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公开(公告)号：US08134701B2
公开(公告)日：2012-03-13
申请号：US12774379
申请日：2010-05-05
Applicant: Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
Inventor： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
Abstract: A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
Abstract translation: 本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化， 缺陷的检测灵敏度变得不稳定。 该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷 上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。
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公开(公告)号：US20110141463A1
公开(公告)日：2011-06-16
申请号：US13059593
申请日：2009-07-15
Applicant: Shuichi Chikamatsu , Minoru Noguchi , Masayuki Ochi , Kenji Aiko
Inventor： Shuichi Chikamatsu , Minoru Noguchi , Masayuki Ochi , Kenji Aiko
IPC: G01N21/956
CPC classification number: G01N21/956
Abstract: Provided are a defect inspection device and a defect inspecting method, which enlarge the uptake range of a light scattered from a fine defect thereby to heighten signal intensity. The defect inspection device is provided with: a stage unit (300) capable of mounting an inspection object substrate (1) thereon to move same relative to an optical device; an illuminating optical device (100) for illuminating an inspection zone (4) on the inspection object substrate (1); a detecting optical device (200) for detecting a light from the inspection zone (4) of the inspection object substrate (1); an image sensor (205) for converting the image focused by the detecting optical device (200) into signals; a signal processing unit (402) for processing the signals from the image sensor (205) thereby to detect a defect; and a plane reflecting mirror (501) arranged between detecting optical device (200) and the inspection object substrate (1) and transmitting the light from the inspection object substrate (1) to the detecting optical device (200).
Abstract translation: 提供了一种缺陷检查装置和缺陷检查方法，其扩大了从细小缺陷散射的光的摄取范围，从而提高信号强度。 缺陷检查装置设置有能够将检查对象基板（1）安装在其上以相对于光学装置移动的台单元（300）; 用于照射检查对象基板（1）上的检查区（4）的照明光学装置（100）。 用于检测来自检查对象基板（1）的检查区（4）的光的检测光学装置（200）; 用于将由检测光学装置（200）聚焦的图像转换为信号的图像传感器（205） 信号处理单元（402），用于处理来自图像传感器（205）的信号，从而检测缺陷; 以及布置在检测光学装置（200）和检查对象基板（1）之间并将来自检查对象基板（1）的光传输到检测光学装置（200）的平面反射镜（501）。
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公开(公告)号：US07672799B2
公开(公告)日：2010-03-02
申请号：US11846829
申请日：2007-08-29
Applicant: Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
Inventor： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
CPC classification number: G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
Abstract translation: 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。
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公开(公告)号：US20090059216A1
公开(公告)日：2009-03-05
申请号：US12136799
申请日：2008-06-11
Applicant: Yukihiro Shibata , Shunji Maeda , Shuichi Chikamatsu
Inventor： Yukihiro Shibata , Shunji Maeda , Shuichi Chikamatsu
IPC: G01N21/88
CPC classification number: G01N21/956 , G01N2021/8822
Abstract: A defect inspection apparatus comprises: a stage which scans a sample in a horizontal plane; an illumination optical system which illuminates light at an oblique angle with respect to a normal of a sample surface, and illuminates light in a linear form on the sample at an angle inclined to a direction perpendicular to the scanning direction of the stage; a front scattered light detection optical system which is disposed in the same orientation as the scanning direction, positioned at an elevation angle where a specular reflection light from a pattern parallel to the scanning direction is not spatially detected, and detects scattered light from a region illuminated in the linear form; an image sensor detecting an image formed by the front scattered light detection optical system; and an image processing unit performing a comparison operation of the image detected by the image sensor, thereby determining a defect candidate.
Abstract translation: 缺陷检查装置包括：在水平面扫描样品的台阶; 照射光学系统，其以相对于样品表面的法线倾斜的角度照射光，并以垂直于所述载物台的扫描方向的方向以样品的线性方式照射样品上的光; 以与扫描方向相同的方向设置的前散射光检测光学系统，位于与扫描方向平行的图案的镜面反射光未被空间检测的仰角处，并且检测来自被照射的区域的散射光 呈线形; 检测由前散射光检测光学系统形成的图像的图像传感器; 以及图像处理单元，执行由图像传感器检测到的图像的比较操作，从而确定缺陷候选。
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公开(公告)号：US20070216896A1
公开(公告)日：2007-09-20
申请号：US11717651
申请日：2007-03-14
Applicant: Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
Inventor： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC: G01N21/88
CPC classification number: G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
Abstract: A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
Abstract translation: 本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化， 缺陷的检测灵敏度变得不稳定。 该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷 上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。
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Patent Agency Ranking
公开(公告)号：US07037735B2
公开(公告)日：2006-05-02
申请号：US10170378
申请日：2002-06-14
Applicant: Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
Inventor： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
CPC classification number: B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.
