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21 条记录 (耗时 0.026 秒)

    Control of a distribution of illumination in an exit pupil of an EUV illumination system
    4.
    发明授权
    Control of a distribution of illumination in an exit pupil of an EUV illumination system 失效
    控制EUV照明系统出射光瞳的照明分布

    公开(公告)号：US06704095B2

    公开(公告)日：2004-03-09

    申请号：US10060282

    申请日：2002-01-30

    申请人： Jörg Schultz

    发明人： Jörg Schultz

    IPC分类号： G03B2754

    CPC分类号： G02B27/0983 ,  G02B17/0621 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70233 ,  Y10S359/90

    摘要： There is provided an illumination system for a projection exposure system. The illumination system includes (a) a light source for the emission of wavelengths of ≦193 nm, (b) a device for producing secondary light sources, the device including a mirror having raster elements, (c) a diaphragm plane, (d) a first optical element for imaging the diaphragm plane in an exit pupil of the illumination system, (e) an object plane in which images of the raster elements are substantially in line and illuminate a predetermined field with an intensity distribution, and (f) a second optical element for producing a light distribution in the exit pupil. The light distribution is specified by a parameter selected from the group consisting of type and filling degree, and the parameter is modified by a technique selected from the group consisting of exchanging, displacing and deforming the second optical element.

    摘要翻译： 提供了一种用于投影曝光系统的照明系统。 照明系统包括（a）用于发射波长<= 193nm的光源，（b）用于产生二次光源的装置，该装置包括具有光栅元件的反射镜，（c）光阑平面，（d ），用于对所述照明系统的出射光瞳成像所述光阑面的第一光学元件，（e）光栅元件的图像基本上成行并且以强度分布照射预定场的物平面，以及（f） 用于在出射光瞳中产生光分布的第二光学元件。 光分布由选自类型和填充度的参数指定，并且通过从由第二光学元件的交换，移位和变形的组中选择的技术来修改参数。

    Projection-microlithographic device
    5.
    发明授权
    Projection-microlithographic device 失效
    投影微光刻装置

    公开(公告)号：US06445442B2

    公开(公告)日：2002-09-03

    申请号：US09932355

    申请日：2001-08-20

    申请人： Rudolf Von Bünau ,  Jörg Schultz ,  Johannes Wangler

    发明人： Rudolf Von Bünau ,  Jörg Schultz ,  Johannes Wangler

    IPC分类号： G03B2754

    CPC分类号： G03F7/70066 ,  G03F7/70358

    摘要： An illuminating device of a projection-microlithographic device includes a light source, an objective, and a device which produces a particular image field configuration. The device has fields which, in the direction of scanning movement, are separated at least in parts by a free zone, and are located in a peripheral region of the circular image field of a downstream projection objective in a manner at least approximating rotation symmetry. The integral of the quantity of light passing through the fields in the scanning direction are constant over the entire extent of the image field configuration in the direction at right angles to the scanning direction. Such an image field configuration replaces a conventional rectangular scanner slot formation whose width in the scanning direction corresponds to the forementioned integral of the image field configuration. The design of the image field configuration permits an approximately rotationally symmetric illumination of the projection objective.

    摘要翻译： 投影微光刻装置的照明装置包括光源，物镜和产生特定图像场配置的装置。 该装置具有在扫描方向上至少部分地通过自由区域分离的区域，并且以至少近似于旋转对称的方式位于下游投影物镜的圆形图像场的周边区域中。 在扫描方向上通过场的光量的积分在与扫描方向成直角的方向上的图像场构造的整个范围内是恒定的。 这样的图像场配置取代了扫描方向上的宽度对应于图像场配置的前述积分的常规矩形扫描器狭缝形状。 图像场配置的设计允许投影物镜的大致旋转对称的照明。

    Illumination system, particularly for EUV lithography
    6.
    发明授权
    Illumination system, particularly for EUV lithography 有权
    照明系统，特别适用于EUV光刻

