POLISHING PAD AND WAFER POLISHING METHOD
    1.
    发明公开

    公开(公告)号:US20240293915A1

    公开(公告)日:2024-09-05

    申请号:US18592822

    申请日:2024-03-01

    IPC分类号: B24D3/32 B24B5/36

    CPC分类号: B24D3/32 B24B5/36

    摘要: A polishing pad (1) is provided with higher polishing efficiency for polishing an outer circumferential edge part (3d, 3e) of a disc-shaped wafer (3). An unpolished part is less likely to occur during a polishing process with the polishing pad (1), and the polished wafer (3) is cleanable easily. In the polishing pad (1), a polishing surface is formed of a polishing body, and the polishing body includes a base material and polishing particles. The base material is composed of a binder resin and fibers and has a plurality of pores formed therein. The polishing particles are retained in the base material or in the pores and are diamond particles. The polishing pad (1) has a durometer hardness in a range from 16 to 27, a density in a range from 0.58 to 0.81 g/cm3, and an elastic modulus in a range from 21.5 to 37.5 N/mm2.

    DECORATIVE COMPOSITION AND UTILIZATION THEREOF

    公开(公告)号:US20240101468A1

    公开(公告)日:2024-03-28

    申请号:US18553462

    申请日:2022-03-14

    IPC分类号: C03C8/18

    摘要: The present disclosure provides a technology of obtaining a ceramic product including a decorative film which has a sufficient chemical resistance and can reduce damage during cleaning. A decorative composition disclosed herein contains at least a noble metal element and a glass matrix element. The glass matrix element contains a rare-earth element and a first element which is at least one selected from the group consisting of Si and Al. In the decorative composition disclosed herein, the content of the rare-earth element in the glass matrix element is from 1 mol % to 45 mol % inclusive, and the content of the first element in the glass matrix element is from 50 mol % to 90 mol % inclusive. This allows the decorative film having both alkali resistance and acid resistance at high level to be formed.

    METHOD FOR PRODUCING HIGH-POROSITY VITRIFIED GRINDING STONE

    公开(公告)号:US20230150094A1

    公开(公告)日:2023-05-18

    申请号:US17916354

    申请日:2020-12-11

    IPC分类号: B24D18/00 B24D3/18

    CPC分类号: B24D18/0009 B24D3/18

    摘要: A method for producing a high-porosity vitrified grinding stone that has a plurality of pores communicating with each other. The method includes: (a) a grinding-stone-material preparing step of obtaining a grinding-stone raw material slurry that is a mixture fluid of abrasive grains, a vitrified bond, a gellable water-soluble polymer and a water; (b) a molding step of obtaining a molded body, by gelling the grinding-stone raw material slurry with use of a molding mold; (c) a freeze vacuum drying step of generating a plurality of frozen particles inside the molded body by freezing the molded body, and placing the molded body under a vacuum state, so as to sublimate the frozen particles generated inside the molded body for thereby drying the molded body; and (d) a firing step of obtaining the high-porosity vitrified grinding stone, by binding the abrasive grains with the vitrified bond by firing the molded body.

    Twin-head bar cutting device
    5.
    发明授权

    公开(公告)号:US11504781B2

    公开(公告)日:2022-11-22

    申请号:US16669588

    申请日:2019-10-31

    IPC分类号: B23D45/10 B23D47/02 B23D47/04

    摘要: A twin-head bar cutting device includes a first cutting head and a first bar holding device as well as a second cutting head and a second bar holding device placed on a common base. The base includes a first placement surface on which the first cutting head is placed, a second placement surface on which the second cutting head is placed, and a holding device placement surface formed higher than the first placement surface and the second placement surface between the first placement surface and the second placement surface and on which the first bar holding device and the second bar holding device are placed, and the first cutting head and the second cutting head are arranged symmetrically about a vertical plane passing through a center in a width direction of the base.

    BAKED OBJECT TAKING-OUT APPARATUS

    公开(公告)号:US20220307769A1

    公开(公告)日:2022-09-29

    申请号:US17656740

    申请日:2022-03-28

    IPC分类号: F27B9/39 B25J11/00

    摘要: The baked object taking-out apparatus is an apparatus that takes out a baked object from a baking base plate including a disposing surface on which the baked object is disposed. The baked object taking-out apparatus includes a robot arm, a holding member that is provided on the robot arm, that is formed of a metal material, and that is capable of holding the baking base plate, and a protective member that is formed at a portion of the holding member which comes into contact with the baking base plate and that is configured with a ceramic coating which contains a ceramic component.

    LIQUID ATOMIZING APPARATUS
    8.
    发明申请

    公开(公告)号:US20210364176A1

    公开(公告)日:2021-11-25

    申请号:US16968070

    申请日:2019-01-18

    IPC分类号: F24F6/04 B05B17/00

    摘要: A liquid atomizing apparatus includes: an atomizing body member made of a porous body having micropores connected in a three-dimensional network, the atomizing body member having a surface including a part serving as a gas pressurized-inflow surface and another part serving as a gas release surface; a liquid supply unit for supplying a liquid to the atomizing body member, the liquid being to be impregnated into the micropores of the atomizing body member; and a gas supply unit for setting gas pressure on the gas pressurized-inflow surface of the atomizing body member to be higher than on the gas release surface of the atomizing body member and injecting the gas into the micropores of the atomizing body member through the gas pressurized-inflow surface, and releasing a mist of the liquid having been impregnated in the micropores together with the gas from the gas release surface.

    Capacitive touch panel that detects the approach of the user

    公开(公告)号:US11157126B2

    公开(公告)日:2021-10-26

    申请号:US16822371

    申请日:2020-03-18

    IPC分类号: G06F3/042 G06F3/044

    摘要: A touch panel is formed by laminating: a glass substrate having a touch surface; an X-axis sensor unit having parallel patterns, each of which having diamond-shaped X-axis lattices 10A and 10B aligned in an X-axis direction; an Y-axis sensor unit having parallel patterns each of which having Y-axis lattices 14A and 14B aligned in a Y-axis direction; and an insulation layer arranged between the X-axis sensor unit and the Y-axis sensor unit. The X-axis lattices and the Y-axis lattices are not overlapped when seen from a side of the touch surface. A gap 17 is formed between a frame line 10a of the X-axis lattice and a frame line 14a of the Y-axis lattice. A protrusion part 12 extended parallel to a lattice side of a fine lattice from the frame line 10a of the X-axis lattices 10A and 10B is arranged in the gap 17.

    Inkjet ink for ceramic substrate
    10.
    发明授权

    公开(公告)号:US11130875B2

    公开(公告)日:2021-09-28

    申请号:US16640948

    申请日:2018-08-07

    摘要: The present invention provides an inkjet ink for a ceramic substrate, the inkjet ink making it possible to prevent a printed layer from peeling away after firing and allowing a desired image to be better fixed on a ceramic substrate. In the inkjet ink for a ceramic substrate disclosed here, the proportion of a monofunctional monomer in a monomer component is at least 90 mass %, the volume ratio of an inorganic solid relative to the total volume of the inkjet ink is 10 vol % to 20 vol %, and the ratio of the content of an N-vinyl compound to that of the monomer component (N-vinyl compound/monomer component) in the inkjet ink is 0.05 to 0.8 in terms of mass.