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公开(公告)号:US20250034483A1
公开(公告)日:2025-01-30
申请号:US18913103
申请日:2024-10-11
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Atsushi OKADA , Toru INAOKA
Abstract: A surfactant composition contains: a C12 compound of the following formula (1): where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is 9; a C13 compound of the formula (1), where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is 10; a C14 compound of the formula (1), where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is 11; and a Y compound of the formula (1), where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is at least one of 8 or less and 12 or more.
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公开(公告)号:US12122860B2
公开(公告)日:2024-10-22
申请号:US16328950
申请日:2017-08-30
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Yasunori Tsujino , Minoru Urata , Noriaki Majima
CPC classification number: C08F20/06 , B29C64/40 , B33Y10/00 , B33Y70/00 , B29K2105/0002 , B33Y70/10
Abstract: In the present invention, a photocurable support material composition for an inkjet 3D printer comprises a water-soluble ethylenically unsaturated monomer containing an ionic group and a counter ion, and comprises a photopolymerization initiator. The ionic group is preferably at least one selected from a group consisting of carboxylic acid group, phosphoric acid group, and sulfonic acid group. The counter ion is preferably at least one selected from a group consisting of sodium ion, potassium ion, and ammonium ion.
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公开(公告)号:US20240308870A1
公开(公告)日:2024-09-19
申请号:US18268519
申请日:2021-12-15
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Yukihiro FUKATA , Takeo AKATSUKA , Naoki KOBAYASHI
IPC: C01G41/02
CPC classification number: C01G41/02 , C01P2002/60 , C01P2002/72 , C01P2002/88 , C01P2006/82
Abstract: An object of the present invention is to provide a production method that can obtain a tungsten oxide composition having excellent dispersibility and excellent uniformity for shapes of particles. The present invention is a production method for a tungsten oxide composition, comprising: (1) a reaction step of bringing a tungsten halide and a monohydric alcohol into contact with each other and performing heating at 100° C. or higher and 250° C. or lower at a temperature-increasing rate of 3.0° C./min or lower to obtain a composition (I) comprising tungsten oxide and the monohydric alcohol; (2) a step of mixing the composition (I) and one type or two or more types of compounds (A) selected from amines, fatty acids, thiols, and phosphines to obtain a composition (II); and (3) a step of removing at least a part of the monohydric alcohol and a part of the compound (A) from the composition (II) to obtain a composition (III). The present invention preferably further comprises (4) a step of mixing the composition (Ill) and an organic solvent (C) having a dielectric constant of 10 or lower.
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公开(公告)号:US20240294787A1
公开(公告)日:2024-09-05
申请号:US18572608
申请日:2022-05-13
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Keiichi NAKAMOTO
IPC: C09D11/30 , C09D11/023 , C09D11/107 , D06P1/52 , D06P1/90 , D06P5/28 , D06P5/30
CPC classification number: C09D11/30 , C09D11/023 , C09D11/107 , D06P1/5257 , D06P1/90 , D06P5/004 , D06P5/30
Abstract: An ink for ink-jet textile printing, the ink including a pigment, resin emulsion particles, an oxazoline-group-containing compound, and an aqueous medium, in which the resin emulsion particles have an average particle diameter of 150 nm or larger, a content of the resin emulsion particles is 10 to 20 mass % with respect to 100 mass % of the ink for ink-jet textile printing, and a content of the oxazoline-group-containing compound is contained in an amount of 0.5 to 10 mass % with respect to 100 mass % of the resin emulsion particles.
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公开(公告)号:US20240286065A1
公开(公告)日:2024-08-29
申请号:US18566239
申请日:2022-05-31
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Toshiya FUKUMOTO , Yasutaka TAKEMOTO , Masashi MUKAE
CPC classification number: B01D9/0031 , C07C51/252 , C07C51/43 , B01D2009/0086
Abstract: Provided is a method for stably obtaining a product. The present invention relate to a tank for use in a purification apparatus, the tank being: at least one of a crystallization tank that forms a slurry containing crystals of a compound or a ripening tank that is capable of keeping crystals of a compound suspended therein, the tank including a nozzle for feeding a compound-containing solution or a slurry containing crystals of a compound into the tank while the solution or slurry is brought into contact with an inner wall surface of the tank; and a heating mechanism for heating an area of the inner wall surface with which the compound-containing solution or the slurry containing crystals of a compound is to be brought into contact.