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公开(公告)号：US08345233B2
公开(公告)日：2013-01-01
申请号：US13312663
申请日：2011-12-06
Applicant: Tadashi Suga , Shuichi Chikamatsu , Masayuki Ochi , Takahiko Suzuki , Seiji Otani
Inventor： Tadashi Suga , Shuichi Chikamatsu , Masayuki Ochi , Takahiko Suzuki , Seiji Otani
IPC: G01N21/00
CPC classification number: G03F7/70858 , G01N21/9501 , G01N21/95623 , G01N2201/0231 , H01L21/67248
Abstract: A defect inspection apparatus emits light to a test object, detects reflected of scattered light from the test object and detects a defect in the test object The apparatus comprises a temperature-controlled part accommodating section that accommodates parts having a need for controlling a temperature, which is out of a plurality of parts in the defect inspection apparatus. A first temperature measuring instrument measures a temperature in the temperature-controlled part accommodating section; and a temperature control unit controls a temperature of the interior of the temperature-controlled part accommodating section at a prescribed temperature according to the temperature measured by the first temperature measuring instrument. Accordingly, a defect inspection apparatus can efficiently perform temperature control without involving an enlarged size can be achieved.
Abstract translation: 缺陷检查装置向被检体发光，检测来自被检体的散射光的反射，检测被检体内的缺陷。该装置包括：温度控制部容纳部，容纳需要控制温度的部位， 在缺陷检查装置中的多个部分之外。 第一温度测量仪器测量温度控制部分容纳部分中的温度; 并且温度控制单元根据由第一温度测量仪器测量的温度将温度控制部分容纳部分的内部温度控制在规定的温度。 因此，可以有效地执行不需要扩大尺寸的温度控制的缺陷检查装置。
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公开(公告)号：US20120140212A1
公开(公告)日：2012-06-07
申请号：US13312663
申请日：2011-12-06
Applicant: Tadashi Suga , Shuichi Chikamatsu , Masayuki Ochi , Takahiko Suzuki , Seiji Otani
Inventor： Tadashi Suga , Shuichi Chikamatsu , Masayuki Ochi , Takahiko Suzuki , Seiji Otani
IPC: G01N21/88
CPC classification number: G03F7/70858 , G01N21/9501 , G01N21/95623 , G01N2201/0231 , H01L21/67248
Abstract: A defect inspection apparatus emits light to a test object, detects reflected of scattered light from the test object and detects a defect in the test object The apparatus comprises a temperature-controlled part accommodating section that accommodates parts having a need for controlling a temperature, which is out of a plurality of parts in the defect inspection apparatus. A first temperature measuring instrument measures a temperature in the temperature-controlled part accommodating section; and a temperature control unit controls a temperature of the interior of the temperature-controlled part accommodating section at a prescribed temperature according to the temperature measured by the first temperature measuring instrument. Accordingly, a defect inspection apparatus can efficiently perform temperature control without involving an enlarged size can be achieved.
Abstract translation: 缺陷检查装置向被检体发光，检测来自被检体的散射光的反射，检测被检体内的缺陷。该装置包括：温度控制部容纳部，容纳需要控制温度的部位， 在缺陷检查装置中的多个部分之外。 第一温度测量仪器测量温度控制部分容纳部分中的温度; 并且温度控制单元根据由第一温度测量仪器测量的温度将温度控制部分容纳部分的内部温度控制在规定的温度。 因此，可以有效地执行不需要扩大尺寸的温度控制的缺陷检查装置。
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公开(公告)号：US08102522B2
公开(公告)日：2012-01-24
申请号：US11989018
申请日：2007-06-29
Applicant: Tadashi Suga , Shuichi Chikamatsu , Masayuki Ochi , Takahiko Suzuki , Seiji Otani
Inventor： Tadashi Suga , Shuichi Chikamatsu , Masayuki Ochi , Takahiko Suzuki , Seiji Otani
IPC: G01N21/00
CPC classification number: G03F7/70858 , G01N21/9501 , G01N21/95623 , G01N2201/0231 , H01L21/67248
Abstract: A defect inspection apparatus enable to efficiently perform a temperature control without involving an enlarged size can be achieved.The parts constituting the defect inspection apparatus are classified into parts need temperature control and parts not to need temperature control; all the parts need temperature control are accommodated together into a temperature-controlled part accommodating section 604, and the parts not to need temperature control are arranged in a heat radiating unit 605. The temperature in the temperature-controlled part accommodating section 604 is measured by a temperature measuring instrument 603 and a control CPU 602 in a temperature control unit 601 carries out control according to the measured temperature so that the interior of the temperature-controlled part accommodating section 604 is kept at a fixed temperature. Therefore, it becomes easy to keep the fixed temperature, when compared with a case in which individual parts are temperature-controlled separately by being heated or cooled, yielding an energy saving effect.
Abstract translation: 可以实现能够有效地执行不涉及放大尺寸的温度控制的缺陷检查装置。 构成缺陷检查装置的部件分为需要温度控制的部件和不需要温度控制的部件; 将所有需要温度控制的部件一起放入温度控制部件容纳部分604中，并且不需要温度控制的部件被布置在散热单元605中。温度控制部件容纳部分604中的温度由 温度控制单元601中的温度测量装置603和控制CPU 602根据测量的温度执行控制，使得温度控制部分容纳部分604的内部保持在固定温度。 因此，与单独部件通过加热或冷却分别进行温度控制的情况相比，容易保持固定温度，产生节能效果。
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公开(公告)号：US07953567B2
公开(公告)日：2011-05-31
申请号：US12683455
申请日：2010-01-07
Applicant: Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
Inventor： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
CPC classification number: G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
Abstract translation: 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。
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