘要:
Integrated circuits are formed by bonding two substrates together on a moat or recess. If the moat is exposed at a side wall, an optical fiber is inserted therein and communicates optically with a photoelectric device in the substrate by a slant side wall of the moat. If the moat is sealed by a cover layer resulting from removing all or most of the top substrate leaving the bonding layer as a cover, a pressure responsive device is formed on the cover layer directly or in the remaining top substrate over the sealed cavity.
摘要:
Embodiments described herein provide a chip, comprising a first device on a substrate and a second device on the substrate. The chip further comprises a heat distribution structure in thermal proximity to the first device and the second device, wherein the heat distribution structure is thermally isolated and reduces a thermal gradient between the first device and the second device.
摘要:
A semiconductor structure such as a power converter with an integrated capacitor is provided, and comprises a semiconductor substrate, a high-side output power device over the substrate at a first location, and a low-side output power device over the substrate at a second location adjacent to the first location. A first metal layer is over the high-side output power device and electrically coupled to the high-side output power device, and a second metal layer is over the low-side output power device and electrically coupled to the low-side output power device. A dielectric layer is over a portion of the first metal layer and a portion of the second metal layer, and a top metal layer is over the dielectric layer. The integrated capacitor comprises a first bottom electrode that includes the portion of the first metal layer, a second bottom electrode that includes the portion of the second metal layer, the dielectric layer over the portions of the first and second metal layers, and a top electrode that includes the top metal layer over the dielectric layer.
摘要:
In a microelectronic device formed on a substrate 12, a pair of trenches 30, 36 branch at their intersection to provide branches 31-34 surrounding a sacrificial island 42. Sacrificial island 42 may comprise substrate material or other material or a void for absorbing the axial stresses propagated along the lengths of trenches 30, 36.
摘要:
A method including forming an alignment moat of a first depth on a first surface of a substrate and performing all backside processing, forming a first oxide layer on the first surface and oxide bonding it to a handling wafer by oxide bonding. The substrate is then thinned from a second surface opposite the first surface down to a thickness less than the depth of the alignment moat so the alignment moat is exposed at a third surface for front side processing.
摘要:
Conductive elements which provide interconnections (air bridges between circuits) and components such as capacitors and inductors may be incorporated in the devices in a manner to reduce parasitic effects in the operation of the devices while providing close spacing which enhances the performance of the devices at high frequency. Separate substrates are provided respectively having the integrated circuits formed therein and covering, preferably sealing the integrated circuits. The air bridge conductive components (interconnections, capacitors or inductors) are formed separately in the covering substrate which is assembled with the substrate having the integrated circuit as a lid which seals and packages the circuits and the conductive element or component contained in the lid. The conductive component may be separated by cavities formed in the lid substrate or in the substrate having the integrated circuit device already formed therein. Assembly may take place at temperatures lower than necessary for fusion bonding and diffusion commonly used in the fabrication of integrated circuits. Bonds which are used may be metal, oxide or plastic (polymer) bonding material.