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公开(公告)号:US20240270908A1
公开(公告)日:2024-08-15
申请号:US18551764
申请日:2022-03-22
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Jun-ichi NAKAMURA , Nobuhiro MAEDA
IPC: C08G77/04 , C08K5/09 , C08K5/13 , C08K5/3492 , C08K5/5317
CPC classification number: C08G77/045 , C08K5/09 , C08K5/13 , C08K5/3492 , C08K5/5317
Abstract: The present invention provides a curable composition capable of providing a cured product having excellent resistance to thermal decomposition and excellent adhesion to metal base materials. The present invention relates to a polysilsesquioxane composition containing: a polysilsesquioxane; and at least one compound selected from the group consisting of phosphorus-containing compounds, triazinethiol compounds, hydroxy group-containing compounds having a boiling point of 230° C. or higher, and carboxy group-containing compounds having a boiling point of 230° C. or higher, the phosphorus-containing compounds including at least one selected from the group consisting of phosphine compounds, phosphate compounds, phosphinate compounds, and phosphonate compounds.
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公开(公告)号:US20240253012A1
公开(公告)日:2024-08-01
申请号:US18289242
申请日:2022-05-09
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Kanako TSURU , Satoshi MATSUMOTO , Sachie KITABATA
CPC classification number: B01J20/261 , A61L15/24 , A61L15/60 , B01J20/28011 , B01J20/28019 , B01J20/28028 , B01J20/2803 , B01J20/3007 , B01J20/3085 , C08F20/06
Abstract: An object lies in providing a water-absorbing resin capable of absorbing body fluids in a wide viscosity range from a body fluid having a low viscosity to a body fluid having a high viscosity, while maintaining water absorption capacity and water absorption speed. Used is a polyacrylic acid (salt)-based water-absorbing resin having: a free swell rate (A) with respect to an aqueous polyethylene oxide solution of 40° C. of 0.15 g·g−1·s−1 or more; a free swell rate (B) with respect to a physiological saline of 40° C. of 0.40 g·g−1·s−1 or more; and a free swell rate (A)/free swell rate (B) of 0.20 or more.
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公开(公告)号:US12027666B2
公开(公告)日:2024-07-02
申请号:US17264839
申请日:2019-07-05
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Shin-ya Shibata
IPC: H01M10/05 , H01M10/0565
CPC classification number: H01M10/0565 , H01M2300/0082
Abstract: The present invention aims to provide an electrolyte composition from which an electrolyte film having a higher battery performance than typical electrolyte films is obtained. The present invention provides an electrolyte composition containing an alkali metal salt. The composition further contains a photocurable and/or thermosetting monomer; and a salt dissociating agent. A content ratio of the alkali metal salt is 50% by mass or more relative to 100% by mass of the total amount of the alkali metal salt, the photocurable and/or thermosetting monomer, and the salt dissociating agent.
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公开(公告)号:US20240018337A1
公开(公告)日:2024-01-18
申请号:US18037096
申请日:2021-10-07
Applicant: Nippon Shokubai Co., Ltd.
Inventor: Tomonari Takata , Yuichi Kawata
IPC: C08K5/053 , C08J3/07 , C08K5/17 , C08K5/5419 , C08K5/544
CPC classification number: C08K5/053 , C08J3/07 , C08K5/17 , C08K5/5419 , C08K5/544 , C08J2333/02
Abstract: A binder comprising; a carboxyl group-containing polymer having a weight average molecular weight of 2000 to 6000 g/mol and a polyhydric alcohol, wherein a molar ratio of a carboxylic acid group of the carboxyl group-containing polymer and the polyhydric alcohol is 79:21 to 35:65, and wherein the polyhydric alcohol comprises a polyhydric alcohol having a viscosity of 900 mPa·s or less at 20° C.
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公开(公告)号:US20230357028A1
公开(公告)日:2023-11-09
申请号:US18024818
申请日:2021-09-07
Applicant: NIPPON SHOKUBAI CO., LTD.
Inventor: Akira NISHIMURA , Tetsuya YAMAMOTO , Takashi ABE
IPC: C01B33/107
CPC classification number: C01B33/10778
Abstract: The purpose of the present invention is to produce a high quality hydrogenated polysilane compound by reducing process troubles using the halosilane raw material and the reducing agent.
A method for producing a hydrogenated polysilane compound (CX) of the present invention contains a reducing step (P1) in which a halosilane raw material (C0) selected from a polyhalosilane compound (C1) comprising a Si—Si bond and a Si—X bond (X represents a halogen atom) in the same molecule, a salt of the polyhalosilane compound (C2), and a complex of the polyhalosilane compound (C3) is contacted with a reducing agent (R2) to reduce the halosilane raw material (C0), and a removing step in which a reaction solution of the reducing step (P1) is subjected to one or more steps selected from the following (T1) to (T4) to remove the reducing agent (R2) and/or a resulting material of the reducing agent (R2) contained in the reaction solution.
(T1) separating step of a solid and a liquid
(T2) separating step of one liquid and another comprising a reaction solution, a concentrated solution of the reaction solution, or a washing solution of the reaction solution or the concentrated solution of the reaction solution
(T3) contacting step with an acid aqueous solution
(T4) distilling step of the hydrogenated polysilane compound (CX)
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