Image scanning device
    1.
    发明授权
    Image scanning device 有权
    图像扫描装置

    公开(公告)号:US08570615B2

    公开(公告)日:2013-10-29

    申请号:US13080732

    申请日:2011-04-06

    IPC分类号: H04N1/04

    摘要: An image scanning device includes: a light source; a light guide for converting light from the light source into a linear light beam and applying the linear light beam onto a reading position; an image reading element for receiving the light beam reflected from the reading position; and a light intensity sensor for detecting an intensity of the light emitted from the light source.

    摘要翻译: 一种图像扫描装置,包括:光源; 用于将来自光源的光转换成线性光束并将线性光束施加到读取位置的光导体; 用于接收从读取位置反射的光束的图像读取元件; 以及光强度传感器,用于检测从光源发射的光的强度。

    Image reading apparatus
    2.
    发明授权
    Image reading apparatus 有权
    图像读取装置

    公开(公告)号:US08508814B2

    公开(公告)日:2013-08-13

    申请号:US12816429

    申请日:2010-06-16

    申请人: Masahiko Tanaka

    发明人: Masahiko Tanaka

    摘要: An image reading apparatus for reading an image of a document optically by illuminating a document with light emitted from a plurality of light emitting elements arranged linearly and by reading light reflected from the document. The image reading apparatus has a first light emitting element for emitting light in a first direction, a second light emitting element for emitting light in a second direction and one substrate for supporting the first light emitting element and the second light emitting element thereon.

    摘要翻译: 一种图像读取装置,用于通过用从线性布置的多个发光元件发射的光和通过读取从文档反射的光来照射文件来光学读取原稿的图像。 图像读取装置具有用于沿第一方向发光的第一发光元件,用于沿第二方向发光的第二发光元件和用于支撑第一发光元件和第二发光元件的基板。

    LIGHT SOURCE DEVICE
    3.
    发明申请
    LIGHT SOURCE DEVICE 有权
    光源设备

    公开(公告)号:US20120320599A1

    公开(公告)日:2012-12-20

    申请号:US13517852

    申请日:2012-06-14

    申请人: Masahiko TANAKA

    发明人: Masahiko TANAKA

    IPC分类号: F21V13/02

    摘要: A light source device having: a light source; first and second light guides extending in a first predetermined direction to guide light in the first predetermined direction and irradiate a document with the light; and a confinement portion that confines light emitted by the light source and is connected to one end of the first light guide and one end of the second light guide, in which the light confined in the confinement portion is reflected off both first and second reflection surfaces provided in the confinement portion, and thereby travels through the first and second light guides in the first predetermined direction.

    摘要翻译: 一种光源装置,具有:光源; 第一和第二光导沿第一预定方向延伸以引导第一预定方向的光并照射具有光的文件; 以及约束部分,其限制由光源发射的光并且连接到第一光导的一端和第二光导的一端,其中限定在约束部分中的光从第一和第二反射表面反射出来 设置在限制部分中,从而沿第一预定方向穿过第一和第二光导。

    ANTENNA DEVICE AND SHELF TYPE READER SYSTEM
    4.
    发明申请
    ANTENNA DEVICE AND SHELF TYPE READER SYSTEM 审中-公开
    天线装置和支架式读取器系统

    公开(公告)号:US20070279295A1

    公开(公告)日:2007-12-06

    申请号:US11755969

    申请日:2007-05-31

    IPC分类号: H01Q9/04 G08B13/14

    CPC分类号: H01Q11/08 H01Q1/2216

    摘要: An antenna device is provided for which the thickness can be reduced, warping can be prevented, and manufacturing can be easily performed. According to the present invention, the antenna device includes: a support member, formed like a long hollow plate by extruding a resin; and an antenna unit, wherein a plurality of antenna elements, which are thin metal plates formed substantially in a U shape and which include a first coupling portion extended from one end in one direction and a second coupling portion extended from the other end in the opposite direction, grip the external sides of the support member in the longitudinal direction. The first coupling portion of a specific antenna element is connected to the second coupling portion of the adjacent antenna element, and the second coupling portion of the specific antenna element is connected to the first coupling portion of the adjacent antenna element. Since the antenna elements are connected in this manner, the antenna unit is formed like a coil.

    摘要翻译: 提供一种能够减小厚度的天线装置,可以防止翘曲,并且可以容易地进行制造。 根据本发明,天线装置包括:支撑构件,其通过挤出树脂形成为长的中空板; 以及天线单元,其中多个天线元件是基本上形成U形的薄金属板,并且包括从一个方向上的一端延伸的第一耦合部分和从另一端部延伸的第二耦合部分 方向,在纵向方向上夹持支撑构件的外侧。 特定天线元件的第一耦合部分连接到相邻天线元件的第二耦合部分,并且特定天线元件的第二耦合部分连接到相邻天线元件的第一耦合部分。 由于天线元件以这种方式连接,天线单元形成为类似于线圈。

    Thin-film disposition apparatus
    5.
    发明授权
    Thin-film disposition apparatus 有权
    薄膜配置装置

    公开(公告)号:US07267724B2

    公开(公告)日:2007-09-11

    申请号:US09862458

    申请日:2001-05-23

    IPC分类号: C23C16/00 C23F1/00 H01L21/306

    摘要: A dividing plate for a thin-film deposition apparatus divides the interior of the vacuum reaction chamber into a plasma discharge space and a film deposition process space, by fixing or connecting a plurality of laminated plates together by securely bonding them over the entire area of their interfacial surfaces, or a large portion thereof.