    公开(公告)号：US06400794B1

    公开(公告)日：2002-06-04

    申请号：US09705662

    申请日：2000-11-03

    申请人： Jörg Schultz ,  Johannes Wangler

    发明人： Jörg Schultz ,  Johannes Wangler

    IPC分类号： G21K504

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K2201/06

    摘要： The invention concerns an illumination system for wavelengths (193 nm, particularly for EUV lithography with at least one light source, which has an illumination A in one surface; at least one device for producing secondary light sources; at least one mirror or lens device, comprising at least one mirror or one lens, which is (are) divided into raster elements; one or more optical elements, which are arranged between the mirror or lens device that comprises at least one mirror or one lens, which is (are) divided into raster elements, and the reticle plane, wherein the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the light source is a light source for producing radiation with a wavelength ≦193 nm, which irradiates in a well-defined plane with a wavelength spectrum, wherein the range of wavelengths used for the application, particularly for lithography, has a beam divergence perpendicular to this plane that is smaller than 5 mrads.

    摘要翻译： 本发明涉及用于波长的照明系统（193nm，特别是对于具有至少一个光源的EUV光刻，其在一个表面中具有照明A;至少一个用于产生二次光源的装置;至少一个反射镜或透镜装置， 包括被分成光栅元件的至少一个反射镜或一个透镜;布置在反射镜或透镜装置之间的一个或多个光学元件，其包括至少一个反射镜或一个透镜，其被分割 光栅元件和光罩平面，其中光学元件对照明系统的出射光瞳中的次级光源进行成像。照明系统的特征在于光源是用于产生波长< = 193nm，其在具有波长谱的明确定义的平面中照射，其中用于应用的波长范围，特别是用于光刻的波长范围具有光束偏离 相当于该平面小于5 mrads。

    Illumination system and REMA objective with lens displacement and operating process therefor
    7.
    发明授权
    Illumination system and REMA objective with lens displacement and operating process therefor 失效
    照明系统和REMA物镜与透镜位移及其操作过程

    公开(公告)号：US06295122B1

    公开(公告)日：2001-09-25

    申请号：US09264137

    申请日：1999-03-05

    申请人： Jörg Schultz ,  Johannes Wangler

    发明人： Jörg Schultz ,  Johannes Wangler

    IPC分类号： G03B2754

    CPC分类号： G03F7/70066 ,  G03F7/70141 ,  G03F7/70183

    摘要： An illumination system for a microlithography projection illumination equipment, in which a secondary light source is imaged on a reticle . The distortion of the image can be set by at least one variable optical path between optical elements, and the uniformity of the illumination is changed because of the changed distortion, in particular, in that the uniformity is increased toward the edge.

    摘要翻译： 一种用于微光刻投影照明设备的照明系统，其中二次光源在掩模版上成像。 可以通过光学元件之间的至少一个可变光路来设置图像的失真，并且由于变形的变化，特别是朝着边缘增加均匀性，照明的均匀性改变。

    Illumination system, particularly for EUV lithography
    10.
    发明授权
    Illumination system, particularly for EUV lithography 有权
    照明系统，特别适用于EUV光刻

    公开(公告)号：US06859515B2

    公开(公告)日：2005-02-22

    申请号：US10090470

    申请日：2002-03-04

    申请人： Jörg Schultz ,  Johannes Wangler

    发明人： Jörg Schultz ,  Johannes Wangler

    IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K5/00

    摘要： There is provided an illumination system for light having wavelengths ≦193 nm. The system includes (a) a first raster element for receiving a first diverging portion of the light and directing a first beam of the light, (b) a second raster element for receiving a second diverging portion of the light and directing a second beam of the light, where the first raster element is oriented at an angle with respect to the second raster element to cause a center ray of the first beam to intersect with a center ray of the second beam at an image plane, and (c) an optical element for imaging secondary sources of the light in an exit pupil, where the optical element is situated in a path of the light after the first and second raster elements and before the image plane.

    摘要翻译： 为波长<= 193nm的光提供照明系统。 该系统包括（a）用于接收光的第一发散部分并引导第一光束的第一光栅元件，（b）第二光栅元件，用于接收光的第二发散部分并引导第二光束 所述光，其中所述第一光栅元件相对于所述第二光栅元件以一定角度定向，以使所述第一光束的中心光线在图像平面处与所述第二光束的中心光线相交，以及（c）光学 用于在出射光瞳中成像二次光源的元件，其中光学元件位于第一和第二光栅元件之后的光的路径中以及在图像平面之前。