摘要:
The invention relates to a method for producing an optical assembly, comprising at least two optical functional surfaces arranged in a fixed positional relationship to one another on a common supporting structure, wherein by means of a processing machine, in various process steps, at least two optical functional surfaces and at least one reference structure having a defined and measurable relative position to the optical functional surfaces are produced. The supporting structure remains rigidly connected to the processing machine until said process steps have been completed, and wherein the optical functional surfaces are then measured relative to the at least one reference structure, and any deviation from a target shape and target position is determined, after which said process steps are repeated at least once with modified actuation of the processing machine. The invention further relates to an optical device comprising an optical assembly produced in this way and to a unit for carrying out such a method.
摘要:
A proposed aerostatic bearing arrangement for moving a device on a base structure, particularly in a vacuum environment, has at least one aerostatic bearing element comprising a bearing body having a load-carrying zone and a suction area. An electrostatic preloading unit having at least one electrode is associated with the at least one aerostatic bearing element, and a voltage can be applied to the electrode in such a way that a force component is generated in direction of the surface normal of the bearing body of the aerostatic bearing element.
摘要:
The invention refers to a receiving and supporting system for a substrate (17) in an exposure system, which is provided with a handling system for the supply of the substrate (17), with an electrostatic chuck arrangement (1) moveable in X, Y coordinates, for the support of the substrate (17) during the exposure, and with an exposure optic, from which a right angled particle radiation, in Z-direction is directed toward the substrate surface. In regard to the respective supporting system, at least a second electrostatic chuck arrangement (6) is provided, which—similar to the first chuck arrangement (1), for the support of the substrate (17) during the exposure, provides a bearing surface for the substrate, whereby the bearing surface of this second chuck arrangement (6) is positioned movable in Z coordinate. In regard to their supporting force, both chuck arrangements (1, 6) are arranged in such a manner, that the substrate (17) is securely positioned when being supported either on the first chuck arrangement (1) or when being supported exclusively on the second chuck arrangement (6).
摘要:
The invention relates to a method for manufacturing a light weight optical mirror or a monolithic mirror comprising at least one cooling channel, the method comprising forming a mirror body by iteratively depositing a metallic powder in layers and applying, for each of the layers, heat at least in a subarea of this layer, thereby fusing or sintering the powder in this subarea and bonding it to a previously deposited layer, the powder remaining in an unfused state in at least one region, the method further comprising forming at least one cavity within the carrier by removing the unfused powder from said region and producing a mirror surface at a closed surface of the mirror body. The invention further relates to an optical mirror and to an optical device.
摘要:
The invention relates to a method for producing an optical assembly, comprising at least two optical functional surfaces arranged in a fixed positional relationship to one another on a common supporting structure, wherein by means of a processing machine, in various process steps, at least two optical functional surfaces and at least one reference structure having a defined and measurable relative position to the optical functional surfaces are produced. The supporting structure remains rigidly connected to the processing machine until said process steps have been completed, and wherein the optical functional surfaces are then measured relative to the at least one reference structure, and any deviation from a target shape and target position is determined, after which said process steps are repeated at least once with modified actuation of the processing machine. The invention further relates to an optical device comprising an optical assembly produced in this way and to a unit for carrying out such a method.
摘要:
Flexibly deformable holding elements operate such that substrates can be held in a fixed manner at a surface of the holding element electrostatically or also by means of negative pressure and planar positional deviations or unwanted deformations can be compensated simply and reliably, where at least one cut-out having an opening arranged at the rear side is formed at the rear side of the holding element which is disposed opposite the surface, and an actuator is arranged there exerting compressive forces or pulling forces for a widening or narrowing of the cut-out and/or for a deformation of the holding element.
摘要:
A table system for vacuum application has a base plate and a moving table guided by aerostatic bearing units. The bearing units (10) are connected to supply lines and suction lines for supplying and extracting the gas required for the operation of the bearing units and are provided in each instance with a sealing system having at least one stage and comprising suction channel and sealing gap for sealing relative to the vacuum. The table system is characterized in that the aerostatic bearing units (10) are constructed at least partially as swivel joints, and a push rod (4) which is actuated by a drive (5) for guiding the moving table laterally is connected to the rotating part (21) of each swivel joint, and in that the push rods (4) are hollow and constitute a component part of the suction lines for extracting the operating gas.
摘要:
The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.
摘要:
The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.
摘要:
The invention relates to a substrate made of an aluminium-silicon alloy or crystalline silicon to which a polishable layer is applied and also to a metal mirror which comprises this substrate. Furthermore, the invention relates to a method for the production of metal mirrors and also the use of the metal mirror according to the invention.