    摘要翻译: 用于薄膜沉积设备的分隔板将真空反应室的内部分成等离子体放电空间和薄膜沉积处理空间,通过将它们固定或连接在一起,将它们固定或连接在一起,将它们牢固地粘合在它们的整个区域上 界面或其大部分。

    Heating element CVD system and heating element CVD metod using the same
    6.
    发明申请
    Heating element CVD system and heating element CVD metod using the same 审中-公开
    加热元件CVD系统和使用其的加热元件CVD

    公开(公告)号:US20060254516A1

    公开(公告)日:2006-11-16

    申请号:US11489522

    申请日:2006-07-20

    IPC分类号: C23C16/00 H01L21/306

    摘要: A heating element CVD system and a heating element CVD method which are capable of forming a high quality polycrystalline silicon film (polysilicon film) as a device in the case of producing a silicon film by using a heating element CVD system. The heating element CVD system and the heating element CVD method heat and maintain the inner surface of the structure surrounding the space between the substrate holder and the heating element to be at least 200° C. or higher, preferably at least 350° C. or higher during the formation of the silicon film on the substrate.

    摘要翻译: 能够通过使用加热元件CVD系统制造硅膜的情况下能够形成高品质多晶硅膜(多晶硅膜)的加热元件CVD系统和加热元件CVD方法。 加热元件CVD系统和加热元件CVD法加热并保持围绕衬底保持器和加热元件之间的空间的结构的内表面至少为200℃以上,优选为至少350℃,或者 在衬底上形成硅膜时更高。

    Loop antenna and contactless IC card read/write apparatus
    7.
    发明授权
    Loop antenna and contactless IC card read/write apparatus 失效
    环形天线和非接触式IC卡读/写设备

    公开(公告)号:US07070101B2

    公开(公告)日:2006-07-04

    申请号:US10885723

    申请日:2004-07-08

    IPC分类号: G06K7/08

    CPC分类号: G06K7/10336 G06K7/10316

    摘要: To provide a loop antenna capable of attenuating the distant electric field with the attenuation of the magnetic flux in the vicinity of an electromagnetic wave restrained, and a contactless IC card read/write apparatus.A loop antenna 10 has an electromagnetic wave shield 1 over at least one side of the loop antenna, the electromagnetic wave shield 1 comprising a plurality of electric conductors 2, a ground contact 3 for grounding the plurality of electric conductors and a lead wire 4 for connecting the plurality of electric conductors 2 to the ground contact 3. The plurality of electric conductors 2 are electrically connected via the lead wire 4 to the ground contact 3 and the plurality of electric conductors 2 are arranged so that the paths of the respective electric conductors 2 from any of their given points to the ground contact 3 via the lead wire 4 are determined uniformly.

    摘要翻译: 提供能够衰减受限制的电磁波附近的磁通的衰减的远距离电场的环形天线,以及非接触式IC卡读写装置。 环形天线10在环形天线的至少一侧具有电磁波屏蔽1,电磁波屏蔽1包括多个电导体2,用于使多个电导体接地的接地触头3和用于 将多个电导体2连接到接地触点3.多个电导体2经由引线4电连接到接地触点3,并且多个电导体2被布置成使得各个导体 均匀地确定了从它们给定的点到任何一个通过引线4到达接地触头3的2。

    Chemical vapor deposition apparatus and film deposition method
    8.
    发明申请
    Chemical vapor deposition apparatus and film deposition method 失效
    化学气相沉积装置和薄膜沉积方法

    公开(公告)号:US20050170090A1

    公开(公告)日:2005-08-04

    申请号:US11047725

    申请日:2005-02-02

    申请人: Masahiko Tanaka

    发明人: Masahiko Tanaka

    摘要: A chemical vapor deposition apparatus has a vacuum processing chamber, a susceptor for holding a plurality of substrates each placed with a film deposition surface thereof facing downward; a heater disposed above the susceptor; a first barrier gas supply port for supplying a barrier gas to the upper surface of the susceptor; and a second barrier gas supply port for supplying the barrier gas to the upper surface of the heater. The barrier gas supplied from the first barrier gas supply port and the barrier gas supplied from the second barrier gas supply port have their flow rates controlled independently. By properly setting the ratio between the amount of the barrier gas supplied from the first barrier gas supply port and the amount of the barrier gas supplied from the second barrier gas supply port and the ratio between the amount of the barrier gas supplied and the amount of a raw material gas supplied, it becomes possible to form a film which is reduced in the number of particles adhered thereto.

    摘要翻译: 化学气相沉积装置具有真空处理室,用于保持多个基板的基座,每个基板的薄膜沉积表面面向下放置; 设置在基座上方的加热器; 用于向所述基座的上表面供给阻挡气体的第一阻挡气体供给口; 以及用于将阻挡气体供给到加热器的上表面的第二阻挡气体供给口。 从第一势垒气体供给口供给的阻挡气体和从第二势垒气体供给口供给的势垒气体,其流量独立地被控制。 通过适当地设定从第一势垒气体供给口供给的阻挡气体的量与从第二阻挡气体供给口供给的阻挡气体的量之间的比例与供给的阻隔气体的量之间的比例, 提供原料气体,可以形成减少附着于其上的颗粒数量的膜。