摘要:
The oxyhalide rare earth doped laser glass of the present invention comprises the substitution of fluorine for oxygen in glasses having the general molar batch composition of 50% SiO.sub.2, 25% CaO, 25% Al.sub.2 O.sub.3 to improve the distribution of rare earth dopants in the glass. The general molar batch composition of the invention ranges from approximately 45-70% SiO.sub.2, 15-35% CaO, 10-25% Al.sub.2 O.sub.3, 4-15% Al.sub.2 F.sub.6, and 0.001-2% Er.sub.2 O.sub.3. This substitution of fluorine into the 2SiO.sub.2. Al.sub.2 O.sub.3. CaO glass system provides erbium doped laser glasses having a Er.sub.2 O.sub.3 batch content of 0.01 mole % Er.sub.2 O.sub.3 to 1.2 mole % Er.sub.2 O.sub.3 (500 ppm Er.sub.2 O.sub.3 to 5.68 wt. % Er.sub.2 O.sub.3) which show little to no concentration quenching and exhibit useful fluorescence lifetimes of approximately 6 milliseconds (ms) or greater.
摘要翻译:本发明的卤氧化物稀土掺杂激光玻璃包括在具有一般摩尔批次组成为50%SiO 2,25%CaO,25%Al 2 O 3的玻璃中用氟代替氧,以改善玻璃中稀土掺杂剂的分布。 本发明的一般摩尔批次组合物的范围为约45-70%的SiO 2,15-35%的CaO,10-25%的Al 2 O 3,4-15%的Al 2 F 6和0.001-2%的Er 2 O 3。 氟取代为2SiO2。 Al2O3。 CaO玻璃系统提供具有Er2O3批次含量为0.01摩尔%Er 2 O 3至1.2摩尔%Er 2 O 3(500ppm Er 2 O 3至5.68重量%Er 2 O 3)的掺铒激光玻璃,其显示出很少至无浓度猝灭并且显示出约6毫秒的有用荧光寿命 (ms)以上。
摘要:
A compositional range of high strain point and/or intermediate expansion coefficient alkali metal free aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates or superstrates for photovoltaic devices, for example, thin film photovoltaic devices such as CdTe or CIGS photovoltaic devices or crystalline silicon wafer devices. These glasses can be characterized as having strain points≧600° C., thermal expansion coefficient of from 35 to 50×10−7/° C.
摘要:
Sodium containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates or superstrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ≧535° C., for example, ≧570° C., thermal expansion coefficients of from 8 to 9 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.
摘要:
The disclosure teaches methods of forming at least one bump in a glass substrate having a surface and a body portion. The method includes performing a first irradiation of a portion of the glass substrate to form in the glass surface the at least one bump having bump height. The method also includes performing thermal annealing of at least a portion of the glass substrate that includes the first irradiated portion. The method then includes performing a second irradiation of the bump to increase the bump height.
摘要:
A compositional range of fusion-formable, high strain point sodium free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points≧540° C., thermal expansion coefficient of from 6.5 to 10.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.
摘要:
A compositional range of high strain point and/or intermediate expansion coefficient alkali metal free aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates or superstrates for photovoltaic devices, for example, thin film photovoltaic devices such as CdTe or CIGS photovoltaic devices or crystalline silicon wafer devices. These glasses can be characterized as having strain points ≧600° C., thermal expansion coefficient of from 35 to 50×10−7/° C.
摘要:
A compositional range of high strain point alkali metal free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ≧570° C., thermal expansion coefficient of from 5 to 9 ppm/° C.
摘要:
Sodium-containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ≧540° C., thermal expansion coefficient of from 6.5 to 9.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.
摘要:
A compositional range of fusion-formable, high strain point sodium free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points≧540° C., thermal expansion coefficient of from 6.5 to 10.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.
摘要:
Sodium-containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ≦540° C., thermal expansion coefficient of from 6.5 to 9.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.