SURFACTANT COMPOSITION AND METHOD FOR PRODUCING SAME

    公开(公告)号:US20250034483A1

    公开(公告)日:2025-01-30

    申请号:US18913103

    申请日:2024-10-11

    Abstract: A surfactant composition contains: a C12 compound of the following formula (1): where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is 9; a C13 compound of the formula (1), where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is 10; a C14 compound of the formula (1), where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is 11; and a Y compound of the formula (1), where A is an alkylene group having 1 to 3 carbon atoms, x is 1 to 50, and m+n is at least one of 8 or less and 12 or more.

    PRODUCTION METHOD FOR TUNGSTEN OXIDE COMPOSITION

    公开(公告)号:US20240308870A1

    公开(公告)日:2024-09-19

    申请号:US18268519

    申请日:2021-12-15

    Abstract: An object of the present invention is to provide a production method that can obtain a tungsten oxide composition having excellent dispersibility and excellent uniformity for shapes of particles. The present invention is a production method for a tungsten oxide composition, comprising: (1) a reaction step of bringing a tungsten halide and a monohydric alcohol into contact with each other and performing heating at 100° C. or higher and 250° C. or lower at a temperature-increasing rate of 3.0° C./min or lower to obtain a composition (I) comprising tungsten oxide and the monohydric alcohol; (2) a step of mixing the composition (I) and one type or two or more types of compounds (A) selected from amines, fatty acids, thiols, and phosphines to obtain a composition (II); and (3) a step of removing at least a part of the monohydric alcohol and a part of the compound (A) from the composition (II) to obtain a composition (III). The present invention preferably further comprises (4) a step of mixing the composition (Ill) and an organic solvent (C) having a dielectric constant of 10 or lower.

    TANK USED IN REFINING DEVICE
    5.
    发明公开

    公开(公告)号:US20240286065A1

    公开(公告)日:2024-08-29

    申请号:US18566239

    申请日:2022-05-31

    CPC classification number: B01D9/0031 C07C51/252 C07C51/43 B01D2009/0086

    Abstract: Provided is a method for stably obtaining a product. The present invention relate to a tank for use in a purification apparatus, the tank being: at least one of a crystallization tank that forms a slurry containing crystals of a compound or a ripening tank that is capable of keeping crystals of a compound suspended therein, the tank including a nozzle for feeding a compound-containing solution or a slurry containing crystals of a compound into the tank while the solution or slurry is brought into contact with an inner wall surface of the tank; and a heating mechanism for heating an area of the inner wall surface with which the compound-containing solution or the slurry containing crystals of a compound is to be brought into contact.

    POLYSILSESQUIOXANE COMPOSITION AND CURED PRODUCT

    公开(公告)号:US20240270908A1

    公开(公告)日:2024-08-15

    申请号:US18551764

    申请日:2022-03-22

    CPC classification number: C08G77/045 C08K5/09 C08K5/13 C08K5/3492 C08K5/5317

    Abstract: The present invention provides a curable composition capable of providing a cured product having excellent resistance to thermal decomposition and excellent adhesion to metal base materials. The present invention relates to a polysilsesquioxane composition containing: a polysilsesquioxane; and at least one compound selected from the group consisting of phosphorus-containing compounds, triazinethiol compounds, hydroxy group-containing compounds having a boiling point of 230° C. or higher, and carboxy group-containing compounds having a boiling point of 230° C. or higher, the phosphorus-containing compounds including at least one selected from the group consisting of phosphine compounds, phosphate compounds, phosphinate compounds, and phosphonate compounds.

    Electrolyte composition, electrolyte film, and method of manufacturing electrolyte film

    公开(公告)号:US12027666B2

    公开(公告)日:2024-07-02

    申请号:US17264839

    申请日:2019-07-05

    Inventor: Shin-ya Shibata

    CPC classification number: H01M10/0565 H01M2300/0082

    Abstract: The present invention aims to provide an electrolyte composition from which an electrolyte film having a higher battery performance than typical electrolyte films is obtained. The present invention provides an electrolyte composition containing an alkali metal salt. The composition further contains a photocurable and/or thermosetting monomer; and a salt dissociating agent. A content ratio of the alkali metal salt is 50% by mass or more relative to 100% by mass of the total amount of the alkali metal salt, the photocurable and/or thermosetting monomer, and the salt dissociating agent.

    METHOD FOR PRODUCING HYDROGENATED POLYSILANE COMPOUND

    公开(公告)号:US20230357028A1

    公开(公告)日:2023-11-09

    申请号:US18024818

    申请日:2021-09-07

    CPC classification number: C01B33/10778

    Abstract: The purpose of the present invention is to produce a high quality hydrogenated polysilane compound by reducing process troubles using the halosilane raw material and the reducing agent.
    A method for producing a hydrogenated polysilane compound (CX) of the present invention contains a reducing step (P1) in which a halosilane raw material (C0) selected from a polyhalosilane compound (C1) comprising a Si—Si bond and a Si—X bond (X represents a halogen atom) in the same molecule, a salt of the polyhalosilane compound (C2), and a complex of the polyhalosilane compound (C3) is contacted with a reducing agent (R2) to reduce the halosilane raw material (C0), and a removing step in which a reaction solution of the reducing step (P1) is subjected to one or more steps selected from the following (T1) to (T4) to remove the reducing agent (R2) and/or a resulting material of the reducing agent (R2) contained in the reaction solution.



    (T1) separating step of a solid and a liquid
    (T2) separating step of one liquid and another comprising a reaction solution, a concentrated solution of the reaction solution, or a washing solution of the reaction solution or the concentrated solution of the reaction solution
    (T3) contacting step with an acid aqueous solution
    (T4) distilling step of the hydrogenated polysilane compound (CX)

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